公开(公告)号：US20160141425A1

公开(公告)日：2016-05-19

申请号：US14777666

申请日：2015-02-27

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuang Sun ,  Fangzhen Zhang ,  Jing Niu ,  Zhijun Lv

IPC: H01L29/786 ,  H01L27/12

CPC classification number: H01L29/78675 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/41733 ,  H01L29/66757 ,  H01L29/78633 ,  H01L29/78696

Abstract: The present disclosure discloses a thin film transistor assembly, an array substrate and a method of manufacturing the same, and a display device including the array substrate. The array substrate includes a substrate; a plurality of thin film transistors formed on the substrate; and a plurality of light shielding layers, each of the light shielding layers being arranged between a source electrode and a drain electrode of the thin film transistor and configured to block light from the exterior from illuminating an active layer of the thin film transistor. The light shielding layer and the source electrode and the drain electrode of the thin film transistor are formed in the same layer on the substrate. As the light shielding layer, the source electrode and the drain electrode of the thin film transistor and a data line may be formed on the substrate by using the same material layer through a single patterning process, times of performing patterning processes and the number of masks used may be reduced and thus manufacturing process and cost of the array substrate may be decreased.

Abstract translation: 本公开公开了一种薄膜晶体管组件，阵列基板及其制造方法，以及包括阵列基板的显示装置。 阵列基板包括基板; 形成在所述基板上的多个薄膜晶体管; 和多个遮光层，每个遮光层设置在薄膜晶体管的源电极和漏电极之间，并被构造成阻挡来自外部的光照射薄膜晶体管的有源层。 薄膜晶体管的遮光层和源电极以及漏极形成在基板上的同一层中。 作为遮光层，可以通过使用相同的材​​料层，通过单一的图案化工艺，进行图案化处理的次数和掩模的数量，在基板上形成薄膜晶体管的源电极和漏电极以及数据线 可以减少使用，因此阵列基板的制造工艺和成本可能降低。

公开(公告)号：US20150221669A1

公开(公告)日：2015-08-06

申请号：US13995105

申请日：2012-12-10

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuang Sun

IPC: H01L27/12 ,  H01L21/306 ,  H01L21/768 ,  H01L29/786 ,  H01L29/417

CPC classification number: H01L27/124 ,  H01L21/30604 ,  H01L21/76802 ,  H01L21/76877 ,  H01L27/1288 ,  H01L29/41733 ,  H01L29/66765 ,  H01L29/78618 ,  H01L29/78696

Abstract: A thin film transistor, an array substrate (1) and a manufacturing method thereof are provided. The thin film transistor comprises a substrate (1) and a gate electrode (2), a gate insulating layer (3), a semiconductor layer (4), a protective layer (5), an ohmic contact layer (6), a source electrode (7) and a drain electrode (8) successively stacked on the substrate (1), wherein the protective layer (5) has two via holes (11) over the semiconductor layer (4) so as to expose the underlying semiconductor layer (4), the semiconductor layer (4) exposed by the via hole (11) is covered by the ohmic contact layer (6); the source and drain electrodes (7, 8) are connected to the semiconductor layer (4) through the ohmic contact layer (6) at the via hole (11).

Abstract translation: 提供薄膜晶体管，阵列基板（1）及其制造方法。 薄膜晶体管包括基板（1）和栅电极（2），栅极绝缘层（3），半导体层（4），保护层（5），欧姆接触层（6），源极 电极（7）和依次层叠在基板（1）上的漏电极（8），其中保护层（5）在半导体层（4）上方具有两个通孔（11），以暴露下面的半导体层 如图4所示，由通孔（11）露出的半导体层（4）被欧姆接触层（6）覆盖; 源极和漏极（7,8）在通孔（11）处通过欧姆接触层（6）连接到半导体层（4）。

公开(公告)号：US12167642B2

公开(公告)日：2024-12-10

申请号：US17769937

申请日：2021-05-21

Applicant: BOE Technology Group Co., Ltd.

Inventor： Shuang Sun ,  Fangzhen Zhang ,  Jing Niu ,  Yanan Niu ,  Jintao Peng ,  Lubin Shi

IPC: H01L27/14 ,  H01L27/12 ,  H10K59/121 ,  H10K59/131

Abstract: The present disclosure provides a display substrate and a display device. The display substrate includes a pixel circuit, and the pixel circuit includes a light-emitting element, a driving circuit and a capacitor circuit. The driving circuit is configured to drive the light-emitting element to emit light; a first terminal of the capacitor circuit is electrically connected to a control terminal of the driving circuit, and a second terminal of the capacitor circuit is electrically connected to a data writing-in node; the capacitor circuit includes at least two capacitors connected in parallel with each other.

公开(公告)号：US20240274768A1

公开(公告)日：2024-08-15

申请号：US18023443

申请日：2022-05-24

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuang Sun ,  Fangzhen Zhang ,  Jing Niu

IPC: H01L33/62 ,  H01L25/075 ,  H01L33/54

CPC classification number: H01L33/62 ,  H01L25/0753 ,  H01L33/54 ,  H01L2933/005 ,  H01L2933/0066

Abstract: A display substrate includes: a base substrate, a display functional layer located on a first side surface of the base substrate, where the display functional layer includes an encapsulation layer, and a plurality of metal lines located on a second side surface of the base substrate, a first gap being provided between adjacent metal lines. A first orthographic projection of the encapsulation layer onto the base substrate at least partially does not overlap a second orthographic projection of the first gap onto the base substrate, and/or, a light-shielding layer is arranged at a side of the encapsulation layer facing the metal lines, the light-shielding layer is located on the first side surface of the base substrate, and a third orthographic projection of the light-shielding layer onto the base substrate at least partially overlaps the second orthographic projection.

公开(公告)号：US11231595B2

公开(公告)日：2022-01-25

申请号：US16442975

申请日：2019-06-17

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Xiaolong Li ,  Wei Qin ,  Kuanjun Peng ,  Xueling Gao ,  Fangzhen Zhang ,  Jintao Peng ,  Jinqian Wang ,  Miaomiao Yang ,  Shuang Sun ,  Chunfang Zhang ,  Shengnan Li

IPC: G02B30/56 ,  G02B30/25 ,  G02B5/124

Abstract: A semi-transparent semi-retroreflective film and an air display device are provided. The air display device includes: a first polarizer and a second polarizer assembled with each other to form a cell; a semi-transparent semi-reflective structure and a semi-transparent semi-retroreflective film disposed between the first polarizer and the second polarizer; a first ¼ wave plate disposed at a side of the air display device adjacent to the first polarizer; and a second ¼ wave plate disposed between the semi-transparent semi-reflective structure and the semi-transparent semi-retroreflective film. The air display device is configured such that polarized light incident from the first polarizer, after being processed by an internal optical path of the air display device, exits from the second polarizer to form an air image at a side of the air display device away from the first polarizer.

公开(公告)号：US10217851B2

公开(公告)日：2019-02-26

申请号：US15707827

申请日：2017-09-18

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Jing Niu ,  Shuang Sun ,  Fangzhen Zhang ,  Dongcan Mi

IPC: H01L29/66 ,  H01L21/443 ,  H01L21/4763 ,  H01L29/786 ,  H01L27/12

Abstract: Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

公开(公告)号：US20180122924A1

公开(公告)日：2018-05-03

申请号：US15707827

申请日：2017-09-18

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Jing Niu ,  Shuang Sun ,  Fangzhen Zhang ,  Dongcan Mi

IPC: H01L29/66 ,  H01L27/12 ,  H01L29/786 ,  H01L21/443 ,  H01L21/4763

CPC classification number: H01L29/66969 ,  H01L21/443 ,  H01L21/47635 ,  H01L27/1225 ,  H01L27/1288 ,  H01L29/78618 ,  H01L29/7869

Abstract: Embodiments of the disclosure provide an array substrate and a manufacturing method thereof, and a display device. The method includes: forming a semiconductor material film, a first insulation material film and a first conductive material film successively on a base substrate, and processing these films through a single patterning process to form an active pattern, a gate insulation pattern and a gate electrode; forming a second insulation layer and forming two contact holes in the second insulation layer and gate insulation pattern; forming a second conductive material film and forming two contact structures from portions of this layer; and forming a third conductive material film, and processing this layer through a single patterning process to form a pixel electrode, and source and drain electrodes being in direct contact with the two contact structures respectively, the pixel electrode and one contact structure being integrated into one piece.

公开(公告)号：US09627421B2

公开(公告)日：2017-04-18

申请号：US14443474

申请日：2014-10-01

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuang Sun ,  Seungjin Choi ,  Jing Niu ,  Fangzhen Zhang

IPC: H01L27/12 ,  H01L27/32 ,  G02F1/1343 ,  H01L21/77 ,  G02F1/1333 ,  G02F1/1368 ,  H01L29/786 ,  G02F1/1362

CPC classification number: H01L27/1288 ,  G02F1/133345 ,  G02F1/134309 ,  G02F1/13439 ,  G02F1/136227 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136231 ,  G02F2001/136236 ,  G02F2001/13625 ,  G02F2001/136295 ,  H01L21/77 ,  H01L27/12 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/127 ,  H01L27/32 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/4908 ,  H01L29/78642 ,  H01L29/7869 ,  H01L29/78696

Abstract: An array substrate and manufacturing method thereof and a display device. The display device includes a pixel electrode (8), including a first portion (b) in a non-display region and a second portion (a) in a display region; a first electrode (6) formed on the first portion (b) of the pixel electrode (8); a passivation layer (9) formed on the pixel electrode (8) and the first electrode (6), the passivation layer (9) includes a via hole (11) located over the first electrode (6); an active layer (4) and a second electrode (7) that are formed on the passivation layer (9), the active layer (4) being connected to the first electrode (6) through the via hole (11) of the passivation layer (9). With the array substrate and the manufacturing method thereof, the manufacturing cost is reduced, materials of the electrodes are less subjected to corrosion, and quality of the array substrate is enhanced.

公开(公告)号：US09543443B2

公开(公告)日：2017-01-10

申请号：US14777666

申请日：2015-02-27

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuang Sun ,  Fangzhen Zhang ,  Jing Niu ,  Zhijun Lv

IPC: H01L29/786 ,  H01L27/12 ,  H01L29/417

CPC classification number: H01L29/78675 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/41733 ,  H01L29/66757 ,  H01L29/78633 ,  H01L29/78696

Abstract: The present disclosure discloses a thin film transistor assembly, an array substrate and a method of manufacturing the same, and a display device including the array substrate. The array substrate includes a substrate; a plurality of thin film transistors formed on the substrate; and a plurality of light shielding layers, each of the light shielding layers being arranged between a source electrode and a drain electrode of the thin film transistor and configured to block light from the exterior from illuminating an active layer of the thin film transistor. The light shielding layer and the source electrode and the drain electrode of the thin film transistor are formed in the same layer on the substrate. As the light shielding layer, the source electrode and the drain electrode of the thin film transistor and a data line may be formed on the substrate by using the same material layer through a single patterning process, times of performing patterning processes and the number of masks used may be reduced and thus manufacturing process and cost of the array substrate may be decreased.

Abstract translation: 本公开公开了一种薄膜晶体管组件，阵列基板及其制造方法，以及包括阵列基板的显示装置。 阵列基板包括基板; 形成在所述基板上的多个薄膜晶体管; 和多个遮光层，每个遮光层设置在薄膜晶体管的源电极和漏电极之间，并被构造成阻挡来自外部的光照射薄膜晶体管的有源层。 薄膜晶体管的遮光层和源电极以及漏极形成在基板上的同一层中。 作为遮光层，可以通过使用相同的材​​料层，通过单一的图案化工艺，进行图案化处理的次数和掩模的数量，在基板上形成薄膜晶体管的源电极和漏电极以及数据线 可以减少使用，因此阵列基板的制造工艺和成本可能降低。

公开(公告)号：US09190432B2

公开(公告)日：2015-11-17

申请号：US14355330

申请日：2013-04-24

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Shuang Sun

IPC: H01L27/12

CPC classification number: H01L27/1288 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/127 ,  H01L29/66969 ,  H01L29/7869

Abstract: An oxide thin-film transistor (TFT) array substrate, a manufacturing method thereof and a display panel are provided. In the manufacturing method, a pattern of a gate insulating layer (13), an oxide active layer (14) and an etch barrier layer (15) is formed on a substrate (10) on which a pattern of a gate line (11) and a gate electrode (12) is formed, by one patterning process.

Abstract translation: 提供氧化物薄膜晶体管（TFT）阵列基板，其制造方法和显示面板。 在制造方法中，在栅极线（11）的图形上形成有栅极绝缘层（13），氧化物活性层（14）和蚀刻阻挡层（15）的图案， 并通过一个图案化工艺形成栅电极（12）。