CURABLE RESIN COMPOSITION, CURED PRODUCT, DIFFRACTIVE OPTICAL ELEMENT, MULTILAYER DIFFRACTIVE OPTICAL ELEMENT, AND OXIDE NANOPARTICLES

    公开(公告)号:US20230322981A1

    公开(公告)日:2023-10-12

    申请号:US18148031

    申请日:2022-12-29

    CPC classification number: C08F120/12 C08K3/22 C08K2003/2213 C08K2003/2231

    Abstract: An object of the present invention is to provide a cured product which is suitable as a material for a layer of low refractive index in a multilayer diffractive optical element, can exhibit a desired chromatic aberration reducing effect over a near-infrared wavelength region to a shortwave infrared wavelength region in a case of being used in the multilayer diffractive optical element, and can exhibit high transmittance in this wavelength range; a curable resin composition suitable for obtaining this cured product; and a diffractive optical element and a multilayer diffractive optical element including this cured product. Provided are a curable resin composition which includes oxide nanoparticles including indium and cerium, a monofunctional or higher functional (meth)acrylate compound, and a dispersant; a cured product formed of the curable resin composition; a diffractive optical element and a multilayer diffractive optical element; and oxide nanoparticles used in this composition.

    SELECTIVE NITRIDE SLURRIES WITH IMPROVED STABILITY AND IMPROVED POLISHING CHARACTERISTICS
    7.
    发明申请
    SELECTIVE NITRIDE SLURRIES WITH IMPROVED STABILITY AND IMPROVED POLISHING CHARACTERISTICS 有权
    具有改进的稳定性和改进的抛光特性的选择性氮化物流

    公开(公告)号:US20170066102A1

    公开(公告)日:2017-03-09

    申请号:US14849066

    申请日:2015-09-09

    CPC classification number: B24B37/044 C08K2003/2213 C09G1/02

    Abstract: The invention provides a chemical-mechanical polishing composition comprising, consisting essentially of, or consisting of (a) about 0.01 wt. % to about 1 wt. % of wet-process ceria, (b) about 10 ppm to about 200 ppm of a cationic polymer comprising quaternary amino groups, (c) about 10 ppm to about 2000 ppm of a non-fluorinated nonionic surfactant, (d) an amino acid, and (e) water, wherein the polishing composition has a pH of about 3 to about 8. The invention further provides a method of polishing a substrate with the polishing composition.

    Abstract translation: 本发明提供一种化学机械抛光组合物,其包含,主要由...组成或由(a)约0.01wt。 %至约1wt。 湿法二氧化铈的百分比,(b)约10ppm至约200ppm的包含季氨基的阳离子聚合物,(c)约10ppm至约2000ppm的非氟化非离子表面活性剂,(d)氨基酸 ,和(e)水,其中抛光组合物具有约3至约8的pH。本发明还提供了用抛光组合物抛光基材的方法。

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