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公开(公告)号:US12002698B2
公开(公告)日:2024-06-04
申请号:US17174731
申请日:2021-02-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Myungjun Lee , Changhyeong Yoon , Wookrae Kim , Jaehwang Jung , Jinseob Kim
CPC classification number: H01L21/67288 , G01N21/4788 , G01N21/8851 , G01N21/9501 , G01N2201/021 , G01N2201/0636 , G06N20/00
Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.
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公开(公告)号:US11624699B2
公开(公告)日:2023-04-11
申请号:US17081568
申请日:2020-10-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jaehwang Jung , Wookrae Kim , Myoungki Ahn , Changhyeong Yoon
Abstract: A measurement system is disclosed. A measurement system includes an illumination module, a mirror module, a stage, and a detector. The illumination module includes a light source, an optical fiber, a collimating mirror, a polarization state generator, a beam control mirror, and a relay mirror. The mirror module includes a first beam splitter and a reflective objective mirror. The beam control mirror is movable to relay light received from the polarization state generator to various positions on the relay mirror.
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