公开(公告)号：US10332772B2

公开(公告)日：2019-06-25

申请号：US14762796

申请日：2014-03-10

Applicant: APPLIED MATERIALS, INC.

Inventor： Kyle Tantiwong ,  Vladimir Knyazik ,  Samer Banna

IPC: H01L21/683 ,  H01L21/67 ,  H01J37/32

Abstract: An electrostatic chuck (ESC) with a cooling base for plasma processing chambers, such as a plasma etch chamber. In embodiments, a plasma processing chuck includes a plurality of independent edge zones. In embodiments, the edge zones are segments spanning different azimuth angles of the chuck to permit independent edge temperature tuning, which may be used to compensate for other chamber related non-uniformities or incoming wafer non-uniformities. In embodiments, the chuck includes a center zone having a first heat transfer fluid supply and control loop, and a plurality of edge zones, together covering the remainder of the chuck area, and each having separate heat transfer fluid supply and control loops. In embodiments, the base includes a diffuser, which may have hundreds of small holes over the chuck area to provide a uniform distribution of heat transfer fluid.

公开(公告)号：US09911579B2

公开(公告)日：2018-03-06

申请号：US14729736

申请日：2015-06-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason Della Rosa ,  Hamid Noorbakhsh ,  Vladimir Knyazik ,  Jisoo Kim ,  Wonseok Lee ,  Usama Dadu

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32807 ,  H01J37/3288

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the base, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed in a gap between the base and gas distribution plate.

公开(公告)号：US20170140900A1

公开(公告)日：2017-05-18

申请号：US14940539

申请日：2015-11-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid Dorf ,  Shahid Rauf ,  Vladimir Knyazik ,  Philip A. Kraus ,  Ying Zhang

IPC: H01J37/32

CPC classification number: H01J37/32422 ,  H01J37/06 ,  H01J37/3211 ,  H01J37/3233 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/32807

Abstract: To generate a plasma for processing a workpiece, an electron beam is introduced into a plasma reactor chamber by radial injection using an annular electron beam source distributed around the circular periphery of the chamber to provide azimuthal uniformity. The electron beam propagation path is tilted upwardly away from the workpiece, either by tilting the electron beam source or by a magnetic field. In other embodiments, there are plural opposing electron beams from linear electron beam sources directed toward the center of the plasma reactor chamber.

公开(公告)号：US09472378B2

公开(公告)日：2016-10-18

申请号：US14107184

申请日：2013-12-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Vladimir Knyazik ,  Samer Banna ,  Kyle R. Tantiwong

IPC: C23C16/00 ,  H01L21/306 ,  H01J37/32

CPC classification number: H01J37/3211

Abstract: A low inductance coil antenna for a plasma reactor has multiple radial zones of plural conductor lobes extending radially from respective RF supply and ground rings.

Abstract translation: 用于等离子体反应器的低电感线圈天线具有从相应的RF电源和接地环径向延伸的多个导体突起的多个径向区域。

公开(公告)号：US20150371826A1

公开(公告)日：2015-12-24

申请号：US14762224

申请日：2014-02-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  C23C16/45561 ,  C23C16/45578 ,  C23C16/4558 ,  H01J37/32082

Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.

Abstract translation: 等离子体反应器的环形盖板具有上层和下层的气体分配通道，该气体分配通道沿着从气体供应管线到天花板气体喷嘴的相应气体分配通道的等长路径分配气体。

公开(公告)号：US20150097478A1

公开(公告)日：2015-04-09

申请号：US14107137

申请日：2013-12-16

Applicant: Applied Materials, Inc.

Inventor： Vladimir Knyazik ,  Samer Banna ,  Kyle R. Tantiwong

IPC: H01J37/32

CPC classification number: H01J37/3211

Abstract: A low inductance coil antenna for a plasma reactor has plural conductor lobes extending radially from respective RF supply connections.

Abstract translation: 用于等离子体反应器的低电感线圈天线具有从相应的RF电源连接件径向延伸的多个导体凸角。