知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

138 records (took 0.034 seconds)

    Dissolution stage for an environmental scanning electron microscope
    22.
    发明授权
    Dissolution stage for an environmental scanning electron microscope 失效
    环境扫描电子显微镜的溶出阶段

    公开(公告)号：US06444982B1

    公开(公告)日：2002-09-03

    申请号：US09599325

    申请日：2000-06-22

    Applicant: James A. Mitchell ,  Philip J. Palermo

    Inventor： James A. Mitchell ,  Philip J. Palermo

    IPC: H01J3700

    CPC classification number: G01N23/2204 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2005 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/2605

    Abstract: A system is provided for imaging, in an ESE microscope or other variable pressure microscope, a single sample at various time intervals during dissolution of the sample in a liquid. The system includes a sample chamber having a sample well. The sample well includes an first fluid port and a second fluid port for forming a dissolution bath in the sample well. In accordance with the system according to the present invention, the sample chamber is placed into the specimen chamber of the ESE microscope and a sample is deposited into the sample well of the sample chamber. The sample is immersed in a liquid which flows through the sample well via the first and second fluid ports during a dissolution cycle. The liquid is then drained from the sample well via one of the first and second fluid ports during a draining cycle, and then, during an imaging cycle, the sample is imaged by the ESE microscope. The dissolution cycle, the draining cycle, and the imaging cycle all occur while the sample well is inside the specimen chamber of the ESE microscope.

    Abstract translation: 提供了一种系统，用于在ESE显微镜或其它可变压力显微镜下，将样品溶解在液体中，以不同的时间间隔对单个样品进行成像。 该系统包括具有样品阱的样品室。 样品阱包括用于在样品阱中形成溶解浴的第一流体端口和第二流体端口。 根据本发明的系统，将样品室放置在ESE显微镜的样品室中，并将样品沉积到样品室的样品孔中。 在溶解循环期间，将样品浸入通过第一和第二流体端口流经样品的液体中。 然后在排液循环期间，通过第一和第二流体端口之一从样品阱中排出液体，然后在成像周期期间，通过ESE显微镜对样品进行成像。 当样品孔在ESE显微镜的样品室内时，溶解循环，排水循环和成像循环都会发生。

    Ion beam apparatus and sample processing method
    23.
    发明申请
    Ion beam apparatus and sample processing method 有权
    离子束装置和样品处理方法

    公开(公告)号：US20020008208A1

    公开(公告)日：2002-01-24

    申请号：US09794828

    申请日：2001-02-27

    Applicant: Hitachi, Ltd.

    Inventor： Hiroyuki Muto ,  Tohru Ishitani ,  Yuichi Madokoro

    IPC: G21K001/08

    CPC classification number: H01J37/3056 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/206 ,  H01J2237/21 ,  H01J2237/3174 ,  H01J2237/31749

    Abstract: For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.

    Abstract translation: 为了在离子束装置中实现高吞吐量和高处理位置精度，准备两种用于处理的离子束，其中一种是用于高分辨率的聚焦离子束和用于大束流的边缘处理离子束 允许边缘部分被尖锐地加工，从而即使用大的电流离子束也能够确保高的加工位置精度。

Patent Agency Ranking