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11.发明授权公开(公告)号：US09590207B2
公开(公告)日：2017-03-07
申请号：US15073354
申请日：2016-03-17
Applicant: Samsung Display Co., Ltd.
Inventor： Myung-Soo Huh , Sun-Ho Kim , Hyun-Woo Joo , Jae-Hyun Kim
CPC classification number: H01L51/5253 , H01L27/3244 , H01L51/001 , H01L51/5012 , H01L51/56 , H01L2251/558
Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.
Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。
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12.发明申请VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS 审中-公开蒸气沉积装置及制造有机发光显示装置的方法公开(公告)号：US20160348241A1
公开(公告)日：2016-12-01
申请号：US15231647
申请日：2016-08-08
Applicant: Samsung Display Co., Ltd.
Inventor： Cheol-Min Jang , Myung-Soo Huh , Suk-Won Jung , Jae-Hyun Kim , Sung-Chul Kim , Jin-Kwang Kim , Chang-Woo Shim , Sung-Hun Key , In-Kyo Kim
IPC: C23C16/455 , H01L51/00 , C23C16/44 , H01L51/56
CPC classification number: C23C16/45544 , C23C16/403 , C23C16/4412 , C23C16/45519 , C23C16/45563 , H01L27/3244 , H01L51/001 , H01L51/0011 , H01L51/50 , H01L51/56
Abstract: A vapor deposition apparatus for depositing a thin film on a substrate, by which a deposition process is efficiently performed and deposition film characteristics are easily improved, and a vapor deposition apparatus including: a stage onto which a substrate is disposed; and a supply unit disposed to face the substrate and having a main body member and a nozzle member disposed on one surface of the main body member facing the substrate, to sequentially supply a plurality of gases towards the substrate, and a method of manufacturing an organic light-emitting display apparatus using the same.
Abstract translation: 一种用于在基板上沉积薄膜的气相沉积设备，通过该气相沉积设备有效地进行沉积工艺并容易地改善沉积膜特性;以及气相沉积设备，包括：设置有基板的平台; 以及供给单元，其配置成面对基板，具有主体部件和喷嘴部件，所述主体部件和喷嘴部件配置在与所述基板相对的所述主体部件的一个表面上，以顺序向所述基板供给多个气体;以及制造有机物的方法 发光显示装置。
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13.发明授权公开(公告)号：US09306192B2
公开(公告)日：2016-04-05
申请号：US13965182
申请日：2013-08-12
Applicant: Samsung Display Co., LTD
Inventor： Myung-Soo Huh , Sun-Ho Kim , Hyun-Woo Joo , Jae-Hyun Kim
CPC classification number: H01L51/5253 , H01L27/3244 , H01L51/001 , H01L51/5012 , H01L51/56 , H01L2251/558
Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.
Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。
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公开(公告)号：US08829550B2
公开(公告)日：2014-09-09
申请号：US13742151
申请日：2013-01-15
Applicant: Samsung Display Co., Ltd.
Inventor： Chi-O Cho , Jae-Hyun Kim , Donghwan Kim , JungKyun Kim , Insun Hwang
CPC classification number: H01L33/48 , H01L33/08 , H01L33/501 , H01L33/502 , H01L2224/48091 , H01L2224/48247 , H01L2924/00014
Abstract: A light emitting diode package includes a light emitting diode that emits a first light, a fluorescent substance that absorbs the first light and generates a second light having a wavelength different from the first light, and at least one core-shell particle disposed on a surface of the fluorescent substance. The core-shell particle includes a metal particle and an insulating layer coated on a surface of the metal particle. The core-shell particle receives at least one light component of the first light and the second light to induce a surface plasmon resonance.
Abstract translation: 发光二极管封装包括发射第一光的发光二极管，吸收第一光并产生具有不同于第一光的波长的第二光的荧光物质，以及设置在表面上的至少一个核 - 壳颗粒 的荧光物质。 核 - 壳颗粒包括金属颗粒和涂覆在金属颗粒的表面上的绝缘层。 核 - 壳颗粒接收第一光和第二光的至少一种光分量以诱导表面等离子体共振。
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公开(公告)号：US12065735B2
公开(公告)日：2024-08-20
申请号：US16774409
申请日：2020-01-28
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Choel-Min Jang , Jin-Kwang Kim , Sung-Chul Kim , Jae-Hyun Kim , Seung-Yong Song , Suk-Won Jung , Myung-Soo Huh
IPC: C23C16/44 , C23C16/455 , H01J37/32
CPC classification number: C23C16/4412 , C23C16/4402 , C23C16/45536 , H01J37/32357 , H01J37/32834
Abstract: Provided is a vapor deposition apparatus including a first injection unit injecting a first raw gas in a first direction and a first filter unit mounted on the first injection unit. The first filter unit includes a plurality of plates separated from one another in the first direction and disposed in parallel to one another, each of the plurality of plates having holes therein, being detachably coupled with the first filter unit, and having the holes with sizes of horizontal cross-sections gradually increasing in a direction in which the first raw gas moves. Accordingly, a process efficiency of the vapor deposition apparatus may be enhanced.
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Patent Agency Ranking
公开(公告)号：US20220380899A1
公开(公告)日：2022-12-01
申请号：US17882967
申请日：2022-08-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jin-Kwang Kim , Seung-Yong Song , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jae-Hyun Kim , Sung-Chul Kim
IPC: C23C16/455
Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.
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公开(公告)号：US11408072B2
公开(公告)日：2022-08-09
申请号：US16271189
申请日：2019-02-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jin-Kwang Kim , Seung-Yong Song , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jae-Hyun Kim , Sung-Chul Kim
IPC: C23C16/455
Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.
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18.发明授权公开(公告)号：US10672841B2
公开(公告)日：2020-06-02
申请号：US15707419
申请日：2017-09-18
Applicant: Samsung Display Co., Ltd.
Inventor： Jae-Hyun Kim , Jin-Oh Kwag , Yong-Kyu Jang
IPC: H01L27/32 , G09G3/3258 , H01L51/56
Abstract: A display apparatus includes a first substrate and a second substrate opposing to the first substrate. The first substrate includes a transmission area in which a shutter unit is disposed and an emission area in which an organic light emitting diode is disposed. The shutter unit includes a first shutter electrode, a second shutter electrode, and a shutter layer interposed between the first and second shutter electrodes. The organic light emitting diode includes a pixel electrode, a common electrode, and a light-emitting layer interposed between the pixel and common electrodes. At least one of the first and second shutter electrodes is connected to the common electrode of the organic light emitting diode.
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公开(公告)号：US10446753B2
公开(公告)日：2019-10-15
申请号：US15205815
申请日：2016-07-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jin-Kwang Kim , Seung-Yong Song , Myung-Soo Huh , Suk-Won Jung , Choel-Min Jang , Jae-Hyun Kim , Sung-Chul Kim
IPC: C23C16/44 , H01L51/00 , H01B13/30 , C23C14/24 , C23C14/56 , C23C16/455 , C23C16/50 , H01L51/52 , H01L51/56 , H01L27/32
Abstract: A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.
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20.发明申请公开(公告)号：US20160197305A1
公开(公告)日：2016-07-07
申请号：US15073354
申请日：2016-03-17
Applicant: Samsung Display Co., Ltd.
Inventor： Myung-Soo Huh , Sun-Ho Kim , Hyun-Woo Joo , Jae-Hyun Kim
CPC classification number: H01L51/5253 , H01L27/3244 , H01L51/001 , H01L51/5012 , H01L51/56 , H01L2251/558
Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.
Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。
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