公开(公告)号：US06287735B1

公开(公告)日：2001-09-11

申请号：US09153935

申请日：1998-09-16

Applicant: Bausan Yuan

Inventor： Bausan Yuan

IPC: G03F720

Abstract: A method and apparatus for controlling the leveling table of a wafer stage is described. More generally, the invention includes control circuitry for controlling motion of a stage, where the stage is adapted to support a workpiece. The control circuitry measures position in a vicinity of the workpiece. Based upon the measured position, the control circuitry drives the stage toward a target position while accounting for nonlinear dynamics of the stage. The nonlinear dynamics may include inertia, in which case the control circuitry adaptively estimates the inertia of the stage. The nonlinear dynamics may also include tilt due to acceleration or deceleration of the stage, in which case the circuitry adaptively estimates the tilt of the stage. The stage may generally travel in a plane, and the circuitry measures position in a direction orthogonal to the plane. The circuitry may measure the position of the workpiece itself, or the position of an upper surface of the stage. The workpiece may be a semiconductor wafer in an exposure system.

公开(公告)号：US06260282B1

公开(公告)日：2001-07-17

申请号：US09049801

申请日：1998-03-27

Applicant: Bausan Yuan ,  Susumu Makinouchi ,  Hideyaki Hashimoto

Inventor： Bausan Yuan ,  Susumu Makinouchi ,  Hideyaki Hashimoto

IPC: H01L2168

CPC classification number: G03F7/70358 ,  G03F7/70725

Abstract: A positioning system used, by way of example, for lithography, uses the position of the wafer stage as the trajectory command for the reticle fine stage control circuit. The reticle fine stage position is combined with the position of the wafer stage to generate a synchronous error. The reticle fine stage control circuit uses a Jacobian differential transformation to convert the synchronous error into an positional error for the center of gravity of the reticle fine stage. Thus, any inaccuracies due to measurement errors caused by rotation of reticle fine stage are avoided. A controller filter circuit uses the positional error for the center of gravity to calculate the force on the center of gravity that will minimize the synchronous error. The controller filter circuit includes saturation limited integration behavior that minimizes the settling time. A feedforward loop also generates a feedforward force, which reduces settling time, and is combined with the force signal from the controller filter. A force coordinate transformation circuit receives the summed forces and calculates the forces to be generated by the actuators connected to reticle fine stage that will drive reticle fine stage to the desired position to reduce the synchronous error.

Abstract translation: 作为示例，用于光刻的定位系统使用晶片台的位置作为标线片精细级控制电路的轨迹指令。 标线片精细位置与晶片台的位置相结合以产生同步误差。 光栅精细级控制电路使用雅可比差分变换将同步误差转换为光罩精细级的重心的位置误差。 因此，避免了由于光罩精细台的旋转引起的测量误差导致的任何不准确。 控制器滤波器电路使用重心的位置误差来计算重心的力，这将使同步误差最小化。 控制器滤波器电路包括使稳定时间最小化的饱和有限积分行为。 前馈回路还产生一个前馈力，这减少了建立时间，并与来自控制器滤波器的力信号相结合。 力坐标变换电路接收累加力并计算由连接到标线片精细台的致动器产生的力，该致动器能将光栅精细级驱动到所需位置以减小同步误差。

公开(公告)号：US5940789A

公开(公告)日：1999-08-17

申请号：US649558

申请日：1996-05-17

Applicant: Bausan Yuan

Inventor： Bausan Yuan

IPC: G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70358 ,  G03F7/70716 ,  G03F9/70

Abstract: An improvement in the performance characteristics of a controller for a high precision positioning system, by continuously updating a variable parameter in the controller transfer function in response to, and as a continuously monotonically decreasing function of, the measured position error signal, with a small error cutoff. The error convergence, noise, and stability characteristics of the controller are improved over that of a constant-parameter controller. The variable parameter can also be tailored to prevent saturation of the amplifier that is driven by the controller and which drives the mechanical system whose position is being controlled.

Abstract translation: 通过连续更新控制器传递函数中的可变参数并响应于测量位置误差信号的连续单调递减函数，以及较小的误差，改进了高精度定位系统的控制器的性能特征 隔断。 与恒定参数控制器相比，控制器的误差收敛，噪声和稳定特性得到改善。 可变参数也可以进行调整，以防止由控制器驱动并驱动其位置被控制的机械系统的放大器的饱和。

公开(公告)号：US08619361B2

公开(公告)日：2013-12-31

申请号：US12750713

申请日：2010-03-31

Applicant: Yi-Ping Hsin ,  Susumu Isago ,  Kazuo Masaki ,  Bausan Yuan

Inventor： Yi-Ping Hsin ,  Susumu Isago ,  Kazuo Masaki ,  Bausan Yuan

IPC: G02B27/64 ,  A61N5/00 ,  G03F7/20 ,  B82Y10/00

CPC classification number: G03F7/70358 ,  B82Y10/00 ,  G02B27/646 ,  G03F7/709

Abstract: Methods and apparatus for providing vibration compensation using position measurements are disclosed. According to one aspect of the present invention, a method of compensating for vibrations of an object includes obtaining a plurality of position measurements associated with the object. The method also includes processing the plurality of position measurements to determine a derivative acceleration, and determining a compensatory force to counteract the vibrations of the object. Determining the compensatory force includes using the derivative acceleration. Finally, the method includes applying the compensatory force to the object.

Abstract translation: 公开了使用位置测量提供振动补偿的方法和装置。 根据本发明的一个方面，补偿对象的振动的方法包括获得与对象相关联的多个位置测量。 该方法还包括处理多个位置测量以确定导数加速度，以及确定补偿力以抵消物体的振动。 确定补偿力包括使用导数加速度。 最后，该方法包括将补偿力应用于物体。

公开(公告)号：US20120127445A1

公开(公告)日：2012-05-24

申请号：US12949130

申请日：2010-11-18

Applicant: Akimitsu Ebihara ,  Yi-Ping Hsin ,  Kunitomo Fukai ,  Hideyuki Hashimoto ,  Bausan Yuan

Inventor： Akimitsu Ebihara ,  Yi-Ping Hsin ,  Kunitomo Fukai ,  Hideyuki Hashimoto ,  Bausan Yuan

IPC: G03F7/20 ,  G03B27/54 ,  G02B7/00

CPC classification number: G03F7/709 ,  G02B27/646 ,  G03F7/70258

Abstract: An optical isolation assembly (30) for reducing the transmission of vibration from an optical barrel (25) to an optical element assembly (28) includes an optical mover assembly (256), a first measurement system (258), a second measurement system (260), and a control system (24). The optical mover assembly (256) moves, positions and supports the optical element assembly (28) relative to the optical barrel (25). The first measurement system (258) generates one or more first measurement signals that relate to the relative position between the optical element assembly (28) and the optical barrel (25). The second measurement system (260) generates one or more second measurement signals that relate to the absolute movement of the optical element assembly (28) along the first axis. The control system (24) controls the optical mover assembly (256) utilizing the first measurement signals and the second measurement signals.

Abstract translation: 用于减少从光学镜筒（25）到光学元件组件（28）的振动传播的光学隔离组件（30）包括光学移动器组件（256），第一测量系统（258），第二测量系统 260）和控制系统（24）。 光学移动器组件（256）相对于光学镜筒（25）移动，定位和支撑光学元件组件（28）。 第一测量系统（258）产生与光学元件组件（28）和光学镜筒（25）之间的相对位置相关的一个或多个第一测量信号。 第二测量系统（260）产生与光学元件组件（28）沿着第一轴线的绝对运动有关的一个或多个第二测量信号。 控制系统（24）利用第一测量信号和第二测量信号来控制光学移动器组件（256）。

公开(公告)号：US20110043781A1

公开(公告)日：2011-02-24

申请号：US12926159

申请日：2010-10-28

Applicant: Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

Inventor： Akimitsu Ebihara ,  Martin E. Lee ,  Bausan Yuan

IPC: G03B27/54 ,  G03B27/58

CPC classification number: G03F7/709 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70891

Abstract: A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

Abstract translation: 投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。 联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。 投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。 投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

公开(公告)号：US07876452B2

公开(公告)日：2011-01-25

申请号：US12042253

申请日：2008-03-04

Applicant: Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirata ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

Inventor： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirata ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC: G01B11/02

CPC classification number: G01B9/02027 ,  G01B9/02021 ,  G03F7/70775 ,  G03F7/709

Abstract: Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Abstract translation: 公开了涉及相对于处理位置的移动和位置的干涉测量和其它测量的处理工具和方法，例如相对于平版印刷光学系统的平台的移动和位置。 一种示例性的设备包括：相对于工具放置工件并相对于工具在至少一个方向上可移动的平台。 至少一个第一干涉仪系统相对于台架设置以确定相对于处理位置的运动方向的台阶位置。 移动测量装置确定工具从过程位置的位移。 使用来自干涉仪系统和运动测量装置的数据，处理器确定舞台相对于工具的位置。 处理器还校正所确定的工具位移的位置。

公开(公告)号：US20080109178A1

公开(公告)日：2008-05-08

申请号：US11982656

申请日：2007-11-02

Applicant: Michael Sogard ,  Bausan Yuan ,  James Minor ,  Yu Tang

Inventor： Michael Sogard ,  Bausan Yuan ,  James Minor ,  Yu Tang

IPC: G06F19/00

CPC classification number: G01B9/02027 ,  G01B9/02021 ,  G01B9/0207 ,  G01B9/02083 ,  G03F7/705 ,  G03F7/70775

Abstract: A method and system for predicting a signal fluctuation due to a flow of gaseous fluid approximately transverse to an optical path between a stage and an interferometric measuring apparatus for determining a position of the stage in a direction of a stage movement. The method includes acquiring three interferometric signals of three parallel optical beams, lying within the flow of the gaseous fluid, reflected from predetermined portions of the stage, extracting a mutual signal fluctuation caused by fluctuations of the gaseous fluid properties from the three interferometric signals, and predicting a future fluctuation of the interferometric signals using a linear adaptive filter acting on the extracted mutual signal fluctuation. Prior to the processing with the adaptive filter, a low-pass filter removes high frequency stage motions, and an adaptive moving average algorithm removes low frequency stage motions. When applied to a two-moving axis configuration, it is possible to use only two interferometers in each direction because of the redundancy of measuring stage yaw.

Abstract translation: 一种方法和系统，用于预测由于气体流体的流动大致横向于级与干涉测量装置之间的光路的信号波动，用于确定舞台在舞台运动的方向上的位置。 该方法包括获取三个平行光束的三个干涉信号，该三个平行光束位于气态流体的流动中，从该阶段的预定部分反射，从三个干涉信号中提取由气态流体性质波动引起的相互信号波动，以及 使用作用于所提取的相互信号波动的线性自适应滤波器来预测干涉信号的未来波动。 在使用自适应滤波器进行处理之前，低通滤波器去除高频段运动，自适应移动平均算法去除低频段运动。 当应用于双移动轴构造时，由于测量级偏转的冗余，因此可以在每个方向上仅使用两个干涉仪。

公开(公告)号：US20070030462A1

公开(公告)日：2007-02-08

申请号：US11197576

申请日：2005-08-03

Applicant: Bausan Yuan ,  Martin Lee ,  Alton Phillips ,  Ping-Wei Chang ,  Akimitsu Ebihara

Inventor： Bausan Yuan ,  Martin Lee ,  Alton Phillips ,  Ping-Wei Chang ,  Akimitsu Ebihara

IPC: F16M1/00 ,  G03B27/00

CPC classification number: G02B7/005

Abstract: Embodiments of the present invention are directed to an apparatus for providing a low spring constant, pneumatic suspension using vacuum for the lens in a projection system. In one embodiment, a pneumatic suspension system for a load comprises a frame; and a body movably disposed in the frame and spaced from a side wall of the frame by a gap to define a chamber in the frame above the body, the body being configured to be connected to the load. The frame includes an outlet to draw a gas from the chamber to lower the pressure in the chamber with respect to an ambient pressure outside the frame. An air bearing is formed in the gap between the body and the side wall of the frame to provide non-contact between the body and the frame. The pressure in the chamber is sufficiently lower than the ambient pressure to produce a lift force to lift the body and the load connected thereto with respect to the frame.

Abstract translation: 本发明的实施例涉及一种用于在投影系统中为透镜提供使用真空的低弹簧常数气动悬架的装置。 在一个实施例中，用于负载的气动悬挂系统包括框架; 以及主体，其可移动地设置在所述框架中并且通过间隙与所述框架的侧壁间隔开以在所述主体中的所述框架中限定室，所述主体被配置为连接到所述负载。 该框架包括从腔室抽出气体的出口，以相对于框架外部的环境压力降低腔室中的压力。 空气轴承形成在主体和框架的侧壁之间的间隙中，以在主体和框架之间提供非接触。 室内的压力足够低于环境压力，以产生升高力以提升主体和相对于框架连接到其上的负载。

公开(公告)号：US20060241873A1

公开(公告)日：2006-10-26

申请号：US11115673

申请日：2005-04-26

Applicant: Yi-Ping Hsin ,  Gabor Szoboszlay ,  Kazuhiro Hirano ,  Kazuo Masaki ,  Christopher Smith ,  Ryoichi Kawaguchi ,  Bausan Yuan

Inventor： Yi-Ping Hsin ,  Gabor Szoboszlay ,  Kazuhiro Hirano ,  Kazuo Masaki ,  Christopher Smith ,  Ryoichi Kawaguchi ,  Bausan Yuan

IPC: G06F19/00

CPC classification number: G03F7/70766 ,  G03F7/70725

Abstract: Embodiments of the invention relate to a cable force feedforward approach that takes into account the cable force in the counter-mass trajectory computation to reduce or eliminate vibration of the lens body caused by the cable force disturbance and corrective force exerted by the trim motors. In one embodiment, a method provides cable force feedforward control for a counter-mass of a stage with a cable connected to the counter-mass and using the cable force feedforward control to control one or more trim motors to produce a trim motor output force to be applied to the counter-mass, the counter-mass moving in response to a reaction force from movement of the stage. The method comprises measuring a counter-mass position y of the counter-mass in response to forces applied to the counter-mass; measuring a cable force ƒ exerted on the counter-mass by the cable which is connected to the counter-mass; generating a cable force function {circumflex over (ƒ)}(y, {dot over (y)}) of the measured cable force ƒ versus the counter-mass position y; and computing the trim motor output force u as , where w is a weighting function having a value from 0 to 1 and is selected for optimization.

Abstract translation: 本发明的实施例涉及一种电缆力前馈方法，其考虑到反质量轨迹计算中的电缆力，以减少或消除由电缆力扰动引起的透镜体的振动和由修剪马达施加的校正力。 在一个实施例中，一种方法为具有连接到反质量体的电缆的级的反质量提供电缆力前馈控制，并且使用电缆力前馈控制来控制一个或多个微调电动机以产生微调电动机的输出力 应用于反质量体，响应于舞台运动的反作用力而进行反质量运动。 该方法包括响应于施加到反质量块的力量来测量反质量块的反质量位置y; 通过连接到反质量块的电缆测量施加在反质量块上的电缆力f; 产生电缆力函数{（f）}（y，{dot over（y））测量的电缆力f与反质量位置y的关系;以及计算微调电机输出力u，其中w是加权 函数具有从0到1的值并且被选择用于优化。