Tablet vessel feed apparatus
    31.
    发明授权

    公开(公告)号:US06478185B2

    公开(公告)日:2002-11-12

    申请号:US09904544

    申请日:2001-07-16

    IPC分类号: B65G5900

    CPC分类号: B65B5/103

    摘要: The present invention provides a tablet vessel feed apparatus comprising a stock container for storing a plurality of tablet vessels, a vessel takeout section for taking out the tablet vessels from the stock container, and a conveyor for conveying the tablet vessels taken out from the stock container. The apparatus further comprises an auxiliary conveyor for conveying the tablet vessel taken out from the stock container toward the conveyor; a delivery table for receiving the tablet vessel conveyed by the auxiliary conveyor to retain and then deliver the tablet vessel to the conveyor; a tablet vessel sensor for detecting the tablet vessel on at least any one of the auxiliary conveyor and the delivery table; and a controller. The controller allows the vessel takeout section to stop taking out the tablet vessels from the stock container while the tablet vessel sensor detects the tablet vessel.

    Organic photoelectric conversion element and organic photoelectric conversion element manufacturing method
    33.
    发明授权
    Organic photoelectric conversion element and organic photoelectric conversion element manufacturing method 有权
    有机光电转换元件和有机光电转换元件的制造方法

    公开(公告)号:US08546684B2

    公开(公告)日:2013-10-01

    申请号:US13123819

    申请日:2009-10-07

    IPC分类号: H01L31/00

    摘要: Provided is an organic photoelectric conversion element having a high photoelectric conversion ratio. Provided is also a method for manufacturing an organic photoelectric conversion element which can significantly reduce the manufacturing cost by forming a transparent electrode and an organic generation layer portion by coating a material. The organic photoelectric conversion element includes on a transparent substrate, a first electrode unit having a transparent conductive layer, an organic generation unit, and a second electrode unit which are successively arranged in this order when viewed from the transparent substrate. The transparent conductive layer constituting the first electrode unit contains conductive fiber and transparent conductive material.

    摘要翻译: 提供了具有高光电转换比的有机光电转换元件。 还提供一种制造有机光电转换元件的方法,该有机光电转换元件可以通过涂覆材料形成透明电极和有机发生层部分而显着降低制造成本。 有机光电转换元件在透明基板上包括具有透明导电层的第一电极单元,有机发生单元和第二电极单元,从透明基板观察时依次排列。 构成第一电极单元的透明导电层含有导电性纤维和透明导电性材料。

    METHOD OF MANUFACTURING A PHOTOMASK
    34.
    发明申请
    METHOD OF MANUFACTURING A PHOTOMASK 有权
    制作光电子的方法

    公开(公告)号:US20120034552A1

    公开(公告)日:2012-02-09

    申请号:US13201148

    申请日:2010-01-29

    IPC分类号: H01L21/027 B82Y40/00

    CPC分类号: G03F1/48 G03F1/32 G03F1/54

    摘要: A thin film composed of a material containing a metal and silicon is formed on a transparent substrate, and a thin film pattern is formed by patterning the thin film. Then, the main surface and the side walls of the thin film pattern are previously modified so as to prevent the transfer characteristics of the thin film pattern from changing more than predetermined even in the case where exposure light with a wavelength of 200 nm or less is cumulatively applied onto the thin film pattern which has been formed. The main surface and the side walls are modified by, for instance, performing heat treatment to the main surface and the side walls at 450-900° C. in the atmosphere containing oxygen.

    摘要翻译: 在透明基板上形成由含有金属和硅的材料构成的薄膜,通过图案化薄膜形成薄膜图案。 然后,预先修改薄膜图案的主表面和侧壁,以便即使在波长为200nm以下的曝光光为200nm以下的情况下,也能够防止薄膜图案的转印特性变化超过规定 累积地施加到已经形成的薄膜图案上。 主表面和侧壁通过例如在含有氧的气氛中在450-900℃下对主表面和侧壁进行热处理而进行改性。

    LIGHTING DEVICE
    35.
    发明申请
    LIGHTING DEVICE 有权
    照明设备

    公开(公告)号:US20110233566A1

    公开(公告)日:2011-09-29

    申请号:US13130615

    申请日:2009-11-16

    IPC分类号: H01L31/12

    摘要: Provided is a lightweight flexible lighting device with excellent durability and stable performance over repeated use that combines an organic electroluminescent element, an organic photoelectric conversion element, and a secondary cell. The lighting device has a control means for controlling the electrical connections of the organic electroluminescent element, the organic photoelectric conversion element, and the secondary cell. The control means controls the electrical connections such that a reverse bias voltage is applied to the organic electroluminescent element when the organic electroluminescent element receives light, generates power, and charges the secondary cell, and such that a reverse bias voltage is applied to the organic photoelectric conversion element when the organic electroluminescent element is supplied with power from the secondary cell and emits light.

    摘要翻译: 提供了一种轻巧的柔性照明装置,其具有优异的耐久性和超过重复使用的稳定性能,其结合有机电致发光元件,有机光电转换元件和二次电池。 照明装置具有用于控制有机电致发光元件,有机光电转换元件和二次电池的电连接的控制装置。 控制装置控制电气连接,使得当有机电致发光元件接收光,产生电力并对二次电池充电时,向有机电致发光元件施加反向偏置电压,并且将反向偏置电压施加到有机电致发光元件 当有机电致发光元件从二次电池供电并发光时,转换元件。

    Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
    36.
    发明授权
    Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask 有权
    掩模坯料玻璃基板的制造方法,掩模坯料的制造方法,掩模制造方法,掩模坯料玻璃基板,掩模坯料和掩模

    公开(公告)号:US07955763B2

    公开(公告)日:2011-06-07

    申请号:US12946360

    申请日:2010-11-15

    IPC分类号: G03F1/00 G03F1/14

    CPC分类号: G03F1/38 Y10T428/31616

    摘要: A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate. The pit is used as a marker for individually identifying or managing the mask blank glass substrate. The marker may be correlated with information including at least one of substrate information about the mask blank glass substrate, thin film information about the mask pattern thin film, and resist film information about the resist film. A mask blank glass substrate with marker correlated to at least one of the resist film information and thin film information may be used to manufacture a new mask blank.

    摘要翻译: 包括标记形成步骤的掩模坯料玻璃基板或掩模坯料的制造方法以及包括标记的掩模坯料玻璃基板或掩模坯料。 标记是通过在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域中的镜状表面上形成的凹坑。 凹坑用作单独识别或管理掩模坯料玻璃基板的标记。 标记可以与包括关于掩模坯料玻璃基板的基板信息,关于掩模图案薄膜的薄膜信息和关于抗蚀剂膜的抗蚀剂膜信息中的至少一个的信息相关联。 可以使用具有与抗蚀剂膜信息和薄膜信息中的至少一个相关的标记的掩模坯料玻璃基板来制造新的掩模坯料。

    MASK BLANK GLASS SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, MASK MANUFACTURING METHOD, MASK BLANK GLASS SUBSTRATE, MASK BLANK, AND MASK
    37.
    发明申请
    MASK BLANK GLASS SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, MASK MANUFACTURING METHOD, MASK BLANK GLASS SUBSTRATE, MASK BLANK, AND MASK 有权
    掩模玻璃基板制造方法,掩模制造方法,掩模制造方法,掩模玻璃基板,掩模布和掩模

    公开(公告)号:US20110059390A1

    公开(公告)日:2011-03-10

    申请号:US12946360

    申请日:2010-11-15

    IPC分类号: G03F1/00

    CPC分类号: G03F1/38 Y10T428/31616

    摘要: A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate. The pit is used as a marker for individually identifying or managing the mask blank glass substrate. The marker may be correlated with information including at least one of substrate information about the mask blank glass substrate, thin film information about the mask pattern thin film, and resist film information about the resist film. A mask blank glass substrate with marker correlated to at least one of the resist film information and thin film information may be used to manufacture a new mask blank.

    摘要翻译: 包括标记形成步骤的掩模坯料玻璃基板或掩模坯料的制造方法以及包括标记的掩模坯料玻璃基板或掩模坯料。 标记是通过在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域中的镜状表面上形成的凹坑。 凹坑用作单独识别或管理掩模坯料玻璃基板的标记。 标记可以与包括关于掩模坯料玻璃基板的基板信息,关于掩模图案薄膜的薄膜信息和关于抗蚀剂膜的抗蚀剂膜信息中的至少一个的信息相关联。 具有与抗蚀剂膜信息和薄膜信息中的至少一个相关的标记的掩模坯料玻璃基板可以用于制造新的掩模坯料。

    Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor device
    38.
    发明授权
    Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor device 有权
    光掩模坯料及其制造方法,制造光掩模的方法以及半导体装置的制造方法

    公开(公告)号:US07901842B2

    公开(公告)日:2011-03-08

    申请号:US12088408

    申请日:2006-09-29

    IPC分类号: G03F1/00

    CPC分类号: G03F1/54 G03F1/32

    摘要: It is provided a photomask blank that has good flatness when a light-shielding film is patterned and hence can provide a good mask pattern accuracy and a good pattern transfer accuracy, and a method of producing a photomask.A photomask blank of the present invention includes a light-shielding film containing at least chromium on a light-transmitting substrate. The light-shielding film is formed so as to cause a desired film stress in the direction opposite to that of a change in the film stress that is anticipated to be caused in the light-shielding film by heat treatment according to a resist film formed on the light-shielding film. A photomask is produced by patterning the light-shielding film of the photomask blank by dry etching.

    摘要翻译: 提供一种光掩模坯料,当遮光膜被图案化时具有良好的平坦度,因此可以提供良好的掩模图案精度和良好的图案转印精度,以及制造光掩模的方法。 本发明的光掩模坯料包括在透光性基板上至少含有铬的遮光膜。 遮光膜形成为使得在与通过热处理在遮光膜中引起的膜应力变化相反的方向产生期望的膜应力,所述抗蚀剂膜根据形成在 遮光膜。 通过干蚀刻图案化光掩模坯料的遮光膜来制造光掩模。

    MASK BLANK SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, MASK MANUFACTURING METHOD, AND MASK BLANK SUBSTRATE
    39.
    发明申请
    MASK BLANK SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, MASK MANUFACTURING METHOD, AND MASK BLANK SUBSTRATE 有权
    掩模基板制造方法,掩模制造方法,掩模制造方法和掩模空白基板

    公开(公告)号:US20100081069A1

    公开(公告)日:2010-04-01

    申请号:US12632900

    申请日:2009-12-08

    申请人: Yasushi OKUBO

    发明人: Yasushi OKUBO

    IPC分类号: G03F7/20 G03F1/00

    CPC分类号: G03F1/38 G03F1/60

    摘要: An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of forming a marker (106a to 106d) for identifying or managing the substrate on each of at least a plurality of end faces among four end faces (104a to 104d) of the substrate. The four end faces are continuous with sides of the main surface, respectively.

    摘要翻译: 本发明的一个目的是适当地识别或管理掩模空白基板,掩模毛坯等。 掩模基板(10)的制造方法包括:准备具有正方形主面(102)的板状基板的基板准备工序;以及形成用于识别或管理的标记(106a〜106d)的标记形成工序 所述基板在所述基板的四个端面(104a〜104d)中的至少多个端面中的每一个上。 四个端面分别与主表面的侧面连续。