公开(公告)号：US20220406554A1

公开(公告)日：2022-12-22

申请号：US17353171

申请日：2021-06-21

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Eric Donald Wilson ,  Daniel Alvarado ,  Robert C. Lindberg ,  Jacob Mullin

IPC: H01J27/02 ,  H01J27/14

Abstract: A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the interior toward an aperture, wherein the temperature is continuously increasing along the pathway. The aperture may be disposed in or near the interior of the arc chamber of an ion source. The liquid metal flows along the pathway toward the arc chamber, where it is vaporized and then ionized. By controlling the flow rate of the pathway, spillage may be reduced. In another embodiment, an inverted crucible is disclosed. The inverted crucible comprises a closed end in communication with the interior of the ion source, so that the closed end is the hottest region of the crucible. An opening is disposed on a different wall to allow vapor to exit the crucible.

公开(公告)号：US20220359147A1

公开(公告)日：2022-11-10

申请号：US17308732

申请日：2021-05-05

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Daniel Alvarado ,  Eric Donald Wilson ,  Robert Lindberg

IPC: H01J27/08 ,  H01J37/30 ,  H01J27/02 ,  H01J37/08

Abstract: A system and method for extending the life of a cathode and repeller in an IHC ion source is disclosed. The system monitors the health of the cathode by operating using a known set of parameters and measuring the bias power used to generate the desired extracted beam current or the desired current from the arc voltage power supply. Based on the measured bias power, the system may determine whether the cathode is becoming too thin, and may take a corrective action. This corrective action may be to alert the operator; to operate the IHC ion source using a predetermined set of parameters; or to change the dilution used within the IHC source. By performing these actions, the life of the cathode may be more than doubled.

公开(公告)号：US11251010B1

公开(公告)日：2022-02-15

申请号：US17443684

申请日：2021-07-27

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Perel ,  Jay S. Johnson ,  Suren Madunts ,  Adam M. McLaughlin ,  Graham Wright

IPC: H01J3/14 ,  H01J1/02

Abstract: A system for extending the life of a repeller in an IHC ion source is disclosed. The system includes an IHC ion source wherein the back surface of the repeller has been shaped to reduce the possibility of electrical shorts. The separation distance between the back surface of the repeller and the chamber wall behind the repeller is increased along its outer edge, as compared to the separation distance near the center of the repeller. This separation distance reduces the possibility that deposited material will flake and short the repeller to the chamber wall. Further, in certain embodiments, the separation distance between the back surface of the repeller and the chamber wall near the center of the repeller is unchanged, so as to minimize the flow of gas that exits from the chamber. The back surface of the repeller may be tapered, stepped or arced to achieve these criteria.

公开(公告)号：US11008649B2

公开(公告)日：2021-05-18

申请号：US16191526

申请日：2018-11-15

Applicant: APPLIED Materials, Inc.

Inventor： Graham Wright ,  Klaus Becker

IPC: H01J37/34 ,  C23C14/34

Abstract: An advanced sputter target is disclosed. The advanced sputter target comprises two components, a porous carrier, and a metal material disposed within that porous carrier. The porous carrier is designed to be a high porosity, open cell structure such that molten material may flow through the carrier. The porous carrier also provides structural support for the metal material. The cell sizes of the porous carrier are dimensioned such that the capillary action and surface tension prohibits the metal material from spilling, dripping, or otherwise exiting the porous carrier. In some embodiments, the porous carrier is an open cell foam, a weave of strands or stacked meshes.

公开(公告)号：US12224149B2

公开(公告)日：2025-02-11

申请号：US18099353

申请日：2023-01-20

Applicant: Applied Materials, Inc.

Inventor： Mateo Navarro Goldaraz ,  Graham Wright ,  Ori Noked

IPC: H01J27/02 ,  H01J27/26

Abstract: An ion source for generating an ion beam containing aluminum ions is disclosed. The ion source includes a first gas source to introduce an organoaluminium compound into the arc chamber of the ion source. A second gas, different from the first gas, which is a chlorine-containing gas is also introduced to the arc chamber. The chloride co-flow reduces the buildup of decomposition material that occurs within the arc chamber. This buildup may occur at the gas bushing, the extraction aperture or near the repeller. In some embodiments, the second gas is introduced continuously. In other embodiments, the second gas is periodically introduced, based on hours of operation or the measured uniformity of the extracted ion beam. The second gas may be introduced from second gas source or from a vaporizer.

公开(公告)号：US12154754B2

公开(公告)日：2024-11-26

申请号：US17835107

申请日：2022-06-08

Applicant: Applied Materials, Inc.

Inventor： Craig R. Chaney ,  Graham Wright

IPC: H01J37/08 ,  H01J27/08 ,  H01J37/34

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip is disposed in the crucible in contact with the solid dopant material. The porous wicking tip may be a tube with one or more interior conduits. Alternatively, the porous tip may be two concentric cylinders with a plurality of rods disposed in the annular ring between the two cylinders. Alternatively, the porous tip may be one or more foil layers wound together. In each of these embodiments, the wicking tip can be used to control the flow rate of molten dopant material to the arc chamber.

公开(公告)号：US11887806B2

公开(公告)日：2024-01-30

申请号：US17715690

申请日：2022-04-07

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Ryan C. Prager

IPC: H01J37/08 ,  H01J37/317 ,  C23C14/48 ,  H01J37/05

CPC classification number: H01J37/08 ,  C23C14/48 ,  H01J37/05 ,  H01J37/3171 ,  H01J2237/0815

Abstract: An ion source is provided. The ion source may include an ion chamber to generate an ion beam comprising a metal ion species; and a charge source, coupled to deliver a metal vapor to the ion chamber, the charge source including a charge mixture. The charge mixture may include a first portion, comprising an elemental metal; and a second portion, comprising a heterogeneous metal fluoride compound.

公开(公告)号：US20230402247A1

公开(公告)日：2023-12-14

申请号：US17835107

申请日：2022-06-08

Applicant: Applied Materials, Inc.

Inventor： Craig R. Chaney ,  Graham Wright

IPC: H01J37/08 ,  H01J27/08 ,  H01J37/34

CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J37/3435

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible contains a solid dopant material, such as a metal. A porous wicking tip is disposed in the crucible in contact with the solid dopant material. The porous wicking tip may be a tube with one or more interior conduits. Alternatively, the porous tip may be two concentric cylinders with a plurality of rods disposed in the annular ring between the two cylinders. Alternatively, the porous tip may be one or more foil layers wound together. In each of these embodiments, the wicking tip can be used to control the flow rate of molten dopant material to the arc chamber.

公开(公告)号：US20230395357A1

公开(公告)日：2023-12-07

申请号：US17834445

申请日：2022-06-07

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Shardul S. Patel

IPC: H01J37/32 ,  C23C16/448

CPC classification number: H01J37/32614 ,  H01J37/32522 ,  H01J37/3244 ,  C23C16/4481 ,  H01J2237/006

Abstract: An ion source that is capable of different modes of operation is disclosed. A vaporizer is in communication with the ion source. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as an inert gas, while heating the vaporizer. When operating in a second mode, the ion source may supply a second gas, which may be an organoaluminium gas. When operating in a third mode, the ion source may supply the second gas, while heating the vaporizer. Ions having single charges may be created in the first and second modes, while ions having multiple charges may be created in the third mode.

公开(公告)号：US20210375585A1

公开(公告)日：2021-12-02

申请号：US17403223

申请日：2021-08-16

Applicant: Applied Materials, Inc.

Inventor： Shreyansh P. Patel ,  Graham Wright ,  Daniel Alvarado ,  Daniel R. Tieger ,  Brian S. Gori ,  William R. Bogiages, JR. ,  Benjamin Oswald ,  Craig R. Chaney

IPC: H01J37/302 ,  H01J37/08

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.