公开(公告)号：US20230131429A1

公开(公告)日：2023-04-27

申请号：US17730532

申请日：2022-04-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jiyup KIM ,  Hyunwoo KIM ,  Hyun-Ji SONG ,  Juyoung KIM ,  Jinjoo KIM ,  Sunghwan PARK ,  Giyoung SONG

IPC: G03F7/004 ,  C07C381/12 ,  C07C309/12 ,  H01L21/027

Abstract: A photo-decomposable compound, a photoresist composition including the photo-decomposable compound, and a method of manufacturing an integrated circuit (IC) device using the photoresist composition, the photo-decomposable compound including a phenyl sulfonium cation component; and an anion component, wherein the phenyl sulfonium cation component has a protecting group, which is decomposable by an action of acid to generate an alkali-soluble group in response to exposure, the anion component generates acid in response to exposure, the protecting group is represented by *—C(═O)OR, in which R is a substituted or unsubstituted t-butyl group or a substituted or unsubstituted C3 to C30 alicyclic group, and * is a bonding site, and the protecting group is bonded to a phenyl group of the phenyl sulfonium cation component through an ether linking group.

公开(公告)号：US20250044706A1

公开(公告)日：2025-02-06

申请号：US18674355

申请日：2024-05-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ji Young PARK ,  Daekeon KIM ,  Seungyeol BAEK ,  Giyoung SONG ,  Hyun-Ji SONG ,  Thanh Cuong NGUYEN ,  Suk Koo HONG

IPC: G03F7/00

Abstract: In a method of predicting extreme ultraviolet (EUV) dose, an entire photochemical reaction mechanism until a photoacid generator (PAG) molecule releases a proton from a PAG-cation under EUV exposure may be analyzed. A lowest unoccupied molecular orbital (LUMO) energy level may be obtained by performing a simulation for structural optimization of the PAG-cation. An additional parameter different from the LUMO energy level may be obtained by performing a simulation for structural optimization of at least one intermediate molecular structure formed by the entire photochemical reaction mechanism. A two-parameter linear regression model for predicting the EUV dose may be obtained based on the LUMO energy level and the additional parameter.

公开(公告)号：US20240337928A1

公开(公告)日：2024-10-10

申请号：US18613810

申请日：2024-03-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Haengdeog KOH ,  Hyeran KIM ,  Youngmin NAM ,  Giyoung SONG ,  Changheon LEE ,  Aram JEON ,  Jungha CHAE ,  Songse YI ,  Sukkoo HONG

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition.




A description of Formula 1 is provided herein.

公开(公告)号：US20230324791A1

公开(公告)日：2023-10-12

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung LEE ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Giyoung SONG ,  Sukkoo HONG ,  Yoonhyun KWAK ,  Youngmin NAM ,  Byunghee SOHN ,  Sunyoung LEE ,  Aram JEON ,  Sungwon CHOI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:





wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20230288806A1

公开(公告)日：2023-09-14

申请号：US18098233

申请日：2023-01-18

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jiyup KIM ,  Hyunwoo KIM ,  Sung Hwan PARK ,  Juhyeon PARK ,  Giyoung SONG

IPC: G03F7/039 ,  G03F7/004 ,  C08F220/28 ,  C08F216/10 ,  H01L21/027

CPC classification number: G03F7/0397 ,  C08F216/10 ,  C08F220/283 ,  G03F7/0045 ,  H01L21/0274

Abstract: A photosensitive polymer includes a first repeating unit represented by Formula 1 below:





wherein, in Formula 1, R1 is a hydrogen atom or a methyl group, R2 is a substituted or unsubstituted C1 to C30 acid-labile hydrocarbylene group having a tertiary carbon atom, R3 is a C1 to C10 linear or branched alkyl group, a C3 to C30 tertiary alicyclic group, a C6 to C20 aryl group, a C2 to C20 heteroaryl group, a C7 to C20 arylalkyl group, or a C2 to C20 heteroarylalkyl group, and n is 0 or 1. To manufacture an integrated circuit (IC) device, a change in the polarity of the photosensitive polymer is induced by causing a multi-step deprotection reaction of the first repeating unit.

公开(公告)号：US20230194985A1

公开(公告)日：2023-06-22

申请号：US18076818

申请日：2022-12-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jinjoo KIM ,  Sumin KIM ,  Hyunwoo KIM ,  Yechan KIM ,  Juyoung KIM ,  Jicheol PARK ,  Giyoung SONG ,  Suk Koo HONG

IPC: G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0392 ,  H01L21/0276 ,  H01L21/0275

Abstract: A brush polymer for a photoresist, a photoresist composition, and a method of manufacturing an integrated circuit device, the brush polymer including a core and a plurality of side polymer chains, the plurality of side polymer chains being bonded to the core and extending from the core to form a bottle-brush polymer or a star-brush polymer, together with the core, wherein each of the plurality of side polymer chains includes a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2:

公开(公告)号：US20220171284A1

公开(公告)日：2022-06-02

申请号：US17238355

申请日：2021-04-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung LEE ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Giyoung SONG ,  Sukkoo HONG ,  Yoonhyun KWAK ,  Youngmin NAM ,  Byunghee SOHN ,  Sunyoung LEE ,  Aram JEON ,  Sungwon CHOI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C309/12 ,  C07D333/76

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.