Invention Grant
- Patent Title: Chamber components with increased pyrometry visibility
- Patent Title (中): 室内组件具有更高的高温可见度
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Application No.: US11859080Application Date: 2007-09-21
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Publication No.: US07921803B2Publication Date: 2011-04-12
- Inventor: Joseph Yudovsky , Brendan McDougall , Ravi Jallepally , Yi-Chiau Huang , Maitreyee Mahajani , Kevin Griffin , Andrew C. Sherman
- Applicant: Joseph Yudovsky , Brendan McDougall , Ravi Jallepally , Yi-Chiau Huang , Maitreyee Mahajani , Kevin Griffin , Andrew C. Sherman
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: B05C11/00
- IPC: B05C11/00
Abstract:
The present invention generally provides method and apparatus for non-contact temperature measurement in a semiconductor processing chamber. Particularly, the present invention provides methods and apparatus for non-contact temperature measurement for temperature below 500° C. One embodiment of the present invention provides an apparatus for processing semiconductor substrates. The apparatus comprises a target component comprises a material with higher emissivity than the one or more substrates.
Public/Granted literature
- US20090078198A1 CHAMBER COMPONENTS WITH INCREASED PYROMETRY VISIBILITY Public/Granted day:2009-03-26
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