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公开(公告)号：US20160276057A1
公开(公告)日：2016-09-22
申请号：US15033455
申请日：2014-10-29
Applicant: ARKEMA FRANCE , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , UNIVERSITE DE BORDEAUX , INSTITUT POLYTECHNIQUE DE BORDEAUX
Inventor： Christophe NAVARRO , Wiljan SMAAL , Muhammad MUMTAZ , Eric CLOUTET , Cyril BROCHON , Georges HADZIIOANNOU
CPC classification number: H01B1/24 , C08F2438/03 , C08K3/04 , C08K3/041 , H01L51/004 , H01L51/0048 , H01L51/444 , H01L51/5206 , H01L51/5234
Abstract: The invention relates to stable compositions of carbon nanotubes and of electrolytic polymers, these electrolytic polymers being characterized by the presence of phosphonyl imide or sulfonyl imide functions or alternatively phosphoric acid functions. The invention also relates to the manufacture of transparent electrodes comprising these compositions of carbon nanotubes and of electrolytic polymers.
Abstract translation: 本发明涉及碳纳米管和电解聚合物的稳定组合物，这些电解聚合物的特征在于存在膦酰亚胺或磺酰亚胺的功能或者磷酸的功能。 本发明还涉及包括这些碳纳米管组合物和电解聚合物的透明电极的制造。
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22.发明申请METHOD FOR THE PERPENDICULAR ORIENTATION OF NANODOMAINS OF BLOCK COPOLYMERS, USING STATISTICAL OR GRADIENT COPOLYMERS, THE MONOMERS OF WHICH DIFFER AT LEAST IN PART FROM THOSE PRESENT IN EACH OF THE BLOCKS OF THE BLOCK COPOLYMER 审中-公开使用统计或梯度共聚物的嵌段共聚物纳米粒子的均匀取向的方法，其中每个单体不同于在块嵌段共聚物中的至少一个单体公开(公告)号：US20160154302A1
公开(公告)日：2016-06-02
申请号：US14904325
申请日：2014-07-10
Applicant: ARKEMA FRANCE , UNIVERSITE DE BORDEAUX , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , INSTITUT POLYTECHNIQUE DE BORDEAUX
Inventor： Christophe NAVARRO , Chrystilla REBOUL , Guillaume FLEURY , Gilles PECASTAINGS , Georges HADZIIOANNOU
IPC: G03F7/00 , C09D153/00
CPC classification number: G03F7/0002 , B82Y40/00 , C09D153/00
Abstract: The present invention relates to a process for the perpendicular orientation of nanodomains of block copolymers on a substrate by using a sublayer of random or gradient copolymers whose monomers differ at least in part from those present, respectively, in each of the blocks of the block copolymer.
Abstract translation: 本发明涉及通过使用无规或梯度共聚物的子层将嵌段共聚物的纳米域垂直取向的方法，所述无规或梯度共聚物的单体至少部分地与存在于嵌段共聚物嵌段 。
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23.发明申请PROCESS FOR CONTROLLING THE PERIOD CHARACTERIZING THE MORPHOLOGY OBTAINED FROM A BLEND OF BLOCK COPOLYMERS AND OF CO(POLYMERS) OF ONE OF THE BLOCKS 有权控制块状共聚物和块体之一的CO（聚合物）混合物获得的形态的期间的方法公开(公告)号：US20150030971A1
公开(公告)日：2015-01-29
申请号：US14340075
申请日：2014-07-24
Applicant: Arkema France
Inventor： Christophe NAVARRO , Xavier CHEVALIER , Celia NICOLET
CPC classification number: B05D3/046 , B05D3/0254 , B05D3/0493 , C08F2/001 , C08F297/026 , C09D153/00 , G03F1/68 , G03F7/00 , G03F7/0002 , C08L25/06
Abstract: The present invention relates to a process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co)polymers of one of the blocks on a surface employing a particular way of carrying out the synthesis of the blend of block copolymers and of (co)polymers of one of the blocks.
Abstract translation: 本发明涉及一种用于控制表面形貌的时期的方法，其特征在于使用嵌段共聚物的共混物和表面上的一个嵌段的（共））聚合物，其特征在于使用特定的方式进行嵌段共聚物的共混物 和其中一个嵌段的（共）聚合物。
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公开(公告)号：US20190002684A1
公开(公告)日：2019-01-03
申请号：US16061912
申请日：2016-12-16
Applicant: ARKEMA FRANCE
Inventor： Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: C08L53/00 , C08F4/609 , C08F297/02 , C08F220/18 , C08F212/08
Abstract: Provided is a process for reducing the structuring time of an ordered film of a diblock copolymer on a surface. The process includes curing, on a surface, a composition including a diblock copolymer at a structuring temperature between the Tg of the diblock copolymer and the decomposition temperature of the diblock copolymer to form an ordered film of the diblock copolymer on the substrate. The composition has a product χeffective*N of between 10.5 and 40 at the structuring temperature, where χeffective is the Flory-Huggins parameter of the diblock copolymer and N is the total degree of polymerization of the blocks of the diblock copolymer.
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公开(公告)号：US20190002657A1
公开(公告)日：2019-01-03
申请号：US16062491
申请日：2016-12-16
Applicant: ARKEMA FRANCE
Inventor： Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: C08J5/18 , C08K5/5353 , C08F297/02 , C08F220/18 , C08F212/08 , G03F7/00 , G03F9/00
Abstract: Provided is a process for reducing the number of defects of an ordered film of a diblock copolymer on a surface. The process includes curing, on a surface, a composition including a diblock copolymer at a structuring temperature between the Tg of the diblock copolymer and the decomposition temperature of the diblock copolymer to form an ordered film of the diblock copolymer on the substrate. The composition has a product Xeffective*N of between 10.5 and 40 at the structuring temperature, where Xeffective is the Flory-Huggins parameter of the diblock copolymer and N is the total degree of polymerization of the blocks of the diblock copolymer.
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Patent Agency Ranking
26.发明申请公开(公告)号：US20180371145A1
公开(公告)日：2018-12-27
申请号：US16062460
申请日：2016-12-16
Applicant: ARKEMA FRANCE
Inventor： Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: C08F297/02 , C08F220/18 , C08F212/08 , G03F7/00
Abstract: Provided is a process for improving the critical dimension uniformity of an ordered film of a diblock copolymer on a surface. The process includes curing, on a surface, a composition including a diblock copolymer at a structuring temperature between the Tg of the diblock copolymer and the decomposition temperature of the diblock copolymer to form an ordered film of the diblock copolymer on the substrate. The composition has a product Xeffective*N of between 10.5 and 40 at the structuring temperature, where Xeffective is the Flory-Huggins parameter of the diblock copolymer and N is the total degree of polymerization of the blocks of the diblock copolymer.
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27.发明申请公开(公告)号：US20180364562A1
公开(公告)日：2018-12-20
申请号：US16062513
申请日：2016-12-16
Applicant: ARKEMA FRANCE
Inventor： Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: G03F1/68 , C08F297/02
Abstract: Provided is a process for forming an ordered film of a block copolymer on a surface. The process includes curing, on a surface, a composition comprising at least one block copolymer at a structuring temperature between the highest Tg of the at least one block copolymer and the decomposition temperature of the at least one block copolymer to form an ordered film comprising the at least one block copolymer on the substrate. The composition has a product χ effective*N of between 10.5 and 40 at the structuring temperature, where χ effective is the Flory-Huggins parameter of the block copolymer and N is the total degree of polymerization of the blocks of the block copolymer. The ordered film has a thickness greater than 20 nm and a period greater than 10 nm.
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公开(公告)号：US20180164679A1
公开(公告)日：2018-06-14
申请号：US15545070
申请日：2016-01-21
Applicant: ARKEMA FRANCE
Inventor： Xavier CHEVALIER , Raber INOUBLI , Christophe NAVARRO , Celia NICOLET
CPC classification number: G03F7/0002 , B05D1/005 , B05D3/0254 , C08L53/00 , C08L2205/02 , C09D153/00 , G03F1/68 , G03F7/162 , G03F7/168
Abstract: The present invention relates to a process for obtaining high-period (typically >10 nm), thick (typically >20 nm) ordered films on a nanometric scale comprising a block copolymer (BCP). The invention also relates to the compositions used to obtain these thick ordered films and to the resulting ordered films that can be used in particular as masks in the lithography field.
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公开(公告)号：US20160369031A1
公开(公告)日：2016-12-22
申请号：US15117972
申请日：2015-02-06
Applicant: ARKEMA FRANCE
Inventor： Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: C08F297/02 , G03F7/00 , C09D153/00
CPC classification number: C08F297/026 , B81C1/00206 , B81C2201/0149 , B82Y30/00 , C09D153/00 , G03F7/0002
Abstract: The invention relates to a process for controlling the surface energy of a substrate in order to make it possible to obtain a specific orientation of the nanodomains of a film of block copolymer subsequently deposited on the said surface, the said process being characterized in that it comprises the following stages: preparing a blend of copolymers, each copolymer comprising at least one functional group which allows it to be grafted to or crosslinked on the surface of the said substrate, depositing the said blend thus prepared on the surface of the said substrate, carrying out a treatment which results in the grafting to the surface of the substrate or the crosslinking on the surface of the substrate of each of the copolymers of the blend.
Abstract translation: 本发明涉及一种用于控制基材的表面能的方法，以获得随后在表面上沉积的嵌段共聚物膜的纳米域的特定取向，其特征在于其包括以下步骤：制备 聚合物的混合物，每个聚合物包含至少一个官能团，使其能够接枝或交联到基材的表面; 将如此制备的混合物沉积在基材的表面上; 进行处理，导致混合物的每种聚合物接枝或交联到基材的表面。
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30.发明申请PROCESS THAT ENABLES THE CREATION OF NANOMETRIC STRUCTURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开使用嵌段共聚物自组装制备纳米结构的方法公开(公告)号：US20160333216A1
公开(公告)日：2016-11-17
申请号：US15103736
申请日：2014-12-11
Applicant: ARKEMA FRANCE , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , INSTITUT POLYTECHNIQUE DE BORDEAUX , UNIVERSITE DE BORDEAUX
Inventor： Muhammad MUMTAZ , Karim AISSOU , Cyril BROCHON , Eric CLOUTET , Guillaume FLEURY , Georges HADZIIOANNOU , Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
IPC: C09D153/00 , B05D1/28 , B05D1/00
CPC classification number: C09D153/00 , B05D1/005 , B05D1/28 , B81C1/00031 , B81C2201/0149 , B82Y40/00 , C08G77/60 , G03F7/0002 , H01L21/0271 , Y10S977/892
Abstract: The invention relates to a process that enables the creation of nanometric structures by self-assembly of block copolymers, at least one of the blocks of which results from the polymerization of monomers comprising at least one cyclic entity corresponding to the formula I. where X═Si(R1,R2); Ge(R1,R2) Z═Si(R3,R4); Ge(R3,R4); O; S; C(R3,R4) Y═O; S; C(R5,R6) T=O; S; C(R7,R8) R1, R2, R3, R4, R5, R6, R7, R8 are selected from hydrogen, linear, branched or cyclic alkyl groups, with or without heteroatoms, and aromatic groups with or without heteroatoms.
Abstract translation: R 1，R 2，R 3，R 4，R 5，R 6，R 7，R 8选自具有或不具有杂原子的氢，直链，支链或环状烷基，以及具有或不具有杂原子的芳族基团。
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