Plasma Source Apparatus and Methods for Generating Charged Particle Beams
    11.
    发明申请
    Plasma Source Apparatus and Methods for Generating Charged Particle Beams 有权
    等离子体源装置和产生带电粒子束的方法

    公开(公告)号:US20150144808A1

    公开(公告)日:2015-05-28

    申请号:US14406012

    申请日:2013-05-20

    Abstract: A plasma source apparatus for generating a beam of charged particles is disclosed. The apparatus comprises: a plasma chamber provided with an inlet for the ingress of gas and an aperture for the extraction of charged particles from the plasma chamber; a radio frequency (RF) plasma generation unit for generating a plasma inside the plasma chamber, the radio frequency plasma generation unit comprising first and second resonant circuits each tuned to resonate at substantially the same resonant frequency, the first resonant circuit comprising a first antenna and a first, RF power source adapted to drive the first resonant circuit at substantially its resonant frequency, and the second resonant circuit comprising a second antenna, whereby in use an RF signal is induced in the second antenna by the first resonant circuit due to resonant coupling, the second resonant circuit being configured to apply the induced RF signal to the plasma chamber to generate a plasma therein; and a particle accelerating unit for extracting charged particles from the plasma and accelerating the charged particles to form a beam, the particle accelerating unit comprising a second power source configured to apply potential between the plasma chamber and an accelerating electrode, the region between the plasma chamber and the accelerating electrode constituting an acceleration column. The second power source is adapted to output a high voltage relative to that output by the first, RF power source.

    Abstract translation: 公开了一种用于产生带电粒子束的等离子体源装置。 该装置包括:等离子体室,其具有用于进入气体的入口和用于从等离子体室抽出带电粒子的孔; 用于在等离子体室内产生等离子体的射频(RF)等离子体产生单元,所述射频等离子体产生单元包括第一和第二谐振电路,每个谐振电路被调谐以基本相同的谐振频率谐振,所述第一谐振电路包括第一天线和 第一RF电源,其适于以基本上其谐振频率驱动第一谐振电路,并且第二谐振电路包括第二天线,由此在使用中由于谐振耦合由第一谐振电路在第二天线中感应RF信号 所述第二谐振电路被配置为将所述感应RF信号施加到所述等离子体室以在其中产生等离子体; 以及用于从等离子体中提取带电粒子并加速带电粒子以形成束的粒子加速单元,所述粒子加速单元包括构造成在等离子体室和加速电极之间施加电位的第二电源,等离子体室 加速电极构成加速柱。 第二电源适于通过第一RF电源输出相对于该输出的高电压。

    Focused ion beam apparatus
    13.
    发明授权
    Focused ion beam apparatus 有权
    聚焦离子束装置

    公开(公告)号:US08389953B2

    公开(公告)日:2013-03-05

    申请号:US12931993

    申请日:2011-02-15

    Abstract: A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit that supplies gas to the tip, and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample. An aperture member has an opening that passes therethrough a part of the ion beam ejected from the ion gun unit, and a lens system focuses the ion beam onto the sample.

    Abstract translation: 聚焦离子束装置包括具有发射极尖端的离子枪单元,向尖端供应气体的气体供应单元和离子源气体供应源。 提取电极通过在提取电极和尖端之间施加电压使吸附在尖端表面上的气体电离并提取离子。 阴极将离子加速到样品。 孔部件具有从离子枪单元喷出的离子束的一部分通过的开口,透镜系统将离子束聚焦到样品上。

    Ion source including separate support systems for accelerator grids
    14.
    发明授权
    Ion source including separate support systems for accelerator grids 有权
    离子源包括加速器网格的单独支撑系统

    公开(公告)号:US08354652B2

    公开(公告)日:2013-01-15

    申请号:US12309460

    申请日:2007-07-12

    Abstract: This invention relates to an Ion gun (10) which comprises of plasma generator (11) driven from an RF source (12), a plasma or source chamber (13), having an outlet (14), across which is mounted an accelerator grid (15). The accelerator grid (15) comprises four individual grids. The first grid (16), which is closest to the outlet (14), is maintained at a positive voltage by a DC source (16a), the second grid (17) is maintained strongly negative by DC source (17a). The third grid (18) is maintained at a negative voltage, which is much lower than that of the second grid (17), by DC source (18a) and the fourth grid is grounded. Means of mounting these grids are also described.

    Abstract translation: 本发明涉及一种离子枪(10),其包括从RF源(12)驱动的等离子体发生器(11),具有出口(14)的等离子体或源室(13),其上安装有加速器格栅 (15)。 加速器网格(15)包括四个单独的网格。 最靠近出口(14)的第一栅极(16)通过直流源(16a)保持在正电压,第二栅极(17)被直流源(17a)强烈地保持为负。 第三栅极(18)通过直流源(18a)保持在比第二栅极(17)的负电压低得多的负电压,第四栅极接地。 还描述了安装这些网格的方法。

    Ion source
    16.
    发明授权
    Ion source 有权
    离子源

    公开(公告)号:US08188445B2

    公开(公告)日:2012-05-29

    申请号:US12848354

    申请日:2010-08-02

    Abstract: An ion source includes an arc chamber having an extraction aperture, and a plasma sheath modulator positioned in the arc chamber. The plasma sheath modulator is configured to control a shape of a boundary between a plasma and a plasma sheath proximate the extraction aperture, wherein the plasma sheath modulator includes a semiconductor. A well focused ion beam having a high current density can be generated by the ion source. A high current density ion beam can improve the throughput of an associated process. The emittance of the ion beam can also be controlled.

    Abstract translation: 离子源包括具有提取孔的电弧室和位于电弧室中的等离子体鞘调制器。 等离子体鞘调制器被配置为控制靠近提取孔的等离子体和等离子体鞘之间的边界的形状,其中等离子体鞘调制器包括半导体。 可以通过离子源产生具有高电流密度的良好聚焦的离子束。 高电流密度离子束可以提高相关过程的吞吐量。 也可以控制离子束的发射。

    ION BEAM IRRADIATION DEVICE AND METHOD FOR SUPPRESSING ION BEAM DIVERGENCE
    17.
    发明申请
    ION BEAM IRRADIATION DEVICE AND METHOD FOR SUPPRESSING ION BEAM DIVERGENCE 有权
    离子束辐射装置和抑制离子束分散的方法

    公开(公告)号:US20120085918A1

    公开(公告)日:2012-04-12

    申请号:US13377253

    申请日:2010-04-27

    Abstract: To improve an efficiency of utilizing electrons and efficiently suppress an ion beam spread by a space charge effect while eliminating a need for a special magnetic pole structure by effectively using a space in the vicinity of a magnet, there are provided an ion source, a collimating magnet and a plurality of electron sources, wherein the electron sources are arranged in a magnetic field gradient region formed on an ion beam upstream side or ion beam downstream side of the collimating magnet and arranged outside a region passed by the ion beam, and an irradiation direction of the electrons is directed to supply the electrons to the magnetic field gradient region.

    Abstract translation: 为了提高利用电子的效率,有效地抑制通过空间电荷效应扩散的离子束,同时通过有效地利用磁体附近的空间来消除对特殊磁极结构的需要,提供离子源,准直 磁体和多个电子源,其中电子源被布置在形成在准直磁体的离子束上游侧或离子束下游侧的磁场梯度区域中,并且布置在通过离子束的区域的外侧, 电子的方向被引导以将电子提供给磁场梯度区域。

    Front plate for an ion source
    18.
    发明授权
    Front plate for an ion source 有权
    用于离子源的前板

    公开(公告)号:US08153993B2

    公开(公告)日:2012-04-10

    申请号:US12697884

    申请日:2010-02-01

    CPC classification number: H01J37/08 H01J27/024 H01J2237/083

    Abstract: The present invention relates to a front plate for an ion source that is suitable for an ion implanter. The front plate according to the invention comprises obverse and reverse sides, an exit aperture for allowing egress of ions from the ion source that extends substantially straight through the front plate between the obverse and reverse sides, and a slot penetrating through the front plate from obverse side to reverse side at a slant for at least part of its depth, the slot extending from a side of the front plate to join the exit aperture. The slot is slanted to occlude line of sight into the ion source when viewed from in front, yet provides an expansion gap.

    Abstract translation: 本发明涉及适用于离子注入机的离子源用前板。 根据本发明的前板包括正面和反面,出口孔用于允许从离子源排出离子,该离子源在正面和反面之间基本上直线地延伸穿过前板,以及从正面穿过前板的狭槽 侧面以斜面反转至少部分其深度,所述狭槽从前板的一侧延伸以连接出口孔。 当从前面观察时,槽倾斜以将视线遮挡到离子源中,但是提供了扩展间隙。

    ION BEAM EXTRACTION BY DISCRETE ION FOCUSING
    19.
    发明申请
    ION BEAM EXTRACTION BY DISCRETE ION FOCUSING 有权
    离子束通过离子聚焦提取

    公开(公告)号:US20110266957A1

    公开(公告)日:2011-11-03

    申请号:US13123692

    申请日:2009-10-08

    Applicant: Eugen Stamate

    Inventor: Eugen Stamate

    CPC classification number: H01J27/024 H01J37/08 H01J2237/083

    Abstract: An apparatus and methods are disclosed for ion beam extraction. In an implementation, the apparatus includes a plasma source (or plasma) and an ion extractor. The plasma source is adapted to generate ions and the ion extractor is immersed in the plasma source to extract a fraction of the generated ions. The ion extractor is surrounded by a space charge formed at least in part by the extracted ions. The ion extractor includes a biased electrode forming an interface with an insulator. The interface is customized to form a strongly curved potential distribution in the space-charge surrounding the ion extractor. The strongly curved potential distribution focuses the extracted ions towards an opening on a surface of the biased electrode thereby resulting in anion beam.

    Abstract translation: 公开了用于离子束提取的装置和方法。 在一个实施方案中,该装置包括等离子体源(或等离子体)和离子提取器。 等离子体源适于产生离子,离子提取器浸入等离子体源中以提取一部分所产生的离子。 离子提取器由至少部分由提取的离子形成的空间电荷包围。 离子提取器包括形成与绝缘体的界面的偏置电极。 该接口被定制以在离子提取器周围的空间电荷中形成强烈弯曲的电位分布。 强烈弯曲的电势分布将提取的离子聚焦到偏置电极的表面上的开口,从而导致阴离子束。

    Extraction electrode system for high current ion implanter
    20.
    发明授权
    Extraction electrode system for high current ion implanter 有权
    高电流离子注入机提取电极系统

    公开(公告)号:US07915597B2

    公开(公告)日:2011-03-29

    申请号:US12050594

    申请日:2008-03-18

    Abstract: A system and method extraction electrode system, comprising an extraction electrode, wherein the extraction electrode, further defines an aperture and forms a portion of the outside wall of the ion source and is configured to extract ions from the ion source, a suppression disk half assembly comprising two suppression electrode plate disk halves that form a variable suppression aperture, a ground disk half assembly comprising two ground electrode plate disk halves that form an variable ground aperture, wherein the suppression disk half assembly is configured between the extraction electrode and the ground disk half assembly, wherein the suppression aperture and the ground aperture variable in the direction perpendicular to the ion beam direction of travel, and wherein the extraction electrode system is used with a pendulum reciprocating drive apparatus.

    Abstract translation: 一种系统和方法提取电极系统,包括提取电极,其中所述提取电极还限定孔并形成离子源的外壁的一部分,并且被配置为从离子源提取离子,抑制盘半组件 包括形成可变抑制孔径的两个抑制电极板半部,包括形成可变接地孔的两个接地电极板半部的接地盘半组件,其中抑制盘半组件配置在提取电极和接地盘半部之间 组件,其中所述抑制孔径和所述接地孔径在垂直于所述离子束行进方向的方向上可变,并且其中所述引出电极系统与摆锤往复驱动装置一起使用。

Patent Agency Ranking