公开(公告)号：US20150212428A1

公开(公告)日：2015-07-30

申请号：US14419910

申请日：2013-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Fransiscus Mathijs Jacobs ,  Willem Herman Gertruda Anna Koenen ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70725 ,  G03F7/70775

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。

公开(公告)号：US20150168850A1

公开(公告)日：2015-06-18

申请号：US14624167

申请日：2015-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Mattijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Abstract translation: 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

公开(公告)号：US20140285785A1

公开(公告)日：2014-09-25

申请号：US14350327

申请日：2012-11-06

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arno Jan Bleeker ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/70191 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/70391 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70525 ,  G03F9/7026

Abstract: The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.

Abstract translation: 参考位置的位置和/或旋转来确定本发明涉及用于照射目标上的多个位置的多个光束的强度值。 还提供了相关联的光刻或曝光装置，相关的装置制造方法和相关联的计算机程序。

公开(公告)号：US20140224173A1

公开(公告)日：2014-08-14

申请号：US14162435

申请日：2014-01-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus Donders ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens

IPC: B05C9/12

CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

Abstract translation: 公开了一种光刻投影装置，其中液体供应系统在投影系统和基板之间提供液体。 提供主动干燥站，以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。

公开(公告)号：US10969701B2

公开(公告)日：2021-04-06

申请号：US16572156

申请日：2019-09-16

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Jeroen Dekkers ,  Paul Janssen ,  Ronald Harm Gunther Kramer ,  Matthias Kruizinga ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Gerrit Van Den Bosch ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge ,  Angelo Cesar Peter De Klerk ,  Jacobus Maria Dings ,  Maurice Leonardus Johannes Janssen ,  Roland Jacobus Johannes Kerstens ,  Martinus Jozef Maria Kester ,  Michel Loos ,  Geert Middel ,  Silvester Matheus Reijnders ,  Frank Johannes Christiaan Theuerzeit ,  Anne Johannes Wilhelmus Van Lievenoogen

IPC: G03F7/20 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US10788755B2

公开(公告)日：2020-09-29

申请号：US16229102

申请日：2018-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC: G03B27/52 ,  G03F7/20

Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：US10678139B2

公开(公告)日：2020-06-09

申请号：US16245400

申请日：2019-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Johannes Catherinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Erik Theodorus Maria Bijlaart ,  Christiaan Alexander Hoogendam ,  Helmar Van Santen ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Arie Jeffrey Den Boef ,  Joost Jeroen Ottens ,  Jeroen Johannes Sophia Maria Mertens

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US10580545B2

公开(公告)日：2020-03-03

申请号：US14917623

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Petrus Rutgerus Bartraij ,  Ramon Pascal Van Gorkom ,  Lucas Johannes Peter Ament ,  Pieter Willem Herman De Jager ,  Gosse Charles De Vries ,  Rilpho Ludovicus Donker ,  Wouter Joep Engelen ,  Olav Waldemar Vladimir Frijns ,  Leonardus Adrianus Gerardus Grimminck ,  Andelko Katalenic ,  Erik Roelof Loopstra ,  Han-Kwang Nienhuys ,  Andrey Alexandrovich Nikipelov ,  Michael Jozef Mathijs Renkens ,  Franciscus Johannes Joseph Janssen ,  Borgert Kruizinga

IPC: G03F7/20 ,  G21K1/06

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：US10437154B2

公开(公告)日：2019-10-08

申请号：US15789702

申请日：2017-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Olav Waldemar Vladimir Frijns ,  Erik Roelof Loopstra ,  Wouter Joep Engelen ,  Johannes Antonius Gerardus Akkermans

IPC: G03B27/42 ,  H01J31/48 ,  G03F7/20 ,  H01S3/09 ,  G01J1/04 ,  G02B1/06 ,  G02B5/20 ,  G21K1/10 ,  G02B26/02 ,  G01J1/26 ,  G01J1/42 ,  H05H7/04 ,  H01S3/00

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：US10345712B2

公开(公告)日：2019-07-09

申请号：US15918575

申请日：2018-03-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC: G03B27/52 ,  G03F7/20

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.