公开(公告)号：US11659745B2

公开(公告)日：2023-05-23

申请号：US17683848

申请日：2022-03-01

Applicant: Samsung Display Co., LTD.

Inventor： Myoung Geun Cha ,  Sang Gun Choi ,  Hye Na Kwak ,  Yun Jung Oh ,  Ki Seok Choi

IPC: G06F3/044 ,  H01L27/12 ,  H01L27/32 ,  H01L29/786

CPC classification number: H01L27/3276 ,  G06F3/0445 ,  H01L27/323 ,  H01L27/3262 ,  H01L27/3265 ,  H01L27/3272 ,  H01L27/124 ,  H01L27/1222 ,  H01L27/1255 ,  H01L29/78633 ,  H01L29/78675

Abstract: A display device including: a substrate including a main area and a sub-area at a side of the main area; a thin-film transistor on the substrate and positioned in the main area; a first insulating layer on a gate electrode of the thin-film transistor; a light-emitting element on the first insulating layer, positioned in the main area, and electrically connected to the thin-film transistor; a plurality of pads on the first insulating layer and positioned in the sub-area; and a light-blocking layer overlapping the plurality of pads and located between the substrate and the first insulating layer.

公开(公告)号：US11563074B2

公开(公告)日：2023-01-24

申请号：US17079278

申请日：2020-10-23

Applicant: Samsung Display Co., Ltd.

Inventor： Hyun Min Cho ,  Tae Wook Kang ,  Sang Gun Choi ,  Shin Il Choi ,  Yun Jung Oh ,  Myoung Geun Cha

IPC: H01L29/08 ,  H01L27/32 ,  H01L51/52 ,  H01L51/56

Abstract: A display apparatus includes: a base substrate; a thin film transistor and a power supply wire on the base substrate; a first electrode on the base substrate, and electrically connected to the thin film transistor; a light emitting layer and a common layer on the first electrode; and a second electrode on the common layer. The power supply wire includes: a first conductive layer; a second conductive layer on the first conductive layer; and a third conductive layer on the second conductive layer. The third conductive layer protrudes more than the second conductive layer on a side surface of the power supply wire, and the second electrode contacts a side surface of the second conductive layer.

公开(公告)号：US11245102B2

公开(公告)日：2022-02-08

申请号：US16985376

申请日：2020-08-05

Applicant: Samsung Display Co., Ltd.

Inventor： Myoung Geun Cha ,  Jin Goo Jung ,  Yoon Ho Khang ,  Se Mi Kim

IPC: H01L51/56 ,  H01L27/12 ,  H01L27/32

Abstract: An OLED display and a method of manufacturing thereof are disclosed. In one aspect, the display includes a scan line formed over a substrate and configured to transfer a scan signal, a data line and a driving voltage line crossing the scan line and respectively configured to transfer a data voltage and a driving voltage, and a switching transistor electrically connected to the scan line and the data line and including a switching drain electrode configured to output the data voltage. The display also includes a driving transistor including a driving gate electrode, a driving drain electrode, and a driving source electrode electrically connected to the switching drain electrode. The display further includes a storage capacitor including a first storage electrode electrically connected to the driving gate electrode and a second storage electrode formed on the same layer as the driving voltage line.

公开(公告)号：US20210217895A1

公开(公告)日：2021-07-15

申请号：US17115470

申请日：2020-12-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong Su Lee ,  Yoon Ho Khang ,  Dong Jo Kim ,  Hyun Jae Na ,  Sang Ho Park ,  Se Hwan Yu ,  Chong Sup Chang ,  Dae Ho Kim ,  Jae Neung Kim ,  Myoung Geun Cha ,  Sang Gap Kim ,  Yu-Gwang Jeong

IPC: H01L29/786 ,  H01L27/12 ,  H01L29/66 ,  H01L29/417

Abstract: A thin film transistor according to an exemplary embodiment of the present invention includes an oxide semiconductor. A source electrode and a drain electrode face each other. The source electrode and the drain electrode are positioned at two opposite sides, respectively, of the oxide semiconductor. A low conductive region is positioned between the source electrode or the drain electrode and the oxide semiconductor. An insulating layer is positioned on the oxide semiconductor and the low conductive region. A gate electrode is positioned on the insulating layer. The insulating layer covers the oxide semiconductor and the low conductive region. A carrier concentration of the low conductive region is lower than a carrier concentration of the source electrode or the drain electrode.

公开(公告)号：US10192992B2

公开(公告)日：2019-01-29

申请号：US15704063

申请日：2017-09-14

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong Su Lee ,  Yoon Ho Khang ,  Dong Jo Kim ,  Hyun Jae Na ,  Sang Ho Park ,  Se Hwan Yu ,  Chong Sup Chang ,  Dae Ho Kim ,  Jae Neung Kim ,  Myoung Geun Cha ,  Sang Gab Kim ,  Yu-Gwang Jeong

IPC: H01L27/00 ,  H01L29/00 ,  H01L29/786 ,  H01L27/12 ,  H01L29/66 ,  H01L29/417 ,  H01L27/32

Abstract: A thin film transistor according to an exemplary embodiment of the present invention includes an oxide semiconductor. A source electrode and a drain electrode face each other. The source electrode and the drain electrode are positioned at two opposite sides, respectively, of the oxide semiconductor. A low conductive region is positioned between the source electrode or the drain electrode and the oxide semiconductor. An insulating layer is positioned on the oxide semiconductor and the low conductive region. A gate electrode is positioned on the insulating layer. The insulating layer covers the oxide semiconductor and the low conductive region. A carrier concentration of the low conductive region is lower than a carrier concentration of the source electrode or the drain electrode.

公开(公告)号：US20180159090A1

公开(公告)日：2018-06-07

申请号：US15867600

申请日：2018-01-10

Applicant: Samsung Display Co., Ltd.

Inventor： Myoung Geun Cha ,  Jin Goo Jung ,  Yoon Ho Khang ,  Se Mi Kim

IPC: H01L51/56 ,  H01L27/12

Abstract: An OLED display and a method of manufacturing thereof are disclosed. In one aspect, the display includes a scan line formed over a substrate and configured to transfer a scan signal, a data line and a driving voltage line crossing the scan line and respectively configured to transfer a data voltage and a driving voltage, and a switching transistor electrically connected to the scan line and the data line and including a switching drain electrode configured to output the data voltage. The display also includes a driving transistor including a driving gate electrode, a driving drain electrode, and a driving source electrode electrically connected to the switching drain electrode. The display further includes a storage capacitor including a first storage electrode electrically connected to the driving gate electrode and a second storage electrode formed on the same layer as the driving voltage line.

公开(公告)号：US09379252B2

公开(公告)日：2016-06-28

申请号：US14666461

申请日：2015-03-24

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong Su Lee ,  Yoon Ho Khang ,  Dong Jo Kim ,  Hyun Jae Na ,  Sang Ho Park ,  Se Hwan Yu ,  Chong Sup Chang ,  Dae Ho Kim ,  Jae Neung Kim ,  Myoung Geun Cha ,  Sang Gab Kim ,  Yu-Gwang Jeong

IPC: H01L27/00 ,  H01L29/00 ,  H01L29/786 ,  H01L27/12 ,  H01L29/66 ,  H01L29/417

CPC classification number: H01L29/78633 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1288 ,  H01L27/3262 ,  H01L29/41733 ,  H01L29/66969 ,  H01L29/78618 ,  H01L29/7869 ,  H01L29/78696

Abstract: A thin film transistor according to an exemplary embodiment of the present invention includes an oxide semiconductor. A source electrode and a drain electrode face each other. The source electrode and the drain electrode are positioned at two opposite sides, respectively, of the oxide semiconductor. A low conductive region is positioned between the source electrode or the drain electrode and the oxide semiconductor. An insulating layer is positioned on the oxide semiconductor and the low conductive region. A gate electrode is positioned on the insulating layer. The insulating layer covers the oxide semiconductor and the low conductive region. A carrier concentration of the low conductive region is lower than a carrier concentration of the source electrode or the drain electrode.

Abstract translation: 根据本发明的示例性实施例的薄膜晶体管包括氧化物半导体。 源电极和漏电极彼此面对。 源电极和漏电极分别位于氧化物半导体的两个相对侧。 低导电区域位于源电极或漏电极与氧化物半导体之间。 绝缘层位于氧化物半导体和低导电区域上。 栅电极位于绝缘层上。 绝缘层覆盖氧化物半导体和低导电区域。 低导电区域的载流子浓度低于源电极或漏电极的载流子浓度。

公开(公告)号：US20160148983A1

公开(公告)日：2016-05-26

申请号：US14708070

申请日：2015-05-08

Applicant: Samsung Display Co., Ltd.

Inventor： Myoung Geun Cha ,  Dong Jo Kim ,  Yoon Ho Khang ,  Jong Chan Lee

IPC: H01L27/32 ,  H01L21/223 ,  H01L21/311

CPC classification number: H01L27/3262 ,  H01L21/31116 ,  H01L27/1225 ,  H01L27/3248 ,  H01L27/3258 ,  H01L29/78618 ,  H01L29/7869 ,  H01L2227/323

Abstract: An OLED display and a method of manufacturing the same are disclosed. In one aspect, the OLED display includes a substrate and a semiconductor layer formed over the substrate, wherein the semiconductor layer includes a channel and a contact region formed on opposing sides of the channel. The display also includes an insulating layer formed over the semiconductor layer and having a contact hole exposing the contact region, and an OLED formed over the insulating layer, wherein the OLED is electrically connected to the contact region through the contact hole, and wherein at least a portion of the contact hole is formed directly above the contact region.

Abstract translation: 公开了OLED显示器及其制造方法。 一方面，OLED显示器包括衬底和形成在衬底上的半导体层，其中半导体层包括通道和形成在通道的相对侧上的接触区域。 所述显示器还包括形成在所述半导体层上并具有暴露所述接触区域的接触孔的绝缘层和形成在所述绝缘层上的OLED，其中所述OLED通过所述接触孔电连接到所述接触区域，并且其中至少 接触孔的一部分直接形成在接触区域的正上方。

公开(公告)号：US20150357478A1

公开(公告)日：2015-12-10

申请号：US14830091

申请日：2015-08-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： HYUN JAE NA ,  Yoon Ho Khang ,  Sang Ho Park ,  Dong Hwan Shim ,  Se Hwan Yu ,  Yong Su Lee ,  Myoung Geun Cha

IPC: H01L29/786 ,  H01L29/51 ,  H01L29/49

CPC classification number: H01L29/4908 ,  H01L29/518 ,  H01L29/78603 ,  H01L29/78633

Abstract: A thin film transistor display panel according to an exemplary embodiment of the present invention includes a substrate, a first insulating layer formed on the substrate, a semiconductor layer formed on the first insulating layer, a second insulating layer formed on the semiconductor layer, and a gate electrode formed on the second insulating layer, in which the first insulating layer includes a light blocking material, and a thickness of the first insulating layer is greater than or equal to a thickness of the second insulating layer.

Abstract translation: 根据本发明的示例性实施例的薄膜晶体管显示面板包括基板，形成在基板上的第一绝缘层，形成在第一绝缘层上的半导体层，形成在半导体层上的第二绝缘层，以及 形成在第二绝缘层上的栅电极，其中第一绝缘层包括遮光材料，第一绝缘层的厚度大于或等于第二绝缘层的厚度。

公开(公告)号：US08987047B2

公开(公告)日：2015-03-24

申请号：US14184361

申请日：2014-02-19

Applicant: Samsung Display Co., Ltd.

Inventor： Yong Su Lee ,  Yoon Ho Khang ,  Dong Jo Kim ,  Hyun Jae Na ,  Sang Ho Park ,  Se Hwan Yu ,  Chong Sup Chang ,  Dae Ho Kim ,  Jae Neung Kim ,  Myoung Geun Cha ,  Sang Gab Kim ,  Yu-Gwang Jeong

IPC: H01L21/00 ,  H01L29/10 ,  H01L29/786 ,  H01L27/12 ,  H01L29/66

CPC classification number: H01L29/78633 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1288 ,  H01L27/3262 ,  H01L29/41733 ,  H01L29/66969 ,  H01L29/78618 ,  H01L29/7869 ,  H01L29/78696

Abstract: A thin film transistor according to an exemplary embodiment of the present invention includes an oxide semiconductor. A source electrode and a drain electrode face each other. The source electrode and the drain electrode are positioned at two opposite sides, respectively, of the oxide semiconductor. A low conductive region is positioned between the source electrode or the drain electrode and the oxide semiconductor. An insulating layer is positioned on the oxide semiconductor and the low conductive region. A gate electrode is positioned on the insulating layer. The insulating layer covers the oxide semiconductor and the low conductive region. A carrier concentration of the low conductive region is lower than a carrier concentration of the source electrode or the drain electrode.

Abstract translation: 根据本发明的示例性实施例的薄膜晶体管包括氧化物半导体。 源电极和漏电极彼此面对。 源电极和漏电极分别位于氧化物半导体的两个相对侧。 低导电区域位于源电极或漏电极与氧化物半导体之间。 绝缘层位于氧化物半导体和低导电区域上。 栅电极位于绝缘层上。 绝缘层覆盖氧化物半导体和低导电区域。 低导电区域的载流子浓度低于源电极或漏电极的载流子浓度。