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11.发明授权Complex substrate for display apparatus, display apparatus having the same and method of manufacturing the same 有权显示装置用复合基板，具有该显示装置的显示装置及其制造方法公开(公告)号：US09594206B2
公开(公告)日：2017-03-14
申请号：US14488445
申请日：2014-09-17
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Yang-Ho Jung , Hoon Kang , Chul-Won Park , Jin-Ho Ju
IPC: H01L21/4763 , F21V8/00 , G02B5/04 , G02B5/30 , G02B3/00 , G02F1/1335
CPC classification number: G02B6/0056 , G02B3/0037 , G02B5/045 , G02B5/3058 , G02B6/0053 , G02B6/0065 , G02F1/133528 , G02F2001/133548 , G02F2001/133565
Abstract: A complex substrate for a display apparatus, the complex substrate includes a lower base substrate including convex and concave patterns, the convex and concave patterns being integral with an upper side of the lower base substrate, a planarizing layer on the lower base substrate, the planarizing layer being integral with the convex and concave patterns, and the planarizing layer having different refractivity from the lower base substrate, and a wire grid pattern on the planarizing layer, the wire grid pattern including a plurality of nano wire metal patterns, each of the nano wire metal patterns having a width of no more than a micrometer.
Abstract translation: 一种显示装置用复合基板，所述复合基板包括下基板，所述下基板包括凸凹图案，所述凸凹图案与所述下基板的上侧一体，所述下基板上的平坦化层， 层与凸形图案和凹形图案成一体，并且具有与下基底基板不同的折射率的平坦化层，以及平面化层上的线栅图案，线栅图案包括多个纳米线金属图案，每个纳米线 具有不超过千分尺的宽度的金属丝图案。
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12.发明申请MASK FOR PHOTOLITHOGRAPHY, METHOD OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING SUBSTRATE USING THE SAME 有权用于光刻机的掩模，其制造方法和使用其制造基板的方法公开(公告)号：US20160033857A1
公开(公告)日：2016-02-04
申请号：US14752415
申请日：2015-06-26
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
Abstract translation: 用于光刻的掩模包括：透明基板; 在所述透明基板上的相移图案，并且被配置为改变光的相位; 透明基板上的介电层; 和在介电层上的负折射率超材料层。
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13.发明申请PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME 审中-公开光电组合物和使用其制造显示器基板的方法公开(公告)号：US20150301452A1
公开(公告)日：2015-10-22
申请号：US14503062
申请日：2014-09-30
Applicant: Samsung Display Co., Ltd.
Inventor： Jeong-Min Park , Jun Chun , Ji-Hyun Kim , Sung-Kyun Park , Jung-Soo Lee , Ki-Hyun Cho , Jin-Ho Ju , Chang-Ik Lee , Se-Tae Oh , Deok-Man Kang
CPC classification number: C23F1/02 , C23F1/16 , G03F7/0392 , G03F7/0395 , G03F7/0397 , H01L27/1288
Abstract: A chemically amplified photoresist composition is provided which includes: a solute including a novolac resin with an acid decomposable protecting group, a photoacid generator, and an organic solvent.
Abstract translation: 提供一种化学放大光致抗蚀剂组合物，其包括：包含具有酸可分解保护基的酚醛清漆树脂的溶质，光酸产生剂和有机溶剂。
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公开(公告)号：US20150162356A1
公开(公告)日：2015-06-11
申请号：US14316523
申请日：2014-06-26
Applicant: Samsung Display Co., Ltd.
Inventor： Seung-Bo Shim , Dong-Hyun Yu , Jin-Ho Ju
CPC classification number: G03F1/50 , G03F1/00 , H01L21/0274 , H01L21/31144 , H01L21/32 , H01L27/1214 , H01L27/124 , H01L27/1248 , H01L27/1259 , H01L29/66757 , H01L51/0541 , H01L51/0545
Abstract: A display device includes a substrate including a first region and a second region, a gate line and a data line on the substrate, a thin film transistor on the substrate, being connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor, wherein the second region has a second contact hole of which an area is larger than that of a first contact hole of the first region.
Abstract translation: 一种显示装置，包括：基板，包括第一区域和第二区域;基板上的栅极线和数据线;基板上的薄膜晶体管，连接到栅极线和数据线;以及连接有像素电极的像素电极 到所述薄膜晶体管，其中所述第二区域具有第二接触孔，所述第二接触孔的面积大于所述第一区域的第一接触孔的面积。
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公开(公告)号：US09417526B2
公开(公告)日：2016-08-16
申请号：US14573624
申请日：2014-12-17
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jun Chun , Jeong-Min Park , Sung-Kyun Park , Ji-Hyun Kim , Jin-Ho Ju , Hyoc-Min Youn , Dong-Myung Kim , Jin-Sun Kim , Tai-Hoon Yeo , Byung-Uk Kim
IPC: G03F7/004 , G03F7/038 , G03F7/30 , C08F220/10 , C08F220/26 , C08F220/16 , C08F220/18 , C08F212/34 , H01L51/10 , H01L21/027 , H01L21/311 , G02F1/1362
CPC classification number: G03F7/0388 , C08F212/34 , C08F220/10 , C08F220/16 , C08F220/18 , C08F220/26 , G02F2001/13625 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0751 , G03F7/30 , H01L21/0274 , H01L21/31138 , H01L51/102
Abstract: A photoresist composition includes an acid-labile polymer that is decomposable by reaction with an acid, a photoacid generator, an organic base having a pKa value of 9 or less and a solvent. Based on 100 parts by weight of the acid-labile polymer, the photoacid generator is about 1 to about 30 parts by weight, and the organic base is about 0.1 to about 5 parts by weight. The solvent is about 50 to about 90 wt % based on the total weight of the composition.
Abstract translation: 光致抗蚀剂组合物包括通过与酸反应可分解的酸不稳定聚合物，光酸产生剂，pKa值为9以下的有机碱和溶剂。 基于100重量份的酸不稳定聚合物，光酸产生剂为约1至约30重量份，有机碱为约0.1至约5重量份。 基于组合物的总重量，溶剂为约50至约90重量％。
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Patent Agency Ranking
公开(公告)号：US20160230289A1
公开(公告)日：2016-08-11
申请号：US15134672
申请日：2016-04-21
Applicant: Samsung Display Co., Ltd. , LTCAM CO., LTD.
Inventor： Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
CPC classification number: C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
Abstract: A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
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17.发明授权Phase shift mask, patterning method using the same and method of manufacturing display panel using the same 有权相移掩模，使用其的图案化方法以及使用其的显示面板的制造方法公开(公告)号：US09395619B2
公开(公告)日：2016-07-19
申请号：US14307797
申请日：2014-06-18
Applicant: Samsung Display Co., LTD.
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Dong-Eon Lee , Jun-Hyuk Woo , Hyun-Joo Lee , Sang-Uk Lim , Jin-Ho Ju
CPC classification number: G03F1/26 , G02F2001/136231 , G03F7/20 , G03F7/40 , H01L27/1288
Abstract: A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
Abstract translation: 相移装置包括：包括透明基板的相移掩模和设置在透明基板上的相移图案，并且包括具有第一厚度的第一区域，第二区域的第二厚度小于 第一厚度，具有第一开口宽度并限定在第一区域的第一开口，以及具有第二开口宽度并限定在第二区域的第二开口。
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公开(公告)号：US09377687B2
公开(公告)日：2016-06-28
申请号：US14295463
申请日：2014-06-04
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jun Chun , Ji-Hyun Kim , Sung-Kyun Park , Jeong-Min Park , Jung-Soo Lee , Jin-Ho Ju
IPC: G03F7/26 , G03F7/039 , H01L21/3213
CPC classification number: G03F7/0392 , C08G77/14 , C08G77/26 , C09D183/06 , C09D183/08 , G03F7/0752 , G03F7/11 , H01L21/32139
Abstract: A method of manufacturing a pattern includes forming a pattern material layer on a substrate, forming a protective layer on the pattern material layer, forming a resist layer on the protective layer, selectively exposing the resist layer to light, and developing the selectively exposed resist layer.
Abstract translation: 制造图案的方法包括在基板上形成图案材料层，在图案材料层上形成保护层，在保护层上形成抗蚀剂层，选择性地将抗蚀剂层曝光，并使选择性曝光的抗蚀剂层显影 。
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公开(公告)号：US20160139504A1
公开(公告)日：2016-05-19
申请号：US14678743
申请日：2015-04-03
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jun-Hyuk Woo , Jeong-Won Kim , Kwang-Woo Park , Dong-Eon Lee , Seung-Bo Shim , Jin-Ho Ju
CPC classification number: G03F1/38 , G03F1/54 , G03F1/58 , G03F1/80 , G03F7/0007
Abstract: A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.
Abstract translation: 光掩模包括透明基板和掩模图案。 掩模图案设置在透明基板上。 掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。 发送部分与阻挡部分相邻。 阻挡部分包括第一阻挡层，光引导层和第二阻挡层。 第一阻挡层设置在透明基板上。 第一阻挡层透射光的一部分。 第一阻挡层包括多个阻挡图案，包括第一阻挡材料。 光引导层设置在第一阻挡层上。 光导层将光的透射部分引导到光导层的侧表面。 第二阻挡层反射光的透射部分。
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公开(公告)号：US20160131952A1
公开(公告)日：2016-05-12
申请号：US14663358
申请日：2015-03-19
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Chul-Won Park , Hoon Kang , Koichi Sugitani , Jin-Ho Ju
IPC: G02F1/1362 , G02F1/1341 , G02F1/1339 , G02F1/1368 , G02F1/1335
CPC classification number: G02F1/136227 , G02F1/133512 , G02F1/133514 , G02F1/1339 , G02F1/1341 , G02F1/134363 , G02F1/136286 , G02F1/1368 , G02F2001/134372 , G02F2001/13629
Abstract: In a display panel, a thin film transistor is connected to a gate line and a data line, and includes a gate electrode, a semiconductor pattern, a source electrode and a drain electrode. An organic pattern makes contact with a side surface of the data line and a side surface of the thin film transistor, and the organic pattern overlaps pixel areas of the display panel. A first passivation layer is on the data line, the thin film transistor and the organic pattern. A common electrode is on the first passivation layer, and the common electrode overlaps the pixel areas. A second passivation layer covers the common electrode. A pixel electrode is on the second passivation layer, the pixel electrode overlaps the common electrode, and the pixel electrode is electrically connected to the drain electrode through a first contact hole and the data line through a second contact hole.
Abstract translation: 在显示面板中，薄膜晶体管连接到栅极线和数据线，并且包括栅电极，半导体图案，源电极和漏电极。 有机图案与数据线的侧表面和薄膜晶体管的侧表面接触，并且有机图案与显示面板的像素区域重叠。 第一钝化层位于数据线上，薄膜晶体管和有机图案。 公共电极在第一钝化层上，并且公共电极与像素区域重叠。 第二钝化层覆盖公共电极。 像素电极在第二钝化层上，像素电极与公共电极重叠，并且像素电极通过第一接触孔和数据线通过第二接触孔电连接到漏电极。
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