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    Rotary Substrate Processing System
    31.
    发明申请
    Rotary Substrate Processing System 审中-公开
    旋转底材加工系统

    公开(公告)号：US20130192761A1

    公开(公告)日：2013-08-01

    申请号：US13754733

    申请日：2013-01-30

    Applicant: Joseph Yudovsky ,  Ralf Hofmann ,  Jeonghoon Oh ,  Li-Qun Xia ,  Toshiaki Fujita ,  Pravin K. Narwankar ,  Nag B, Patibandla ,  Srinivas Satya ,  Banqiu Wu

    Inventor： Joseph Yudovsky ,  Ralf Hofmann ,  Jeonghoon Oh ,  Li-Qun Xia ,  Toshiaki Fujita ,  Pravin K. Narwankar ,  Nag B, Patibandla ,  Srinivas Satya ,  Banqiu Wu

    IPC: C23C16/54 ,  B05C13/00

    CPC classification number: C23C16/54 ,  B05C13/00 ,  C23C16/45551

    Abstract: A substrate processing system for processing multiple substrates is provided and generally includes at least one processing platform and at least one staging platform. Each substrate is positioned on a substrate carrier disposed on a substrate support assembly. Multiple substrate carriers, each is configured to carry a substrate thereon, are positioned on the surface of the substrate support assembly. The processing platform and the staging platform, each includes a separate substrate support assembly, which can be rotated by a separate rotary track mechanism. Each rotary track mechanism is capable of supporting the substrate support assembly and continuously rotating multiple substrates carried by the substrate carriers and disposed on the substrate support assembly. Each substrate is thus processed through at least one shower head station and at least one buffer station, which are positioned at a distance above the rotary track mechanism of the processing platform. Each substrate can be transferred between the processing platform and the staging platform and in and out the substrate processing system.

    Abstract translation: 提供了一种用于处理多个基板的基板处理系统，并且通常包括至少一个处理平台和至少一个分段平台。 每个衬底位于设置在衬底支撑组件上的衬底载体上。 多个衬底载体，每个被配置为在其上承载衬底，位于衬底支撑组件的表面上。 处理平台和分段平台各自包括单独的基板支撑组件，其可以通过单独的旋转轨道机构旋转。 每个旋转轨道机构能够支撑基板支撑组件并且连续旋转由基板载体承载并且设置在基板支撑组件上的多个基板。 因此，每个基板通过至少一个淋浴喷头站和至少一个缓冲站进行处理，所述至少一个缓冲站位于处理平台的旋转轨道机构上方的距离处。 每个基板可以在处理平台和分段平台之间传送并进出基板处理系统。

    Methods for Atomic Layer Etching
    32.
    发明申请
    Methods for Atomic Layer Etching 有权
    原子层蚀刻方法

    公开(公告)号：US20130137267A1

    公开(公告)日：2013-05-30

    申请号：US13307524

    申请日：2011-11-30

    Applicant: Mei Chang ,  Joseph Yudovsky

    Inventor： Mei Chang ,  Joseph Yudovsky

    IPC: H01L21/302

    CPC classification number: H01L21/31116 ,  H01J37/32357 ,  H01J37/3244 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67207 ,  H01L21/67248 ,  H01L21/6776

    Abstract: Provided are methods of etching a substrate using atomic layer deposition apparatus. Atomic layer deposition apparatus including a gas distribution plate with a thermal element are discussed. The thermal element is capable of locally changing the temperature of a portion of the surface of the substrate to vaporize an etch layer deposited on the substrate.

    Abstract translation: 提供了使用原子层沉积装置蚀刻衬底的方法。 讨论了包括具有热元件的气体分布板的原子层沉积设备。 热元件能够局部地改变衬底的表面的一部分的温度以蒸发沉积在衬底上的蚀刻层。

    Apparatus And Process For Atomic Layer Deposition
    35.
    发明申请
    Apparatus And Process For Atomic Layer Deposition 审中-公开
    用于原子层沉积的装置和工艺

    公开(公告)号：US20120225193A1

    公开(公告)日：2012-09-06

    申请号：US13189693

    申请日：2011-07-25

    Applicant: Joseph Yudovsky

    Inventor： Joseph Yudovsky

    IPC: C23C16/455 ,  B05D5/12

    CPC classification number: C23C16/45551

    Abstract: Provided is a substrate processing apparatus, such as an atomic layer deposition (ALD) chamber, comprising a substrate support on a swinging support arm and, optionally, a plurality of exhaust ducts located adjacent to but a distance from the gas distribution plate. One or more of the substrate processing apparatus may be a component of an integrated cluster tool to process multiple substrates concurrently.

    Abstract translation: 提供了诸如原子层沉积（ALD）室的衬底处理装置，其包括在摆动支撑臂上的衬底支撑件和可选地位于与气体分配板相邻但距离气体分配板的多个排气管道。 衬底处理装置中的一个或多个可以是用于同时处理多个衬底的集成集群工具的部件。

    Flow Meter With Improved Thermal Stability And Methods Of Use
    37.
    发明申请
    Flow Meter With Improved Thermal Stability And Methods Of Use 审中-公开
    流量计具有改进的热稳定性和使用方法

    公开(公告)号：US20120103425A1

    公开(公告)日：2012-05-03

    申请号：US13189953

    申请日：2011-07-25

    Applicant: Joseph Yudovsky ,  Dennis L. DeMars

    Inventor： Joseph Yudovsky ,  Dennis L. DeMars

    IPC: F15D1/00

    CPC classification number: G01F1/68 ,  G01F1/688 ,  G01F15/10 ,  G01F15/14 ,  H01L21/67017 ,  Y10T137/0324 ,  Y10T137/8158

    Abstract: Devices and methods for controlling flow to a processing chamber are disclosed. The devices comprise a flow meter, an inlet tube in fluid communication with the flow meter, an outlet tube in fluid communication with the outlet of the flow meter, and thermal insulation encompassing at least a portion of the flow meter, at least a portion of the inlet tube and at least a portion of the outlet tube.

    Abstract translation: 公开了用于控制到处理室的流动的装置和方法。 所述装置包括流量计，与所述流量计流体连通的入口管，与所述流量计的出口流体连通的出口管以及包含所述流量计的至少一部分的热绝缘，至少一部分 入口管和出口管的至少一部分。

    Brush box cleaner module with force control
    38.
    发明授权
    Brush box cleaner module with force control 有权
    刷盒清洁模块，带力控制

    公开(公告)号：US07962990B2

    公开(公告)日：2011-06-21

    申请号：US12243700

    申请日：2008-10-01

    Applicant: Hui (Fred) Chen ,  Joseph Yudovsky ,  Allen L. D'Ambra

    Inventor： Hui (Fred) Chen ,  Joseph Yudovsky ,  Allen L. D'Ambra

    IPC: A47L25/00 ,  A46B13/02

    CPC classification number: B08B1/04 ,  H01L21/67046 ,  H01L21/67219

    Abstract: Embodiments of the present invention relates to an apparatus and method for cleaning a substrate using scrubber brushes. One embodiment of the present invention provides a substrate cleaner comprises two scrubber brush assemblies movably disposed in a processing volume. The two scrubber brush assemblies are configured to contact and clean opposite surfaces of a substrate disposed in the processing volume. The substrate cleaner also comprises a positioning assembly configured to simultaneously adjust positions of the two scrubber brush assemblies, wherein the positioning assembly makes substantially the same amount of adjustment to the first and second scrubber brush assemblies in mirror symmetry.

    Abstract translation: 本发明的实施例涉及使用洗涤器刷清洁衬底的装置和方法。 本发明的一个实施例提供了一种基板清洁器，包括可移动地设置在处理体积中的两个洗涤刷组件。 两个洗涤器刷组件被配置为接触并清洁设置在处理体积中的基板的相对表面。 衬底清洁器还包括配置成同时调节两个洗涤器刷组件的位置的定位组件，其中定位组件以镜面对称的方式对第一和第二洗刷器刷组件进行基本相同的调节量。

    Scrubber box and methods for using the same
    40.
    发明授权
    Scrubber box and methods for using the same 有权
    洗涤箱和使用方法

    公开(公告)号：US07774887B2

    公开(公告)日：2010-08-17

    申请号：US12102846

    申请日：2008-04-14

    Applicant: Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

    Inventor： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

    IPC: B08B7/00 ,  A47L25/00

    CPC classification number: H01L21/67046 ,  B08B1/04

    Abstract: A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

    Abstract translation: 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

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