公开(公告)号：US20110309505A1

公开(公告)日：2011-12-22

申请号：US13221037

申请日：2011-08-30

Applicant: Kouji TAKEMURA

Inventor： Kouji TAKEMURA

IPC: H01L23/498 ,  H01L21/66

CPC classification number: H01L23/3171 ,  H01L22/32 ,  H01L23/3114 ,  H01L24/05 ,  H01L24/13 ,  H01L24/48 ,  H01L2224/02166 ,  H01L2224/02233 ,  H01L2224/02377 ,  H01L2224/02381 ,  H01L2224/0392 ,  H01L2224/0401 ,  H01L2224/05024 ,  H01L2224/05554 ,  H01L2224/05568 ,  H01L2224/0603 ,  H01L2224/131 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01075 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/10162 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2224/13099 ,  H01L2224/05099 ,  H01L2224/13599 ,  H01L2224/05599 ,  H01L2224/29099 ,  H01L2224/29599 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device includes a semiconductor integrated circuit device (1). In the semiconductor integrated circuit device (1), a semiconductor integrated circuit (5) is formed on a center of the surface of a semiconductor substrate (3), and a plurality of electrode terminals (71, 73, . . . ) are provided on the surface of the semiconductor substrate (3). A protection film (9) is provided on the surface of the semiconductor substrate (3) such that the surfaces of the electrode terminals (71, 73) are exposed. The electrode terminals (71, 73, . . . ) include an electrode terminal (73) having a thin portion (74). The surface of the thin portion (74) is located below the surfaces of the electrode terminals except for the electrode terminal (73) having the thin portion (74) among the electrode terminals (71, 73, . . . ).

Abstract translation: 半导体器件包括半导体集成电路器件（1）。 在半导体集成电路器件（1）中，半导体集成电路（5）形成在半导体衬底（3）的表面的中心，并且设置有多个电极端子（71,73 ...） 在半导体衬底（3）的表面上。 在半导体基板（3）的表面上设置保护膜（9），使得电极端子（71,73）的表面露出。 电极端子（71,73 ...）包括具有薄部分（74）的电极端子（73）。 除了在电极端子（71,73 ...中）中具有薄部分（74）的电极端子（73）之外，薄部分（74）的表面位于电极端子的表面下方。

公开(公告)号：US20190229048A1

公开(公告)日：2019-07-25

申请号：US16371356

申请日：2019-04-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shuo-Mao Chen ,  Der-Chyang Yeh ,  Chiung-Han Yeh

IPC: H01L23/498 ,  H01L21/56 ,  H01L23/00 ,  H01L23/538

CPC classification number: H01L23/49822 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/05 ,  H01L24/19 ,  H01L2224/02233 ,  H01L2224/02331 ,  H01L2224/02381 ,  H01L2224/03 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05008 ,  H01L2224/05026 ,  H01L2224/05099 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05552 ,  H01L2224/05572 ,  H01L2224/0558 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/0603 ,  H01L2224/06051 ,  H01L2224/06515 ,  H01L2224/12105 ,  H01L2224/13005 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/96 ,  H01L2924/00014 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19103 ,  H01L2924/206 ,  H01L2924/014 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2924/01047 ,  H01L2924/00

Abstract: A package includes a chip formed in a first area of the package and a molding compound formed in a second area of the package adjacent to the first area. A first polymer layer is formed on the chip and the molding compound, a second polymer layer is formed on the first polymer layer, and a plurality of interconnect structures is formed between the first polymer layer and the second polymer layer. A metal-insulator-metal (MIM) capacitor is formed on the second polymer layer and electrically coupled to at least one of the plurality of interconnect structures. A metal bump is formed over and electrically coupled to at least one of the plurality of interconnect structures.

公开(公告)号：US20180211908A1

公开(公告)日：2018-07-26

申请号：US15937188

申请日：2018-03-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shuo-Mao Chen ,  Der-Chyang Yeh ,  Chiung-Han Yeh

IPC: H01L23/498 ,  H01L23/00 ,  H01L21/56 ,  H01L23/538 ,  H01L23/31

CPC classification number: H01L23/49822 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/05 ,  H01L24/19 ,  H01L2224/02233 ,  H01L2224/02331 ,  H01L2224/02381 ,  H01L2224/03 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05008 ,  H01L2224/05026 ,  H01L2224/05099 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05552 ,  H01L2224/05572 ,  H01L2224/0558 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/0603 ,  H01L2224/06051 ,  H01L2224/06515 ,  H01L2224/12105 ,  H01L2224/13005 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/96 ,  H01L2924/00014 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19103 ,  H01L2924/206 ,  H01L2924/014 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2924/01047 ,  H01L2924/00

Abstract: A package includes a chip formed in a first area of the package and a molding compound formed in a second area of the package adjacent to the first area. A first polymer layer is formed on the chip and the molding compound, a second polymer layer is formed on the first polymer layer, and a plurality of interconnect structures is formed between the first polymer layer and the second polymer layer. A metal-insulator-metal (MIM) capacitor is formed on the second polymer layer and electrically coupled to at least one of the plurality of interconnect structures. A metal bump is formed over and electrically coupled to at least one of the plurality of interconnect structures.

公开(公告)号：US09960106B2

公开(公告)日：2018-05-01

申请号：US13536877

申请日：2012-06-28

Applicant: Shuo-Mao Chen ,  Der-Chyang Yeh ,  Chiung-Han Yeh

Inventor： Shuo-Mao Chen ,  Der-Chyang Yeh ,  Chiung-Han Yeh

IPC: H01L27/06 ,  H01L23/498 ,  H01L23/538 ,  H01L21/56 ,  H01L23/00 ,  H01L23/31

CPC classification number: H01L23/49822 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/05 ,  H01L24/19 ,  H01L2224/02233 ,  H01L2224/02331 ,  H01L2224/02381 ,  H01L2224/03 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05008 ,  H01L2224/05026 ,  H01L2224/05099 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05552 ,  H01L2224/05572 ,  H01L2224/0558 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/0603 ,  H01L2224/06051 ,  H01L2224/06515 ,  H01L2224/12105 ,  H01L2224/13005 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/96 ,  H01L2924/00014 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19103 ,  H01L2924/206 ,  H01L2924/014 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2924/01047 ,  H01L2924/00

Abstract: A package includes a chip formed in a first area of the package and a molding compound formed in a second area of the package adjacent to the first area. A first polymer layer is formed on the chip and the molding compound, a second polymer layer is formed on the first polymer layer, and a plurality of interconnect structures is formed between the first polymer layer and the second polymer layer. A metal-insulator-metal (MIM) capacitor is formed on the second polymer layer and electrically coupled to at least one of the plurality of interconnect structures. A metal bump is formed over and electrically coupled to at least one of the plurality of interconnect structures.

公开(公告)号：US20080246113A1

公开(公告)日：2008-10-09

申请号：US12098352

申请日：2008-04-04

Applicant: Seung-Duk BAEK ,  Sun-Won KANG ,  Hyun-Soo CHUNG

Inventor： Seung-Duk BAEK ,  Sun-Won KANG ,  Hyun-Soo CHUNG

IPC: H01L29/00

CPC classification number: H01L23/525 ,  H01L23/16 ,  H01L23/3114 ,  H01L23/3192 ,  H01L23/562 ,  H01L24/02 ,  H01L2224/02233 ,  H01L2924/01006 ,  H01L2924/01014 ,  H01L2924/01033 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/181 ,  H01L2924/00

Abstract: The invention provides a semiconductor device. The semiconductor device includes a semiconductor chip having an active surface on which pads are disposed, a passivation layer pattern disposed to cover the active surface of the semiconductor chip and to expose the pads, a first insulation layer pattern disposed on the passivation layer pattern, a second insulation layer pattern disposed on only a portion of the first insulation layer pattern, and redistribution line patterns electrically connected to the pads and disposed so as to extend across the second insulation layer pattern and the first insulation layer pattern. A method of fabricating the same is also provided.

Abstract translation: 本发明提供一种半导体器件。 半导体器件包括具有布置有焊盘的有源表面的半导体芯片，布置成覆盖半导体芯片的有源表面并暴露焊盘的钝化层图案，设置在钝化层图案上的第一绝缘层图案， 第二绝缘层图案仅设置在第一绝缘层图案的一部分上，再分布线图形电连接到焊盘并且被设置成跨越第二绝缘层图案和第一绝缘层图案延伸。 还提供了一种制造该方法的方法。