ION FOCUSING DEVICE
    21.
    发明申请
    ION FOCUSING DEVICE 审中-公开

    公开(公告)号:US20200321190A1

    公开(公告)日:2020-10-08

    申请号:US16956858

    申请日:2018-12-13

    Abstract: Apparatus include a plurality of electrode arrangements spaced apart from each other opposite an ion propagation axis and defining an ion transfer channel that extends along the ion propagation axis that tapers between an input end that is situated to receive ions and an output end that is situated to couple the received ions to an input end of an ion guide. Methods include positioning a plurality of electrode arrangements at oblique angles opposite an ion propagation axis so as to form a ion transfer channel that tapers between an input end and an output end, and coupling the output end of the ion transfer channel to an input end of an ion optical element so as to direct ions in the ion transfer channel into the ion optical element. Related systems are also disclosed.

    Energy Filter and Charged Particle Beam Apparatus

    公开(公告)号:US20200321185A1

    公开(公告)日:2020-10-08

    申请号:US16827156

    申请日:2020-03-23

    Applicant: JEOL Ltd.

    Inventor: Kazuya Omoto

    Abstract: An energy filter has a plurality of sector magnets which are configured symmetrically with respect to a symmetry plane, and forms a real image on the symmetry plane. The energy filter include: an entrance aperture provided with a slit having a longitudinal direction in a direction perpendicular to an energy dispersion direction; and a hexapole and a quadrupole disposed on the symmetry plane.

    CHARGED PARTICLE DETECTION SYSTEM
    23.
    发明申请

    公开(公告)号:US20200312609A1

    公开(公告)日:2020-10-01

    申请号:US16810879

    申请日:2020-03-06

    Abstract: A scintillator assembly including an entrance surface for receiving charged particles into the scintillator assembly, the charged particles including first charged particles at a first energy level and second charged particles at a second energy level. A first scintillator structure configured for receiving the first charged particles and generating a corresponding first signal formed of first photons with a first wavelength of λ1, a second scintillator structure configured for receiving the second charged particles and generating a corresponding second signal of second photons with a second wavelength of λ2, and an emitting surface for egress of a combined signal from the scintillator assembly, the combined signal including the first and second photons, and at least one beam splitter for receiving the combined signal and separating the combined signal to first and second photons.

    APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

    公开(公告)号:US20200294755A1

    公开(公告)日:2020-09-17

    申请号:US16354638

    申请日:2019-03-15

    Abstract: An apparatus may include a housing including an entrance aperture, to receive an ion beam. The apparatus may include an exit aperture, disposed in the housing, downstream to the entrance aperture, the entrance aperture and the exit aperture defining a beam axis, extending therebetween. The apparatus may include an electrodynamic mass analysis assembly disposed in the housing and comprising an upper electrode assembly, disposed above the beam axis, and a lower electrode assembly, disposed below the beam axis. The apparatus may include an AC voltage assembly, electrically coupled to the upper electrode assembly and the lower electrode assembly, wherein the upper electrode assembly is arranged to receive an AC signal from the AC voltage assembly at a first phase angle, and wherein the lower electrode assembly is arranged to receive the AC signal at a second phase angle, the second phase angle 180 degrees shifted from the first phase angle.

    Electron microscope and method of controlling same

    公开(公告)号:US10607803B2

    公开(公告)日:2020-03-31

    申请号:US16177634

    申请日:2018-11-01

    Applicant: JEOL Ltd.

    Inventor: Masaki Mukai

    Abstract: An electron microscope includes an electron source, an extraction electrode that extracts an electron beam emitted from the electron source, a monochromator having an energy filter that disperses the electron beam emitted from the electron source based on an energy thereof and an energy selection slit that selects the energy of the electron beam, an incident-side electrode provided between the extraction electrode and the monochromator, and an incident-side electrode controller that controls the incident-side electrode based on a change in a voltage applied to the extraction electrode.

    System and method for in-situ beamline film stabilization or removal in the AEF region

    公开(公告)号:US10580616B2

    公开(公告)日:2020-03-03

    申请号:US16152439

    申请日:2018-10-05

    Abstract: An ion implantation system has an ion source configured form an ion beam and an angular energy filter (AEF) having an AEF region. A gas source passivates and/or etches a film residing on the AEF by a reaction of the film with a gas. The gas can be an oxidizing gas or a fluorine-containing gas. The gas source can selectively supply the gas to the AEF region concurrent with a formation of the ion beam. The AEF is heated to assist in the passivation and/or etching of the film by the gas. The heat can originate from the ion beam, and/or from an auxiliary heater associated with the AEF. A manifold distributor can be operably coupled to the gas source and configured to supply the gas to one or more AEF electrodes.

    Energy filter and charged particle beam system

    公开(公告)号:US10546714B2

    公开(公告)日:2020-01-28

    申请号:US15890585

    申请日:2018-02-07

    Applicant: JEOL Ltd.

    Inventor: Kazuya Omoto

    Abstract: There is provided an energy filter capable of being simplified in structure and of achieving low aberrations. The energy filter (100) includes a first sector magnet (10) and a second sector magnet (20). The first and second magnets (10, 20) are configured mirror-symmetrically with respect to a symmetry plane (M). There are one focal point of crossover in the X direction and one focal point of crossover in the Y direction. The focal point of crossover in the X direction and the focal point of crossover in the Y direction are at an energy dispersive plane (S2). There are two focal points of image in the X direction and two focal points of image in the Y direction. The focal points of image in the X direction and the focal points of image in the Y direction are at the symmetry plane (M) and at an achromatic plane (A2).

    Particle beam system and method for the particle-optical examination of an object

    公开(公告)号:US10535494B2

    公开(公告)日:2020-01-14

    申请号:US16216474

    申请日:2018-12-11

    Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

    PROCESSING MATERIAL WITH ION BEAMS
    30.
    发明申请

    公开(公告)号:US20190336933A1

    公开(公告)日:2019-11-07

    申请号:US16516921

    申请日:2019-07-19

    Applicant: Xyleco, Inc.

    Inventor: Marshall MEDOFF

    Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

Patent Agency Ranking