Abstract:
Disclosed is a display apparatus including a display including a stand mounting part, a stand to which the stand mounting part is coupleable to mount the display on the stand, and a protection member comprising a portion that includes a support protection member and is detachably coupleable along an edge of the display so that, when the portion is coupled along the edge of the display, the support protection member covers a lower end portion of the display, and a mounting part protection member that is detachably coupleable along the edge of the display so that, when the mounting part protection member is coupled along the edge of the display, the mounting part protection member covers a portion of the display along which the stand is mountable, wherein the mounting part protection member is separately detachable from along the edge of the display while the portion that includes the support protection member remains coupled along the edge of the display with the support protection member covering the lower end portion of the display, to thereby uncover the portion of the display along which the stand is mountable.
Abstract:
The present invention relates to method and device for sharing state related information among a plurality of electronic devices and, more particularly, to method and device for predicting the state of a device on the basis of information shared among a plurality of electronic devices. In order to attain the purpose, a method for sharing state related information of a device, according to an embodiment of the present invention, comprises the steps of: generating a state model of a device on the basis of state related data; selecting one or more parameters for determining the state of the device on the basis of the generated state model; and transmitting the one or more selected parameters to at least one other device.
Abstract:
A semiconductor device may include a semiconductor substrate including an active region defined by a trench, a device isolation layer provided in the trench to surround the active region, a gate electrode extending in a direction crossing the active region, and formed on the active region and the device isolation layer, and a gate insulating layer between the active region and the gate electrode. The active region may have a first conductivity type, and the device isolation layer may include a first silicon oxide layer on an inner surface of the first trench and a different layer, selected from one of first metal oxide layer and a negatively-charged layer, on the first silicon oxide layer.
Abstract:
A semiconductor device may include a device isolation region configured to define an active region in a substrate, an active gate structure disposed in the active region, and a field gate structure disposed in the device isolation region. The field gate structure may include a gate conductive layer. The active gate structure may include an upper active gate structure including a gate conductive layer and a lower active gate structure formed under the upper active gate structure and vertically spaced apart from the upper active gate structure. The lower active gate structure may include a gate conductive layer. A top surface of the gate conductive layer of the field gate structure is located at a lower level than a bottom surface of the gate conductive layer of the upper active gate structure.