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59 条记录 (耗时 0.021 秒)

    Vacuum closure with linear drive unit
    21.
    发明申请
    Vacuum closure with linear drive unit 审中-公开
    带线性驱动单元的真空关闭

    公开(公告)号：US20060102863A1

    公开(公告)日：2006-05-18

    申请号：US11143822

    申请日：2005-06-02

    申请人： Stefan Bangert ,  Michael Konig ,  Ralph Lindenberg ,  Uwe Schussler ,  Tobias Stolley ,  Frank Fuchs

    发明人： Stefan Bangert ,  Michael Konig ,  Ralph Lindenberg ,  Uwe Schussler ,  Tobias Stolley ,  Frank Fuchs

    IPC分类号： F16K11/074

    CPC分类号： F16K31/04 ,  F16K51/02

    摘要： This invention relates to a vacuum treatment installation and a device therefor for the tight, especially vacuum-tight closing of an aperture, in particular a slit-like or rectangular aperture with a length that is preferably a multiple of the width of the aperture, in particular for a lock arrangement of a vacuum treatment installation, said device having a closure member (2) and for said closure member a linear drive unit (3,4,5) which, by way of a translational movement, can move the closure member from an open position into a closed position, said closure member having a sealing surface which is disposed in a plane (16) and which, in the closed position, makes sealing contact with a counter-sealing surface on the aperture side, and said plane running perpendicular to the direction of the translational movement (14) and at an oblique angle to the aperture normal (13).

    摘要翻译： 本发明涉及一种真空处理装置及其装置，用于紧密，特别地真空密封孔，特别是狭缝状或矩形孔，其长度优选为孔的宽度的倍数，在 特别是用于真空处理装置的锁定装置，所述装置具有闭合构件（2），并且对于所述闭合构件，线性驱动单元（3,4,5）通过平移运动可移动闭合构件 从打开位置到关闭位置，所述封闭构件具有设置在平面（16）中的密封表面，并且在关闭位置与密封面密封接触开口侧上的反向密封表面，并且所述平面 垂直于平移运动（14）的方向延伸并且与孔径法线（13）成倾斜的角度。

    Cathodic sputtering apparatus
    22.
    发明申请
    Cathodic sputtering apparatus 审中-公开
    阴极溅射装置

    公开(公告)号：US20050034981A1

    公开(公告)日：2005-02-17

    申请号：US10851998

    申请日：2004-05-20

    申请人： Frank Fuchs ,  Stefan Bangert ,  Ralph Lindenberg ,  Helmut Grimm ,  Tobias Stolley ,  Uwe Schussler

    发明人： Frank Fuchs ,  Stefan Bangert ,  Ralph Lindenberg ,  Helmut Grimm ,  Tobias Stolley ,  Uwe Schussler

    IPC分类号： C23C14/35 ,  C23C14/00 ,  C23C14/34 ,  H01J37/34

    CPC分类号： H01J37/3455 ,  C23C14/3407 ,  C23C14/35 ,  H01J37/3405

    摘要： The invention relates to a cathodic sputtering apparatus (8) for coating substrates (17) in a vacuum, comprising an essentially tubular support for the material to be sputtered (2) which is rotatable about its longitudinal axis, a cooling system which is suitable for circulating a cooling medium in the tubular support (2) in conjunction with a cooling device external to the support (2), a device for connecting to an electrical power circuit, and a device for the rotary drive of the tubular support about its longitudinal axis. This apparatus also is provided with a magnet system which extends along the axis for the magnetic confinement of a plasma which is provided near a target made of the material to be sputtered, the magnet system being composed of pole shoes (9, 10), magnet yokes (12, 13) made of magnetically permeable metal, and magnetization means (5) which are suitable for generating a magnetic flux in the magnet system. The magnet poles of one polarity in the magnet system are situated outside the tubular target support (2) and enclose same in a frame-like manner, and the opposite magnetic poles are provided in the tubular, rotatable target support (2).

    摘要翻译： 本发明涉及一种用于在真空中涂覆基底（17）的阴极溅射装置（8），其包括可围绕其纵向轴线旋转的待溅射材料（2）的基本上管状的支撑件，适用于 将冷却介质与支撑件（2）外部的冷却装置结合在一起，在管状支撑件（2）中循环冷却介质，用于连接到电力回路的装置和用于管状支撑件围绕其纵向轴线的旋转驱动的装置 。 该装置还设置有磁体系统，其沿着轴线延伸，用于限制等离子体的磁场限制，等离子体设置在由被溅射材料制成的靶材附近，磁体系统由极靴（9,10），磁体 由导磁体金属制成的轭铁（12,13）和适用于在磁铁系统中产生磁通量的磁化装置（5）。 磁体系中一个极性的磁极位于管状目标支架（2）的外侧并以框架状方式封闭，并且相对的磁极设置在管状可转动的目标支架（2）中。

    Coating apparatus with rotation module
    24.
    发明授权
    Coating apparatus with rotation module 有权
    带旋转模块的涂装设备

    公开(公告)号：US09353436B2

    公开(公告)日：2016-05-31

    申请号：US12388214

    申请日：2009-02-18

    申请人： Michael Koenig ,  Stefan Bangert ,  Uwe Schuessler ,  Reiner Gertmann

    发明人： Michael Koenig ,  Stefan Bangert ,  Uwe Schuessler ,  Reiner Gertmann

    IPC分类号： C23C14/04 ,  C23C16/04 ,  C23C14/56 ,  C23C16/54 ,  C23C14/50 ,  C23C14/12 ,  H01L21/67

    CPC分类号： C23C14/56 ,  C23C14/042 ,  C23C14/12 ,  C23C14/50 ,  C23C14/566 ,  C23C14/568 ,  C23C16/54 ,  H01L21/67155

    摘要： The present invention refers to a method for coating a substrate, a coating apparatus for carrying out the method and a handling module for coating apparatuses. The handling module comprises a moveable support for a substrate to be coated the support being movable between at least two positions. Further, a mask arranging device for at least one of attaching and detaching a mask to the substrate, and a mask alignment device for aligning the mask with respect to the substrate are provided for, wherein the mask alignment device is attached to the movable support so as to be movable together with the support. Alternatively, the handling module comprises a vacuum chamber, a moveable support for a substrate to be coated, the support being arranged in the vacuum chamber and being rotatable between at least two positions, wherein a mask arranging device for at least one of attaching and detaching a mask to the substrate is arranged within the vacuum chamber of the handling module.

    摘要翻译： 本发明涉及一种基材的涂布方法，实施该方法的涂布装置和涂布装置的处理模块。 处理模块包括用于待涂覆的基底的可移动支撑件，其可在至少两个位置之间移动。 另外，提供了一种用于将掩模附着和分离至基板的掩模布置装置和用于使掩模相对于基板对准的掩模对准装置，其中掩模对准装置附接到可移动支撑件 以便与支撑件一起移动。 或者，处理模块包括真空室，用于待涂覆的基底的可移动支撑件，所述支撑件布置在真空室中并且可在至少两个位置之间旋转，其中，用于至少一个附着和分离的掩模排列装置 在处理模块的真空室内布置有衬底的掩模。

    LOAD LOCK CHAMBER, SUBSTRATE PROCESSING SYSTEM AND METHOD FOR VENTING
    26.
    发明申请
    LOAD LOCK CHAMBER, SUBSTRATE PROCESSING SYSTEM AND METHOD FOR VENTING 审中-公开
    负载锁仓，底板加工系统及其施工方法

    公开(公告)号：US20150179486A1

    公开(公告)日：2015-06-25

    申请号：US14642475

    申请日：2015-03-09

    申请人： Thomas GEBELE ,  Thomas LEIPNITZ ,  Wolfgang BUSCHBECK ,  Stefan BANGERT ,  Ralph LINDENBERG

    发明人： Thomas GEBELE ,  Thomas LEIPNITZ ,  Wolfgang BUSCHBECK ,  Stefan BANGERT ,  Ralph LINDENBERG

    IPC分类号： H01L21/67

    CPC分类号： H01L21/67201 ,  Y10T137/0379

    摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.

    摘要翻译： 提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压力或超压力流体连通的锁定室的内部。 此外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。 此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。

    MAGNETIC HOLDING DEVICE AND METHOD FOR HOLDING A SUBSTRATE
    27.
    发明申请
    MAGNETIC HOLDING DEVICE AND METHOD FOR HOLDING A SUBSTRATE 有权
    磁性保持装置及用于保持基板的方法

    公开(公告)号：US20110304418A1

    公开(公告)日：2011-12-15

    申请号：US12818392

    申请日：2010-06-18

    申请人： Uwe SCHUESSLER ,  Stefan BANGERT ,  Heike LANDGRAF

    发明人： Uwe SCHUESSLER ,  Stefan BANGERT ,  Heike LANDGRAF

    IPC分类号： H01F7/00

    CPC分类号： G03F7/70858 ,  G03F7/707

    摘要： A magnetic holding device is adapted for holding a mask during processing of a substrate. The magnetic holding device includes a substrate carrier which is adapted for receiving the substrate to be processed. The substrate carrier includes a permanent magnet adapted for generating a first magnetic field for holding the mask. Furthermore, the substrate carrier includes a solenoid which is adapted for generating a second magnetic field adapted for at least partially compensating the first magnetic field. In case the first magnetic field is compensated, at least partially, by means of the second magnetic field, the mask is released from the substrate carrier.

    摘要翻译： 磁性保持装置适于在基板的加工期间保持掩模。 磁保持装置包括适于接收待处理基板的基板载体。 衬底载体包括适于产生用于保持掩模的第一磁场的永磁体。 此外，衬底载体包括螺线管，螺线管适于产生适于至少部分地补偿第一磁场的第二磁场。 在通过第二磁场至少部分补偿第一磁场的情况下，掩模从衬底载体释放。

    SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM
    28.
    发明申请
    SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM 有权
    SHADOW面罩对齐与管理系统

    公开(公告)号：US20110131792A1

    公开(公告)日：2011-06-09

    申请号：US12905460

    申请日：2010-10-15

    申请人： Byung-Sung Leo KWAK ,  Stefan BANGERT ,  Ralf HOFMANN ,  Michael KOENIG

    发明人： Byung-Sung Leo KWAK ,  Stefan BANGERT ,  Ralf HOFMANN ,  Michael KOENIG

    IPC分类号： H05K13/04

    CPC分类号： H01M6/40 ,  C23C14/042 ,  H01M4/02 ,  H01M4/13 ,  H01M4/139 ,  H01M4/5825 ,  H01M4/621 ,  H01M4/623 ,  H01M4/663 ,  H01M2004/028 ,  Y02E60/122 ,  Y10T29/49002 ,  Y10T29/5313

    摘要： A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.

    摘要翻译： 用于基板薄膜处理的磁性处理组件，用于组装和拆卸荫罩以覆盖工件顶部以暴露于加工状态的系统和方法。 组件可以包括磁性处理载体和荫罩，其设置在磁性处理载体上并且磁耦合到磁性处理载体以覆盖待暴露于加工过程中要设置在荫罩和磁性处理载体之间的工件的顶部 条件。 系统包括具有用于保持荫罩的第一支撑件的第一室，用于保持处理托架的第二支撑件以及将荫罩对准待设置在承载器和荫罩之间的工件的对准系统。 第一和第二支撑件可相对于彼此移动。

    Arrangement for transporting a flat substrate in a vacuum chamber
    30.
    发明授权
    Arrangement for transporting a flat substrate in a vacuum chamber 失效
    用于在真空室中输送平面基板的布置

    公开(公告)号：US07837799B2

    公开(公告)日：2010-11-23

    申请号：US10732179

    申请日：2003-12-10

    申请人： Stefan Bangert ,  Frank Fuchs ,  Uwe Schuessler ,  Ralph Lindenberg ,  Tobias Stolley

    发明人： Stefan Bangert ,  Frank Fuchs ,  Uwe Schuessler ,  Ralph Lindenberg ,  Tobias Stolley

    IPC分类号： C23C16/00 ,  C23C14/00 ,  C23F1/00 ,  H01L21/306 ,  C25B11/00 ,  C25B13/00

    CPC分类号： B65G49/065 ,  B65G49/063 ,  B65G2249/02 ,  B65G2249/045 ,  Y10S414/139

    摘要： An arrangement for transporting a flat substrate through a coating installation, wherein the coating installation comprises, e.g., several and different sputter cathodes, to which the flat substrate, for example a glass pane, is transported one after the other in vacuo. So that no abrasion is generated between glass pane and contact, the glass pane is kept spaced apart from the contact by means of gas pressure. The gas pressure is herein built up through relatively few and small holes in a gas channel. Since during flooding of the coating installation to atmospheric pressure or during evacuation, due to the small holes, no fast pressure equalization between gas channel and the remaining coating installation is possible, the gas channel is decoupled in terms of gas from the remaining coating installation and provided with a separate gas line, via which gas can be introduced into the gas channel or pumped out of it.

    摘要翻译： 用于将平坦基底输送通过涂覆装置的布置，其中所述涂覆装置包括例如多个和不同的溅射阴极，平坦基底例如玻璃板在其中真空地彼此输送。 因此，玻璃板和接触件之间不会产生磨损，玻璃板通过气体压力与接触件保持间隔开。 气体压力通过气体通道中相对较少和小的孔形成。 由于涂层装置在大气压下或排空过程中，由于小孔，气体通道和剩余的涂层装置之间无法实现快速压力平衡，所以气体通道与剩余涂层装置的气体相分离， 设置有单独的气体管线，通过该气体管线可以将气体引入气体通道中或从其中泵出。