公开(公告)号：US20230326703A1

公开(公告)日：2023-10-12

申请号：US17715690

申请日：2022-04-07

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Ryan C. Prager

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/05 ,  C23C14/48

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J37/05 ,  C23C14/48 ,  H01J2237/0815

Abstract: An ion source is provided. The ion source may include an ion chamber to generate an ion beam comprising a metal ion species; and a charge source, coupled to deliver a metal vapor to the ion chamber, the charge source including a charge mixture. The charge mixture may include a first portion, comprising an elemental metal; and a second portion, comprising a heterogeneous metal fluoride compound.

公开(公告)号：US11887806B2

公开(公告)日：2024-01-30

申请号：US17715690

申请日：2022-04-07

Applicant: Applied Materials, Inc.

Inventor： Graham Wright ,  Ryan C. Prager

IPC: H01J37/08 ,  H01J37/317 ,  C23C14/48 ,  H01J37/05

CPC classification number: H01J37/08 ,  C23C14/48 ,  H01J37/05 ,  H01J37/3171 ,  H01J2237/0815

Abstract: An ion source is provided. The ion source may include an ion chamber to generate an ion beam comprising a metal ion species; and a charge source, coupled to deliver a metal vapor to the ion chamber, the charge source including a charge mixture. The charge mixture may include a first portion, comprising an elemental metal; and a second portion, comprising a heterogeneous metal fluoride compound.