公开(公告)号：US20120261625A1

公开(公告)日：2012-10-18

申请号：US13358027

申请日：2012-01-25

Applicant: Wen-Yen CHIU ,  I-Ann Lei ,  Dai-Fu Lai ,  Wen-Chang Chen ,  Yang-Yen Yu ,  Guey-Sheng Liou ,  Trong-Ming Don

Inventor： Wen-Yen CHIU ,  I-Ann Lei ,  Dai-Fu Lai ,  Wen-Chang Chen ,  Yang-Yen Yu ,  Guey-Sheng Liou ,  Trong-Ming Don

IPC: C09K3/00 ,  H01B1/12 ,  B82Y30/00 ,  B82Y40/00

CPC classification number: C08K3/22 ,  B82Y30/00 ,  C01P2002/88 ,  C01P2004/52 ,  C01P2004/64 ,  C07C15/02 ,  C07C31/202 ,  C07C69/54 ,  C07C211/46 ,  C07D303/16 ,  C08F20/14 ,  C08K5/09 ,  C08K5/56 ,  C08K2003/2213 ,  C08K2003/2241 ,  C08K2003/2244 ,  C09C1/3676 ,  C09C3/10 ,  G02B2006/12071 ,  H01B1/124

Abstract: The present invention relates to a stabilized monomer dispersion containing inorganic oxide nanoparticles with high refractive index in which the refractive index of the inorganic oxide nanoparticles is greater than 1.65 and the average particle size of the high refractive inorganic oxide nanoparticles ranges from 1 to 100 nm and its content is in a range of from 1.0% by weight to 10.0% by weight based on the total weight of the monomer dispersion. The present invention also relates to a process for preparing the stabilized monomer dispersion containing high refractive inorganic oxide nanoparticles.

Abstract translation: 本发明涉及含有无机氧化物纳米粒子的折射率大于1.65且高折射率无机氧化物纳米粒子的平均粒径为1〜100nm的折射率高的无机氧化物纳米粒子的稳定化单体分散体， 其含量基于单体分散体的总重量为1.0重量％至10.0重量％。 本发明还涉及制备含有高折射率无机氧化物纳米粒子的稳定单体分散体的方法。

公开(公告)号：US20110225897A1

公开(公告)日：2011-09-22

申请号：US13058771

申请日：2009-07-07

Applicant: Guillaume Criniere ,  Laurent Thiers

Inventor： Guillaume Criniere ,  Laurent Thiers

IPC: C09K3/14 ,  C01F17/00

CPC classification number: C09G1/04 ,  A61K8/0241 ,  A61K8/044 ,  A61K8/19 ,  A61K2800/10 ,  A61K2800/413 ,  A61Q17/04 ,  B24B37/044 ,  B82Y30/00 ,  C01F17/0043 ,  C01P2004/03 ,  C01P2004/50 ,  C01P2004/52 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/22 ,  C08K3/22 ,  C08K2003/2213 ,  C09D7/61 ,  C09D7/68 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  C09K3/1472

Abstract: Suspensions of cerium oxide particles, well suited for polishing applications, the particles (secondary particles) of which have an average size of at most 200 nm, these secondary particles are formed from primary particles whose average size measured by TEM is at most 150 nm with a standard deviation of at most 30% of the value of this average size, and for which the ratio of the average size measured by TEM to the average size measured by BET is at least 1.5. Such suspensions are prepared from solutions of a cerium III salt, comprising a colloidal dispersion of cerium IV, which are contacted, in the presence of nitrate ions and under an inert atmosphere, with a base, and the medium obtained is subjected to a thermal treatment under an inert atmosphere and then acidified and washed.

Abstract translation: 这些二次粒子的平均粒径为200nm以下的二氧化铈颗粒的悬浮液，非常适用于研磨用途的二氧化铈粒子，通过TEM测定的平均粒径为150nm以下的一次粒子形成， 该平均尺寸值的至多30％的标准偏差，通过TEM测量的平均尺寸与通过BET测量的平均尺寸的比率至少为1.5。 这种悬浮液由铈III盐的溶液制备，铈铈盐包括铈离子的胶体分散体，在硝酸根离子存在下，在惰性气氛下与碱接触，将所得介质进行热处理 在惰性气氛下，然后酸化并洗涤。

公开(公告)号：US20240352223A1

公开(公告)日：2024-10-24

申请号：US18685571

申请日：2021-11-18

Applicant: ATOM AIRSOFT OY

Inventor： Sakari VYYRYLÄINEN

IPC: C08K3/22 ,  C08K3/04 ,  C08K3/08 ,  F16C33/32 ,  F42B6/10

CPC classification number: C08K3/22 ,  C08K3/042 ,  C08K3/08 ,  F16C33/32 ,  F42B6/10 ,  C08K2003/2213 ,  C08K2201/009 ,  C08K2201/018

Abstract: The invention relates to a ball, comprising a biodegradable polymer and one or more additives, such as an electrostatic charge eliminating additive, a density increasing additive, a strength/hardness modifier and/or the like added to the polymer mass during the compounding step. The ball is manufactured by a process generally applicable to the manufacture of polymers, such as injection molding, into a substantially spherical shape and grinding and/or polishing it to its final shape by means of double-sided lapping, barrel tumbling and/or the like. The biodegradable polymer used in the ball is polybutylene succinate (PBS).

公开(公告)号：US20240225008A1

公开(公告)日：2024-07-11

申请号：US18410686

申请日：2024-01-11

Applicant: Neo Chemicals & Oxides, LLC

Inventor： Dimitrios Psaras ,  Mason Reames Haneline ,  Steven Paul Williams

IPC: A01N59/16 ,  A01N25/12 ,  A01P1/00 ,  C02F1/50 ,  C08K3/105 ,  C08K3/22

CPC classification number: A01N59/16 ,  A01N25/12 ,  A01P1/00 ,  C02F1/505 ,  C08K3/105 ,  C08K3/22 ,  C02F2209/36 ,  C02F2303/04 ,  C08K2003/2213

Abstract: This disclosure relates to novel blended compositions for biological contaminant removal containing a particulate oxide composition and silver zinc zeolite. The particulate oxide composition is a mixed oxide of at least cerium and trivalent dopant. These blended compositions can be used as antimicrobial/antibacterial/antiviral agents. As such, this disclosure also relates to the use of these blended compositions for biological contaminant removal. The blended compositions have uses for removing bacteria, viruses, protozoa (e.g., amoebae), fungi (e.g., mold), algae, yeast, and the like. In particular, these blended compositions can be used in methods for treating fluids, including liquids or air, and solid surfaces through contact.

公开(公告)号：US11814548B2

公开(公告)日：2023-11-14

申请号：US17490431

申请日：2021-09-30

Applicant: Showa Denko Materials Co., Ltd.

Inventor： Tomohiro Iwano ,  Takaaki Matsumoto ,  Tomoyasu Hasegawa

IPC: C09G1/02 ,  H01L21/304 ,  H01L21/3065 ,  C08K3/20 ,  C08K5/09 ,  C08K5/17 ,  C08L71/02 ,  H01L21/3105 ,  C09K13/00 ,  H01L21/306 ,  C08K3/22 ,  C03C15/02

CPC classification number: C09G1/02 ,  C08K3/20 ,  C08K5/09 ,  C08K5/17 ,  C08L71/02 ,  C09K13/00 ,  H01L21/304 ,  H01L21/30625 ,  H01L21/31053 ,  C03C15/02 ,  C08K2003/2213

Abstract: A polishing liquid containing abrasive grains, a hydroxy acid, a polyol, a cationic compound, and a liquid medium, in which a zeta potential of the abrasive grains is positive and a weight average molecular weight of the cationic compound is less than 1000.

公开(公告)号：US11655347B2

公开(公告)日：2023-05-23

申请号：US16962095

申请日：2019-01-16

Applicant: HYOMEN KAIMEN KOBO CORPORATION ,  RIKEN TECHNOS CORPORATION

Inventor： Yasunori Taga

IPC: C03C17/00 ,  C03C17/42 ,  C08F14/26 ,  C08K3/22 ,  C23C14/34 ,  E06B5/10 ,  C08J5/18 ,  B60J1/02 ,  B60J1/08 ,  B60J1/18

CPC classification number: C08J5/18 ,  C03C17/007 ,  C03C17/42 ,  C08F14/26 ,  C08K3/22 ,  C23C14/3407 ,  B60J1/02 ,  B60J1/08 ,  B60J1/18 ,  C03C2217/74 ,  C03C2218/154 ,  C08J2327/18 ,  C08K2003/2213 ,  E06B5/10

Abstract: In one aspect, the present invention is an organic-inorganic hybrid membrane of a cerium oxide and an organic fluorine compound, the organic-inorganic hybrid membrane satisfying the following (a), (b), and (c): (a) the visible-light transmittance is 70% or higher; (b) the UV transmittance at a wavelength of 380 nm is 60% or lower; and (c) the water contact angle of the surface of the organic-inorganic hybrid membrane is 80° or higher. In another aspect, the present invention is an organic-inorganic hybrid membrane of a cerium oxide and an organic fluorine compound, the organic-inorganic hybrid membrane satisfying the following (a), (b), and (c′): (a) the visible-light transmittance is 70% or higher; (b) the UV transmittance at a wavelength of 380 nm is 60% or lower; and (c′) the water contact angle of the surface of the organic-inorganic hybrid membrane is 90° or higher. The organic fluorine compound may include a fluorine-based resin. Also disclosed are a laminate and an article that include the organic-inorganic hybrid membrane.

公开(公告)号：US09994735B2

公开(公告)日：2018-06-12

申请号：US15189190

申请日：2016-06-22

Applicant: K.C. Tech Co., Ltd.

Inventor： Jin Sook Hwang ,  Hyun Goo Kong ,  Han Teo Park

IPC: C09K13/00 ,  C03C15/00 ,  C03C25/68 ,  H01L21/302 ,  H01L21/461 ,  C09G1/02 ,  C09K3/14 ,  H01L21/321 ,  H01L21/306 ,  C23F3/06 ,  C23F1/10

CPC classification number: C09G1/02 ,  C08K3/36 ,  C08K2003/2213 ,  C08K2003/2227 ,  C08K2003/2237 ,  C08K2003/2244 ,  C08K2003/2262 ,  C09K3/14 ,  C09K13/00 ,  C23F1/10 ,  C23F3/06 ,  H01L21/30625 ,  H01L21/32115

Abstract: A slurry composition for polishing tungsten is provided. The slurry composition for polishing tungsten may include a water-soluble polymer, abrasive particles and an etching adjuster.

公开(公告)号：US09597768B1

公开(公告)日：2017-03-21

申请号：US14849066

申请日：2015-09-09

Applicant: Cabot Microelectronics Corporation

Inventor： Prativa Pandey ,  Juyeon Chang ,  Brian Reiss

IPC: H01L21/302 ,  H01L21/461 ,  B24B37/04 ,  C09G1/02

CPC classification number: B24B37/044 ,  C08K2003/2213 ,  C09G1/02

Abstract: The invention provides a chemical-mechanical polishing composition comprising, consisting essentially of, or consisting of (a) about 0.01 wt. % to about 1 wt. % of wet-process ceria, (b) about 10 ppm to about 200 ppm of a cationic polymer comprising quaternary amino groups, (c) about 10 ppm to about 2000 ppm of a non-fluorinated nonionic surfactant, (d) an amino acid, and (e) water, wherein the polishing composition has a pH of about 3 to about 8. The invention further provides a method of polishing a substrate with the polishing composition.

公开(公告)号：US20170059982A1

公开(公告)日：2017-03-02

申请号：US15303911

申请日：2015-04-10

Applicant: TOKYO INSTITUTE OF TECHNOLOGY ,  JX NIPPON OIL & ENERGY CORPORATION

Inventor： Junji WATANABE ,  Koichi SAKAJIRI ,  Kousuke YAMAKI ,  Suzushi NISHIMURA ,  Akira MATSUO

IPC: G03B21/62 ,  C09D5/00 ,  C08K3/22 ,  C09D133/12 ,  C09D167/02 ,  C09D169/00 ,  C09D125/06 ,  C09D101/12 ,  C09D123/12 ,  C09D145/00 ,  C09D129/14 ,  C08K3/30 ,  C08K3/08 ,  B32B5/16 ,  B32B27/14 ,  G09F19/18 ,  G02B5/02

CPC classification number: G03B21/62 ,  B32B5/16 ,  B32B27/14 ,  B32B2264/10 ,  B32B2264/105 ,  B32B2307/412 ,  C08K3/08 ,  C08K3/22 ,  C08K3/30 ,  C08K2003/0806 ,  C08K2003/2206 ,  C08K2003/2213 ,  C08K2003/2237 ,  C08K2003/2244 ,  C08K2003/3045 ,  C08K2201/003 ,  C08K2201/005 ,  C08K2201/011 ,  C09D5/006 ,  C09D101/12 ,  C09D123/12 ,  C09D125/06 ,  C09D129/14 ,  C09D133/12 ,  C09D145/00 ,  C09D167/02 ,  C09D169/00 ,  G02B5/02 ,  G02B5/0242 ,  G02B5/0268 ,  G03B21/60 ,  G09F19/18 ,  H04N5/74

Abstract: Provided is a film for a transparent screen which can clearly display merchandise information, advertisement, or the like on a transparent partition or the like by projection without compromising the transmission visibility. A film for a transparent screen according to the present invention includes: a resin layer; and inorganic particles at least a portion of which is contained in an aggregated state in the resin layer, wherein primary particles of the inorganic particles have a median diameter of 0.1 to 50 nm and a maximum particle size of 10 to 500 nm, and the content of the inorganic particles is 0.015 to 1.2% by mass with respect to the resin.

Abstract translation: 提供了一种透明屏幕的胶片，其可以通过投影而在不影响透射可见性的情况下在透明分区等上清楚地显示商品信息，广告等。 根据本发明的用于透明屏幕的膜包括：树脂层; 无机粒子的至少一部分在树脂层中以聚集状态包含，其中无机粒子的一次粒子的中值粒径为0.1〜50nm，最大粒径为10〜500nm，其含量 的无机粒子相对于树脂为0.015〜1.2质量％。

公开(公告)号：US09493672B2

公开(公告)日：2016-11-15

申请号：US14232610

申请日：2012-07-12

Applicant: Yanlin Song ,  Ming Yang ,  Haihua Zhou ,  Lianming Yang ,  Gang Li

Inventor： Yanlin Song ,  Ming Yang ,  Haihua Zhou ,  Lianming Yang ,  Gang Li

IPC: C09D161/06 ,  B05D5/02 ,  C09D105/00 ,  C09D161/24 ,  C09D163/00 ,  C09D175/04 ,  C09D7/12 ,  C09D133/10 ,  C09D167/06 ,  C09D133/02 ,  C09D131/04 ,  C09D167/00 ,  B05D3/02 ,  B05D1/28 ,  B05D1/00 ,  C08K3/22 ,  C08K3/36 ,  C08K5/05 ,  C08K5/06 ,  C08K5/101

CPC classification number: C09D161/06 ,  B05D1/005 ,  B05D1/28 ,  B05D3/0254 ,  B05D5/02 ,  C08K3/22 ,  C08K3/36 ,  C08K5/05 ,  C08K5/06 ,  C08K5/101 ,  C08K2003/2213 ,  C08K2003/2227 ,  C08K2003/2241 ,  C08K2003/2296 ,  C09D7/61 ,  C09D7/67 ,  C09D7/68 ,  C09D105/00 ,  C09D131/04 ,  C09D133/02 ,  C09D133/10 ,  C09D161/24 ,  C09D163/00 ,  C09D167/00 ,  C09D167/06 ,  C09D175/04 ,  C09D129/14

Abstract: A coating material for an aluminum substrate for inkjet computer-to-plate and preparation method and use of same. The composition of the coating material is: high polymer 5-40 wt %; nano-sized and/or micro-sized oxide particles 5-30 wt %; organic solvent constituting the remainder. The high polymer is at least one selected from the group consisting of MMA-BMA-MA terpolymer resin, phenolic resin, epoxy resin, polyurethane, polyester, urea-formaldehyde resin, polyvinyl formal, polyvinyl butyral and gum arabic. The preparation method for obtaining the coating material is to mix the ingredients together and stir at room temperature. A spin coating method or a roll coating method is used to coat the coating material onto a clean aluminum substrate having not undergone electrolytic graining and anodic oxidation treatment, and then the substrate is baked, resulting in the required roughness.

Abstract translation: 喷墨印刷电路板用铝基材用涂料及其制备方法和用途。 涂料的组成为：5-40重量％的高聚物; 5-30重量％的纳米尺寸和/或微尺寸氧化物颗粒; 构成其余部分的有机溶剂。 高聚物是选自MMA-BMA-MA三元共聚树脂，酚醛树脂，环氧树脂，聚氨酯，聚酯，脲 - 甲醛树脂，聚乙烯醇缩甲醛，聚乙烯醇缩丁醛和阿拉伯树胶中的至少一种。 获得涂料的制备方法是将成分混合在一起并在室温下搅拌。 使用旋涂法或辊涂法将涂料涂覆在没有进行电解砂化和阳极氧化处理的清洁铝基板上，然后烘烤基板，导致所需的粗糙度。