公开(公告)号：US12228499B2

公开(公告)日：2025-02-18

申请号：US18111229

申请日：2023-02-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehwang Jung ,  Yasuhiro Hidaka ,  Mitsunori Numata ,  Wookrae Kim ,  Jinseob Kim ,  Myungjun Lee

IPC: G01N21/21 ,  G01N21/95 ,  G02B27/10

Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.

公开(公告)号：US12002698B2

公开(公告)日：2024-06-04

申请号：US17174731

申请日：2021-02-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Myungjun Lee ,  Changhyeong Yoon ,  Wookrae Kim ,  Jaehwang Jung ,  Jinseob Kim

IPC: H01L21/67 ,  G01N21/47 ,  G01N21/88 ,  G01N21/95 ,  G06N20/00

CPC classification number: H01L21/67288 ,  G01N21/4788 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2201/021 ,  G01N2201/0636 ,  G06N20/00

Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.

公开(公告)号：US20240118072A1

公开(公告)日：2024-04-11

申请号：US18215437

申请日：2023-06-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sungho Jang ,  Sangwoo Bae ,  Minhwan Seo ,  Jangwoon Sung ,  Akinori Okubo ,  Seungwoo Lee ,  Jungchul Lee ,  Jaehwang Jung ,  Sangjoon Hong

IPC: G01B11/06 ,  G01B9/02

CPC classification number: G01B11/0608 ,  G01B9/02041 ,  G01B2290/70

Abstract: Provided are a level sensor configured to detect a height level of a substrate, and a substrate processing apparatus including the level sensor. The level sensor includes a measurement light source configured to radiate measurement light toward the substrate, a prism configured to split reflected light of the measurement light into first polarized light and second polarized light and generate a first optical path length difference between the first polarized light and the second polarized light, an optical path length modulator configured to keep constant an optical path length of the first polarized light and periodically change an optical path length of the second polarized light, and a detector configured to detect the first optical path length difference based on an interference signal between the first polarized light and the second polarized light.

公开(公告)号：US11604136B2

公开(公告)日：2023-03-14

申请号：US17204059

申请日：2021-03-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehwang Jung ,  Yasuhiro Hidaka ,  Mitsunori Numata ,  Wookrae Kim ,  Jinseob Kim ,  Myungjun Lee

IPC: G01N21/21 ,  G01N21/95 ,  G02B27/10

Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.

公开(公告)号：US20210164919A1

公开(公告)日：2021-06-03

申请号：US17022249

申请日：2020-09-16

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kyungwon Yun ,  Taewan Kim ,  Seungbeom Park ,  Jaehyeon Son ,  Myungjun Lee ,  Jaehwang Jung

IPC: G01N21/956 ,  G01N21/45

Abstract: An inspection apparatus includes: a light source that generates and outputs light; a stage on which an inspection target is arranged; an irradiation optical system that irradiates light from the light source to the inspection target; a detector that receives the light diffracted from the inspection target and generates diffraction image; and a detector moving device configured to move the detector on a z-axis, which is an optical axis of the light, and an x-y plane perpendicular to the z-axis. Furthermore, while the detector moves on the x-y plane and the z-axis through the detector moving device, the detector generates a plurality of the diffraction images with different positions on the x-y plane and the z-axis with respect to the inspection target, and thus simultaneously implements phase retrieval and super resolution of diffraction images.