公开(公告)号：US09724715B2

公开(公告)日：2017-08-08

申请号：US13953982

申请日：2013-07-30

Applicant: Samsung Display Co., Ltd.

Inventor： Sung-Joong Joo ,  You-Min Cha ,  Seuk-Hwan Park

IPC: C23C14/04 ,  B05B12/00 ,  C23C14/54

CPC classification number: B05B12/00 ,  C23C14/04 ,  C23C14/545

Abstract: A deposition apparatus may uniformly control deposited quantities of a plurality of depositing sources by efficiently determining an abnormal depositing source. The deposition apparatus may reduce loss of materials by exactly determining an abnormal depositing source. The deposition apparatus includes: a plurality of depositing sources spraying a deposition material; a substrate holder fixing a substrate to face the depositing source; a depositing source shutter disposed at one side of the depositing source and opening and closing an passage of each depositing source; and a main shutter disposed between the depositing source and the substrate fixed to the substrate holder and depositing a part of the deposition material on the substrate through the main shutter.

公开(公告)号：US09620738B2

公开(公告)日：2017-04-11

申请号：US14872978

申请日：2015-10-01

Applicant: SAMSUNG DISPLAY CO., LTD

Inventor： Sung-Joong Joo ,  Myung-Soo Huh ,  Suk-Won Jung

IPC: H01L51/50 ,  H05B33/04 ,  H01L51/52 ,  H05B33/10

CPC classification number: H01L51/5256 ,  H05B33/04 ,  H05B33/10

Abstract: A flat panel display device provides a sealing structure for comprising and sealing a display unit disposed in a first region on a substrate. The display unit includes the first region and a second region, and a barrier is disposed in the first region on the substrate, on an outer side of the display unit, and adjacent to the second region. The sealing structure contacts the barrier, and includes at least one first layer of an inorganic material and at least one second layer of an organic material. A method of manufacturing the flat panel display device is also disclosed.

公开(公告)号：US20140131311A1

公开(公告)日：2014-05-15

申请号：US13906138

申请日：2013-05-30

Applicant: Samsung Display Co., Ltd

Inventor： Sung-Joong Joo ,  You-Min Cha

IPC: H01J37/32

CPC classification number: H01J37/32366 ,  H01J37/3244

Abstract: A thin film forming apparatus and a thin film forming method using the same are disclosed. In one aspect, the thin film forming apparatus comprises a mask that includes a blocking portion and an opening. It also includes an etching source that jets an etching gas through the opening of the mask to etch a thin film according to a pattern. The mask includes a gas blower for blowing a gas around the opening so that the etching gas does not penetrate into a thin film area corresponding to the block portion. When the thin film forming apparatus is used, a normal residual area of a thin film may be safely preserved and patterning may be accurately performed. Thus, the quality of a product manufactured by using the thin film forming apparatus may be improved.

Abstract translation: 公开了一种薄膜形成装置和使用该薄膜形成装置的薄膜形成方法。 在一个方面，薄膜形成装置包括一个包括阻挡部分和开口的掩模。 它还包括蚀刻源，其通过掩模的开口喷射蚀刻气体，以根据图案蚀刻薄膜。 掩模包括用于在开口周围吹送气体的气体鼓风机，使得蚀刻气体不会渗透到对应于块部分的薄膜区域中。 当使用薄膜形成装置时，可以安全地保留薄膜的正常残留区域，并且可以精确地进行图案化。 因此，可以提高通过使用薄膜形成装置制造的产品的质量。