Abstract:
An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate.
Abstract:
A display panel includes a substrate, a thin-film transistor (TFT) disposed on the substrate, a first electrode electrically connected to the thin-film transistor, a roof layer disposed on the first electrode and a liquid crystal layer. The roof layer includes an organic insulating material, and defines a cavity that overlaps the first electrode. The liquid crystal layer is disposed in the cavity and is in direct contact with the roof layer.
Abstract:
In a display panel, a thin film transistor is connected to a gate line and a data line, and includes a gate electrode, a semiconductor pattern, a source electrode and a drain electrode. An organic pattern makes contact with a side surface of the data line and a side surface of the thin film transistor, and the organic pattern overlaps pixel areas of the display panel. A first passivation layer is on the data line, the thin film transistor and the organic pattern. A common electrode is on the first passivation layer, and the common electrode overlaps the pixel areas. A second passivation layer covers the common electrode. A pixel electrode is on the second passivation layer, the pixel electrode overlaps the common electrode, and the pixel electrode is electrically connected to the drain electrode through a first contact hole and the data line through a second contact hole.
Abstract:
A mask includes a transparent substrate and a light blocking pattern. The light blocking pattern includes a light blocking part and a diffraction pattern. The light blocking part is disposed on the transparent substrate and is configured to block light. The diffraction pattern includes a plurality of protrusion parts and is configured to diffract the light. The plurality of protrusion parts protrudes from a side of the blocking part and is separated from each other.
Abstract:
A display substrate includes a substrate having a first region and a second region, a conductive pattern is provided in the first region of the substrate and includes a first conductive pattern and a second conductive pattern, the first conductive pattern has a gate electrode and a source electrode, the second conductive pattern has a source electrode and a drain electrode, an insulation layer pattern is positioned on the conductive pattern and exposes an outer sidewall of the conductive pattern, an organic layer is provided in the first region and the second region of the substrate and covers the insulation layer pattern, and a pixel electrode is provided on the organic layer and is electrically connected to the drain electrode through a contact hole in the organic layer.
Abstract:
According to an exemplary embodiment of the present invention, a photomask includes a transparent substrate and a polarizing pattern. A polarizing pattern is disposed on a transparent substrate. The polarizing pattern polarize light.
Abstract:
A method of planarizing a substrate includes forming a conductive pattern on a first surface of a base substrate, forming a positive photoresist layer on the base substrate and the conductive pattern, exposing the positive photoresist layer to light by irradiating a second surface of the base substrate opposite to the first surface with light, developing the positive photoresist layer to form a protruded portion on the conductive pattern, forming a planarizing layer on the base substrate and the protruded portion and eliminating the protruded portion.
Abstract:
A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.
Abstract:
A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.