GMR sensor with shallow contiguous junction and bias layers aligned with free sensor layers
    34.
    发明授权
    GMR sensor with shallow contiguous junction and bias layers aligned with free sensor layers 失效
    GMR传感器具有与自由传感器层对准的浅连续结和偏置层

    公开(公告)号:US07286329B1

    公开(公告)日:2007-10-23

    申请号:US10788656

    申请日:2004-02-27

    IPC分类号: G11B5/39

    CPC分类号: G01R31/318357 G11B5/3932

    摘要: A magnetic sensor is disclosed having a shallow contiguous junction. Such a sensor is can greatly increase yield for mass-produced heads, especially for large wafers. The magnetic bias layers can be aligned with a free layer of the sensor, improving performance. Milling may be terminated prior to penetration of an antiferromagnetic layer, so that for example the antiferromagnetic layer may extend significantly beyond the free and pinned layers of the sensor.

    摘要翻译: 公开了一种具有浅连续结的磁传感器。 这种传感器可以大大提高批量生产头部的产量,特别是对于大型晶片。 磁偏置层可以与传感器的自由层对准,从而提高性能。 铣削可以在穿透反铁磁层之前终止,使得例如反铁磁层可以显着地延伸超过传感器的自由和固定层。

    Write head with high moment film layer having tapered portion extending beyond write gap layer
    35.
    发明授权
    Write head with high moment film layer having tapered portion extending beyond write gap layer 失效
    用具有锥形部分延伸超过写间隙层的高力矩膜层写头

    公开(公告)号:US06873494B2

    公开(公告)日:2005-03-29

    申请号:US10134799

    申请日:2002-04-29

    IPC分类号: G11B5/31 G11B5/39 G11B5/40

    摘要: An inductive write head structure incorporating a high moment film in conjunction with at least one pole (e.g., the bottom pole) for use with magnetic storage media and a process for producing the same in which a lift-off photoresist mask is used prior to the deposition of the high moment sputtered film. Following the lift-off process, the high moment film remains on the bottom pole (“P1”) pedestal (in the case of a PDZT type write head) or on the P1 itself (in the case of a Stitched Pole write head). The edge of the lift-off sputtered film is then covered by cured photoresist insulation which is placed at a distance away from the air bearing surface (“ABS”). The coverage of insulation at the edge of the sputtered film is desirable in order to avoid forming a topographic step which may have undesired consequences in the subsequent top pole formation processes.

    摘要翻译: 结合至少一个极(例如,底极)与磁存储介质一起使用的高力矩膜的感应写头结构及其制造方法,其中在剥离光刻胶掩模之前使用剥离光致抗蚀剂掩模 沉积高速溅射膜。 在剥离过程之后,高力矩胶片保留在底极(“P1”)底座上(在PDZT型写入头的情况下)或P1本身(在缝合杆写入头的情况下)。 然后,剥离溅射膜的边缘被固定的光致抗蚀剂绝缘体覆盖,该固化的光致抗蚀剂绝缘体被放置在远离空气支承表面(“ABS”)的一定距离处。 在溅射膜的边缘处的绝缘层的覆盖是期望的,以避免形成在随后的顶极形成过程中可能具有不期望的后果的地形步骤。

    Inductive transducer with recessed leading pole layer
    36.
    发明授权
    Inductive transducer with recessed leading pole layer 有权
    具有凹陷前导极层的感应传感器

    公开(公告)号:US06724572B1

    公开(公告)日:2004-04-20

    申请号:US10086756

    申请日:2002-02-28

    IPC分类号: G11B5147

    摘要: In one aspect, an inductive transducer is disclosed having a leading pole layer and a leading pole tip, with the pole layer being further removed than the pole tip from a media-facing surface. In another aspect, an inductive transducer is disclosed having a magnetic pedestal disposed between a leading pole layer and a leading pole tip, with at least one of the pedestal and pole layer being further removed than the pole tip from a media-facing surface. In another aspect, a leading pole layer or pedestal may have a surface that slopes away from the media-facing surface with increasing distance forward from the leading pole tip.

    摘要翻译: 在一个方面,公开了一种电感式换能器,其具有引导极层和引导极尖端,其中极层比面向介质的表面比极尖更进一步去除。 另一方面,公开了一种电感换能器,其具有设置在引导极层和前导极尖端之间的磁性基座,其中基座和极层中的至少一个比来自面向介质的表面的极尖更进一步地去除。 在另一方面,前导极层或基座可以具有远离所述面向介质的表面的表面,所述表面具有与所述引导极端部向前的距离增加的距离。

    Thin film write head for improved high speed and high density recording
    37.
    发明授权
    Thin film write head for improved high speed and high density recording 有权
    薄膜写入头用于改进高速和高密度记录

    公开(公告)号:US06353511B1

    公开(公告)日:2002-03-05

    申请号:US09335155

    申请日:1999-06-15

    IPC分类号: G11B531

    摘要: A preferred embodiment provides a thin film write head having upper and lower pole structures each having pedestal pole tips formed with CoNiFe. The pedestal pole tips may have from about 60% to about 70% Co and from about 10% to about 15% Ni. The upper pole structure of the preferred embodiment has a laminated yoke portion having upper and lower layers. The lower layer is stitched to the pedestal pole tip of the upper pole structure and comprises FeXN, where X is selected from the group consisting of Rh, Ta, Hf, Al, Zr, Ti, Ru, Si, Cr, V, Si, Sr, Nb, Mo, Ru, and Pd. The upper layer comprises NiFe preferably having from about 15% to about 55% of Fe. It is preferred to define the lower layer of the yoke by etching FeXN material using the upper layer as a hard mask. In a preferred method and embodiment, the top surfaces of the conductor coil and the upper pedestal pole tip are planarized with an inorganic capping layer formed thereover to insulate the conductor coil from the yoke and to provide a low apex angle to form the yoke over.

    摘要翻译: 优选实施例提供一种具有上和下极结构的薄膜写头,每个具有由CoNiFe形成的基座极尖。 基座极尖可以具有约60%至约70%的Co和约10%至约15%的Ni。 优选实施例的上极结构具有具有上层和下层的层叠轭部分。 下层被缝合到上极结构的基座极端,并且包括FeXN,其中X选自Rh,Ta,Hf,Al,Zr,Ti,Ru,Si,Cr,V,Si, Sr,Nb,Mo,Ru和Pd。 上层包含优选具有约15%至约55%Fe的NiFe。 优选通过使用上层作为硬掩模蚀刻FeXN材料来限定轭的下层。 在优选的方法和实施例中,导体线圈和上基座极尖的顶表面与形成在其上的无机覆盖层平坦化,以使导体线圈与轭绝缘,并提供低顶角以形成轭。

    Method for manufacturing wraparound shield write head using hard masks
    38.
    发明授权
    Method for manufacturing wraparound shield write head using hard masks 有权
    使用硬掩模制造环绕屏蔽写头的方法

    公开(公告)号:US08801943B2

    公开(公告)日:2014-08-12

    申请号:US13193520

    申请日:2011-07-28

    IPC分类号: B44C1/22

    CPC分类号: G11B5/3116 G11B5/3163

    摘要: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.

    摘要翻译: 本公开描述了通过实施三层(三层)硬掩模制造全封装屏蔽镶嵌写头的方法。 根据本发明的实施例,在形成写入头期间,各种硬掩模层用于不同的目的。 本发明的环绕式屏蔽头表现出改进的物理特性,进一步导致改善的性能特征。 根据本发明的硬掩模层的使用允许使用可以比其它工艺中使用的那些方法更加严格地控制的制造工艺。 例如,可以使用较小尺寸的光刻技术。 此外,在使用CMP工艺不如使用本发明可能的沉积或光刻技术那样不受控制的情况下,对某些CMP工艺的依赖是不必要的。

    Use of magnetic material for RIE stop layer during damascene main pole formation
    39.
    发明授权
    Use of magnetic material for RIE stop layer during damascene main pole formation 有权
    在镶嵌主磁极形成期间使用磁性材料作为RIE停止层

    公开(公告)号:US08508886B2

    公开(公告)日:2013-08-13

    申请号:US13247883

    申请日:2011-09-28

    IPC分类号: G11B5/31

    摘要: A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.

    摘要翻译: 用于磁盘驱动器的写入头及其制造方法。 当在非镶嵌主极制造工艺中使用非磁性反应离子蚀刻(RIE)停止层时,前缘屏蔽和侧面屏蔽层具有磁分离。 通过用磁RIE停止层代替非磁性RIE停止层,不需要在主极周围去除RIE停止层。 此外,前缘屏蔽和侧屏蔽将磁性地结合在一起而不需要额外的处理,因为前缘屏蔽和侧屏蔽之间将不会有磁性分离。

    Perpendicular write head with wrap around shield and conformal side gap
    40.
    发明授权
    Perpendicular write head with wrap around shield and conformal side gap 有权
    垂直写头与环绕屏蔽和保形侧隙

    公开(公告)号:US08470186B2

    公开(公告)日:2013-06-25

    申请号:US12954458

    申请日:2010-11-24

    IPC分类号: B44C1/22

    摘要: A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.

    摘要翻译: 垂直写头,其具有围绕屏蔽的保护层和保形侧间隙。 在制造写入头时,前缘屏蔽可以被化学机械抛光到基本上均匀的化学机械抛光停止层的水平。 由于前缘屏蔽和化学机械抛光停止层用作沟槽RIE的RIE停止,所以可以用LTE / LES形成完全共形的侧屏蔽。