公开(公告)号：US20210341377A1

公开(公告)日：2021-11-04

申请号：US17273264

申请日：2019-09-05

Applicant: Lam Research Corporation

Inventor： Amir A. YASSERI ,  Girish M. HUNDI ,  John Michael KERNS ,  Duane OUTKA ,  John DAUGHERTY ,  Cliff LA CROIX

IPC: G01N15/14 ,  G01N1/22

Abstract: An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel, wherein the critical surface of the part is exposed to the inert gas when the part is mounted in the vessel. At least one analyzer is adapted to receive inert gas from the at least one diffuser and measures contaminants in the inert gas.

公开(公告)号：US20180318890A1

公开(公告)日：2018-11-08

申请号：US15969626

申请日：2018-05-02

Applicant: Lam Research Corporation

Inventor： Amir A. YASSERI ,  Hong SHIH ,  John DAUGHERTY ,  Duane OUTKA ,  Lin XU ,  Armen AVOYAN ,  Cliff LA CROIX ,  Girish HUNDI

IPC: B08B7/04 ,  H01J37/32 ,  B08B3/12 ,  B08B3/04 ,  B08B3/14 ,  B08B5/02

CPC classification number: B08B7/04 ,  B08B3/048 ,  B08B3/12 ,  B08B3/14 ,  B08B5/02 ,  H01J37/32853

Abstract: An apparatus for conditioning a component of a processing chamber is provided. A tank for holding a megasonic conditioning solution is provided. A mount holds the component immersed in a megasonic conditioning solution, when the tank is filled with the megasonic conditioning solution. A megasonic conditioning solution inlet system delivers the megasonic conditioning solution to the tank. A megasonic transducer head comprises at least one megasonic transducer to provide megasonic energy to the megasonic conditioning solution, wherein the megasonic energy is delivered to the component via the megasonic conditioning solution. A megasonic conditioning solution drain system drains the megasonic conditioning solution from the tank at a location above where the component is held in the megasonic conditioning solution. An actuator moves the megasonic transducer head across the tank.

公开(公告)号：US20180047594A1

公开(公告)日：2018-02-15

申请号：US15235660

申请日：2016-08-12

Applicant: Lam Research Corporation

Inventor： Lin XU ,  Hong SHIH ,  Robin KOSHY ,  John DAUGHERTY ,  Satish SRINIVASAN

IPC: H01L21/67 ,  H01L21/311 ,  H01L21/3213

CPC classification number: H01L21/67069 ,  H01L21/02123 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/32137 ,  H01L21/67086 ,  H01L21/6831

Abstract: A method for conditioning and cleaning a silicon part is provided. The silicon part is heated to a temperature of at least 300° C. in the presence of oxygen to form an outer surface of the silicon part into silicon oxide. The silicon part is placed in a wet bath wherein the bath is a solution that selectively etches silicon oxide with respect to silicon.

公开(公告)号：US20170040146A1

公开(公告)日：2017-02-09

申请号：US14817115

申请日：2015-08-03

Applicant: Lam Research Corporation

Inventor： Lihua Li HUANG ,  Hong SHIH ,  Lin XU ,  John DAUGHERTY

IPC: H01J37/32 ,  C23C14/30 ,  C23C16/30 ,  C23C14/06

CPC classification number: H01J37/32495 ,  C23C14/06 ,  C23C16/30 ,  H01J37/32119 ,  H01J37/3244 ,  H01J37/32477 ,  H01J37/32504 ,  H01J37/32642 ,  H01J37/32715

Abstract: An apparatus for use in a plasma processing chamber is provided. The apparatus comprises part body and a coating with a thickness of no more than 30 microns consisting essentially of a Lanthanide series or Group III or Group IV element in an oxyfluoride covering a surface of the part body.

Abstract translation: 提供了一种用于等离子体处理室的设备。 该装置包括部件体和厚度不超过30微米的涂层，其基本上由覆盖部件主体表面的氟氧化物中的镧系元素或III族或IV族元素组成。

公开(公告)号：US20170018408A1

公开(公告)日：2017-01-19

申请号：US14800583

申请日：2015-07-15

Applicant: Lam Research Corporation

Inventor： Lin XU ,  Hong SHIH ,  John DAUGHERTY ,  Satish SRINIVASAN ,  Siwen LI

IPC: H01J37/32 ,  B32B38/00 ,  B32B18/00 ,  B32B37/24 ,  C01F17/00 ,  C04B35/64

CPC classification number: H01J37/32495 ,  B32B18/00 ,  B32B37/24 ,  B32B38/0008 ,  B32B2250/02 ,  B32B2307/412 ,  B32B2310/14 ,  B32B2315/02 ,  C01F17/0012 ,  C01F17/0043 ,  C01F17/0062 ,  C04B35/505 ,  C04B35/64 ,  C04B37/005 ,  C04B37/008 ,  C04B2235/3217 ,  C04B2235/3225 ,  C04B2235/616 ,  C04B2235/785 ,  C04B2235/963 ,  C04B2235/9653 ,  C04B2237/10 ,  C04B2237/34 ,  C04B2237/343 ,  C04B2237/348 ,  C04B2237/36 ,  C04B2237/366 ,  C04B2237/62 ,  H01J37/32009 ,  H01J37/32715

Abstract: In accordance with this disclosure, there are provided several inventions, including an apparatus and method for creating a plasma resistant part, which may be formed of a sintered nanocrystalline ceramic material comprising yttrium, oxide, and fluoride. Example parts thus made may include windows, edge rings, or injectors. In one configuration, the parts may be yttria co-sintered with alumina, which may be transparent.

Abstract translation: 根据本公开，提供了几个发明，包括用于产生等离子体抗蚀部分的装置和方法，其可以由包含钇，氧化物和氟化物的烧结纳米晶体陶瓷材料形成。 由此制成的示例部件可以包括窗口，边缘环或喷射器。 在一种构造中，这些部件可以是与氧化铝共烧结的氧化钇，氧化铝可以是透明的。

公开(公告)号：US20160379806A1

公开(公告)日：2016-12-29

申请号：US14750714

申请日：2015-06-25

Applicant: Lam Research Corporation

Inventor： Lin XU ,  Nash W. ANDERSON ,  John DAUGHERTY ,  Thomas R. STEVENSON ,  John Michael KERNS

IPC: H01J37/32 ,  H02N13/00 ,  C23C16/06 ,  H01L21/683 ,  B32B37/12 ,  C23C16/455

CPC classification number: H01J37/32495 ,  B32B37/18 ,  B32B2311/24 ,  B32B2315/02 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45525 ,  H01J37/32513 ,  H01J37/32642 ,  H01J37/32715 ,  H01L21/6833 ,  H02N13/00

Abstract: In accordance with this disclosure, there are provided several inventions, including an apparatus and method for depositing plasma resistant coatings on polymer materials used in a plasma processing chamber. In a particular example, such a coating may be made on a portion of an electrostatic chuck, where the polymer material is a bead surrounding an adhesive between a chuck base and a ceramic top plate.

Abstract translation: 根据本公开，提供了若干发明，包括用于在等离子体处理室中使用的聚合物材料上沉积耐等离子体涂层的装置和方法。 在一个具体实例中，这样的涂层可以在静电卡盘的一部分上制成，其中聚合物材料是围绕卡盘基底和陶瓷顶板之间的粘合剂的珠粒。