公开(公告)号：US20210263411A1

公开(公告)日：2021-08-26

申请号：US16991281

申请日：2020-08-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yechan KIM ,  Su Min KIM ,  Ju-Young KIM ,  Jinjoo KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Hyunji SONG ,  Songse YI ,  Suk Koo HONG

IPC: G03F7/004 ,  C08L25/06 ,  C07C381/12 ,  C08L35/00

Abstract: A resist composition including a polymer; and a compound represented by Formula 1, in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,

公开(公告)号：US20210240079A1

公开(公告)日：2021-08-05

申请号：US17003373

申请日：2020-08-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Juhyeon PARK ,  Su Min KIM ,  Yechan KIM ,  Ju-Young KIM ,  Jinjoo KIM ,  Hyunwoo KIM ,  Hyunji SONG ,  Songse YI ,  Suk Koo HONG

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027 ,  H01L21/3213 ,  G03F7/20

Abstract: A photolithography method and a method of manufacturing a semiconductor device, the photolithography method including applying a composition on a substrate to form a photoresist layer; performing an exposing process using extreme ultraviolet radiation (EUV) on the photoresist layer; and developing the photoresist layer to form photoresist patterns, wherein the composition includes a photosensitive resin, a photo-acid generator, a photo decomposable quencher, an additive, and a solvent, and the additive is a compound represented by the following Formula 4A: in Formula 4A, R1 to R5 are each independently hydrogen or iodine, at least one of R1 to R5 being iodine.

公开(公告)号：US20230131429A1

公开(公告)日：2023-04-27

申请号：US17730532

申请日：2022-04-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jiyup KIM ,  Hyunwoo KIM ,  Hyun-Ji SONG ,  Juyoung KIM ,  Jinjoo KIM ,  Sunghwan PARK ,  Giyoung SONG

IPC: G03F7/004 ,  C07C381/12 ,  C07C309/12 ,  H01L21/027

Abstract: A photo-decomposable compound, a photoresist composition including the photo-decomposable compound, and a method of manufacturing an integrated circuit (IC) device using the photoresist composition, the photo-decomposable compound including a phenyl sulfonium cation component; and an anion component, wherein the phenyl sulfonium cation component has a protecting group, which is decomposable by an action of acid to generate an alkali-soluble group in response to exposure, the anion component generates acid in response to exposure, the protecting group is represented by *—C(═O)OR, in which R is a substituted or unsubstituted t-butyl group or a substituted or unsubstituted C3 to C30 alicyclic group, and * is a bonding site, and the protecting group is bonded to a phenyl group of the phenyl sulfonium cation component through an ether linking group.

公开(公告)号：US20230130998A1

公开(公告)日：2023-04-27

申请号：US17966970

申请日：2022-10-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yechan KIM ,  Hyunwoo KIM ,  Jicheol PARK ,  Honggu IM

IPC: G03F7/06 ,  G03F7/039

Abstract: A photoacid generator (PAG) and a photoresist composition including the PAG, the PAG being represented by Formula I below,

公开(公告)号：US20230123035A1

公开(公告)日：2023-04-20

申请号：US17826234

申请日：2022-05-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Juhyeon PARK ,  Hyunwoo KIM ,  Suk Koo HONG ,  Su Min KIM ,  Yechan KIM ,  Jicheol PARK ,  Honggu IM

IPC: G03F7/039 ,  G03F7/004 ,  C08F228/02 ,  C08F220/18 ,  C08F226/02 ,  C08F220/30 ,  C08F214/18

Abstract: The present disclosure relates to a polymer for photoresist and a photoresist composition including the same. The polymer for photoresist may include a polymerization unit comprising a sensitizer, and a protection group. The polymerization unit may include a structure of chemical formula 1: wherein R1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and n is an integer of 1 to 100,000.

公开(公告)号：US20230016223A1

公开(公告)日：2023-01-19

申请号：US17747210

申请日：2022-05-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jihun HEO ,  Hyunwoo KIM ,  Jihoon PARK ,  Seungho HWANG

IPC: G06V40/13 ,  G06F3/042 ,  G06F3/041 ,  G06F1/16

Abstract: According to certain embodiments of the disclosure, an electronic device comprising: a support member having a first hole; a first fingerprint sensor disposed in the first hole; and a non-conductive injection molding material integrally joining the support member and the first fingerprint sensor.

公开(公告)号：US20220374054A1

公开(公告)日：2022-11-24

申请号：US17715165

申请日：2022-04-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jihun HEO ,  Hyunwoo KIM ,  Jihoon PARK ,  Seungho HWANG

IPC: G06F1/16 ,  G06V40/13

Abstract: According to certain embodiments, a foldable electronic device comprises: a first housing; a hinge; a second housing coupled to the first housing by the hinge; a first display disposed on a front surface of the first housing, and a second display disposed on a front surface of the second housing; a sensor mounting module disposed in the second housing; a first fingerprint sensor that is mounted on the sensor mounting module and disposed between the front surface of the second housing and the second display; and a second fingerprint sensor that is mounted on the sensor mounting module and is disposed on a rear surface of the second housing.

公开(公告)号：US20220337687A1

公开(公告)日：2022-10-20

申请号：US17850042

申请日：2022-06-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jihun HEO ,  Jihoon PARK ,  Seungho HWANG ,  Bongjae RHEE ,  Dongchurl KIM ,  Hyunwoo KIM ,  Sanggeun HAN

IPC: H04M1/02 ,  G06F1/16 ,  G06V40/13

Abstract: An electronic device includes a display module including: a housing; a display including a first panel including a first surface, a second surface opposite the first surface, and a plurality of pixels interposed between the first surface and the second surface; a cover layer disposed on the first surface of the first panel; a second panel disposed on the second surface of the first panel; and a sensor coupled to the second surface of the first panel to provide a sensing area on the one surface of the housing.

公开(公告)号：US20220252976A1

公开(公告)日：2022-08-11

申请号：US17567956

申请日：2022-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyun-Ji SONG ,  Hyunwoo KIM ,  Sukkoo HONG

IPC: G03F7/004

Abstract: Photoresist compositions may include a metal structure, a radical quencher including a phenolic compound, a photobase generator, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed on a lower film using the photoresist composition. A first area, which is a portion of the photoresist film, is exposed to form a metal network from the metal structure in the first area of the photoresist film, a base is generated from the photobase generator in the first area of the photoresist film, and the radical quencher is deactivated using the base in the first area of the photoresist film. The photoresist film is developed to form a photoresist pattern including the first area. The lower film is processed using the photoresist pattern.

公开(公告)号：US20210204135A1

公开(公告)日：2021-07-01

申请号：US17057848

申请日：2019-05-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jungil CHO ,  Soonhong KWON ,  Hyunwoo KIM ,  Minkyu SONG ,  Jongsung LEE ,  Joonghwan LEE ,  Yongsu CHUNG ,  Daesung CHOI

IPC: H04W12/122 ,  H04W12/73 ,  H04W12/02 ,  H04W12/61

Abstract: A method of identifying a malicious AP by a terminal apparatus includes obtaining first performance information related to hardware of a first AP based on a first beacon signal received from the first AP, comparing the first performance information with previously stored second performance information of a second AP, and determining whether the first AP is a malicious AP, based on a result of the comparing.