SUBSTRATE SUPPORTER
    21.
    发明公开
    SUBSTRATE SUPPORTER 审中-公开

    公开(公告)号:US20240321619A1

    公开(公告)日:2024-09-26

    申请号:US18439492

    申请日:2024-02-12

    CPC classification number: H01L21/6833 H01L21/67288 H01L21/02271

    Abstract: The present disclosure relates to substrate supporters and substrate processing apparatuses. An example substrate supporter includes an upper surface on which a substrate is loaded, a base, an outer dam extending along an edge of the base, a contact band connected with the outer dam, extending along the circumferential direction of the base, and onto which the substrate is loaded, and a first contact pattern disposed adjacent to the contact band and extending into an inside of the contact band, the first contact pattern extending along the circumferential direction of the base, where an area of the first contact pattern is larger than an area where the contact band overlaps with the substrate.

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    公开(公告)号:US20230230815A1

    公开(公告)日:2023-07-20

    申请号:US18188095

    申请日:2023-03-22

    Abstract: A plasma processing apparatus includes a chamber providing a space for processing a substrate, a substrate stage configured to support the substrate within the chamber and including a lower electrode, an upper electrode facing the lower electrode, a focus ring in or on an upper peripheral region of the substrate stage to surround the substrate, and a plasma adjustment assembly in at least one of a first position between the upper electrode and the lower electrode and a second position between the focus ring and the lower electrode, the plasma adjustment assembly including a photoreactive material layer and a plurality of light sources configured to irradiate light onto a local region of the photoreactive material layer. A capacitance of the local region is changed as the light is irradiated to the local region.

    Clothes care apparatus
    24.
    发明授权

    公开(公告)号:US11618991B2

    公开(公告)日:2023-04-04

    申请号:US16937003

    申请日:2020-07-23

    Abstract: A clothes care apparatus including: a main body including a clothes care room; a blower configured to form an airflow inside the clothes care room formed therein, and disposed between an upper part of the clothes care room and an upper part of the main body; and a duct configured to allow air inside the clothes care room to be introduced into the blower by the blower, and formed between a rear part of the main body and a rear part of the clothes care room, wherein the blower includes a blowing fan and a scroll to cover the blowing fan, and the scroll includes a flat portion formed to extend in a direction corresponding to an extension direction of the duct to guide the air into the blower.

    Front-end circuit performing analog-to-digital conversion and touch processing circuit including the same

    公开(公告)号:US11296719B2

    公开(公告)日:2022-04-05

    申请号:US16738077

    申请日:2020-01-09

    Abstract: A touch processing circuit includes: a front-end circuit including an amplifier, a first capacitor, a second capacitor, a third capacitor, and a plurality of switches each having two ends that are selectively connected each other, the front-end circuit being configured to process an input signal varying according to a touch; and a controller controlling the plurality of switches so that the front-end circuit is configured as a first circuit that accumulates deviation of the input signal between a first phase and a second phase during an integration period and a second circuit that converts the accumulated deviation into a digital signal during a conversion period.

    Display device and driving method thereof

    公开(公告)号:US12236839B1

    公开(公告)日:2025-02-25

    申请号:US18636934

    申请日:2024-04-16

    Abstract: A display device includes a pixel array including a plurality of pixels connected to a plurality of source lines, a voltage generator configured to generate a reference voltage, and a source driver configured to output a first source signal corresponding to a first source line among the plurality of source lines, receive a first return signal corresponding to the first source signal through a second source line positioned adjacent to the first source line, and generate a first count value based on a first comparison result of the first return signal and the reference voltage.

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

    公开(公告)号:US20220093369A1

    公开(公告)日:2022-03-24

    申请号:US17335659

    申请日:2021-06-01

    Abstract: A plasma processing apparatus includes a chamber providing a space for processing a substrate, a substrate stage configured to support the substrate within the chamber and including a lower electrode, an upper electrode facing the lower electrode, a focus ring in or on an upper peripheral region of the substrate stage to surround the substrate, and a plasma adjustment assembly in at least one of a first position between the upper electrode and the lower electrode and a second position between the focus ring and the lower electrode, the plasma adjustment assembly including a photoreactive material layer and a plurality of light sources configured to irradiate light onto a local region of the photoreactive material layer. A capacitance of the local region is changed as the light is irradiated to the local region.

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