公开(公告)号：US10038169B2

公开(公告)日：2018-07-31

申请号：US14020848

申请日：2013-09-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Jin-Kwang Kim ,  In-Kyo Kim ,  Choel-Min Jang

IPC: H01J37/00 ,  H01L51/56 ,  C23C16/452 ,  H01J37/32

CPC classification number: H01L51/56 ,  C23C16/452 ,  H01J37/32357

Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.

公开(公告)号：US09142415B2

公开(公告)日：2015-09-22

申请号：US14269175

申请日：2014-05-04

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Sung-Chul Kim ,  Sang-Hyuk Hong ,  Choel-Min Jang

IPC: H01L21/285 ,  H01L21/02 ,  H01L51/56 ,  H01L51/00

CPC classification number: H01L21/28506 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/45578 ,  C23C16/458 ,  C23C16/509 ,  H01J37/32357 ,  H01J37/3244 ,  H01L21/02274 ,  H01L51/001 ,  H01L51/56

Abstract: A deposition apparatus for performing a deposition process on a substrate includes: an injection unit including a plasma generating member which receives a raw material gas and converts the raw material gas to a deposition source material in a radical form; and a plasma processor disposed adjacent to the injection unit and facing a side of the injection unit, wherein the plasma processor performs a plasma process in a direction facing the substrate.

Abstract translation: 用于在基板上进行沉积处理的沉积装置包括：注入单元，其包括等离子体产生元件，该等离子体产生元件接纳原料气体，并将原料气体以基本形式转化为沉积源材料; 以及等离子体处理器，其与所述注入单元相邻并且面向所述注入单元的一侧，其中所述等离子体处理器在面向所述基板的方向上执行等离子体处理。

公开(公告)号：US20150144062A1

公开(公告)日：2015-05-28

申请号：US14590491

申请日：2015-01-06

Applicant: Samsung Display Co., Ltd.

Inventor： Choel-Min Jang ,  Myung-Soo Huh ,  Jeong-Ho Yi ,  Cheol-Rae Jo ,  Sang-Joon Seo ,  Seung-Hun Kim ,  Jin-Kwang Kim

IPC: C23C16/46 ,  C23C16/458 ,  C23C16/455

CPC classification number: C23C16/46 ,  C23C16/45551 ,  C23C16/45563 ,  C23C16/4583

Abstract: A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.

Abstract translation: 蒸镀装置包括：载置基板的载物台; 加热器单元，其设置在所述台的一侧并且包括第一加热器和第二加热器，其中所述第一加热器和所述第二加热器可移动，使得所述第一加热器和所述第二加热器彼此间隔开或布置 相邻; 以及喷嘴单元，其设置在与所述加热器单元围绕所述台架配置的一侧相对的一侧，并且包括一个或多个喷嘴。

公开(公告)号：US20150072453A1

公开(公告)日：2015-03-12

申请号：US14177180

申请日：2014-02-10

Applicant: Samsung Display Co., Ltd.

Inventor： Choel-Min Jang ,  Sung-Hun Key ,  In-Kyo Kim ,  Suk-Won Jung ,  Myung-Soo Huh

IPC: H01L51/00 ,  H01L51/56

CPC classification number: C23C16/45551

Abstract: A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.

Abstract translation: 一种用于在衬底上沉积薄膜的气相沉积设备包括：供给单元，包括多个线性供应构件，其被构造成供应至少一种气体; 以及喷嘴单元，其包括连接到所述多个供应构件并被配置为朝向所述基板供应所述至少一种气体的多个喷嘴构件，其中所述多个喷嘴构件中的两个相邻的喷嘴构件连接到至少一个共同的供应构件 的多个供应构件。

公开(公告)号：US20150027374A1

公开(公告)日：2015-01-29

申请号：US14302646

申请日：2014-06-12

Applicant: Samsung Display Co., Ltd.

Inventor： Jin-Kwang Kim ,  Seung-Yong Song ,  Myung-Soo Huh ,  Suk-Won Jung ,  Choel-Min Jang ,  Jae-Hyun Kim ,  Sung-Chul Kim

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/50

CPC classification number: C23C16/4412 ,  C23C16/4402 ,  C23C16/45536 ,  C23C16/45551 ,  Y10T137/794

Abstract: A vapor deposition apparatus includes a first injection unit through which a first raw gas is injected in a first direction, and a first filter unit which is mounted in the first injection unit and includes a plurality of plates separated from one another in the first direction and disposed in parallel to one another, where holes are defined in each of the plurality of plates which is detachably coupled in the first filter unit.

Abstract translation: 一种气相沉积装置包括：第一注入单元，通过该第一注入单元沿第一方向注入第一原料气体;第一过滤器单元，其安装在第一注射单元中并且包括沿第一方向彼此分离的多个板; 彼此平行设置，其中，在可拆卸地联接在第一过滤器单元中的多个板中的每一个中限定有孔。

公开(公告)号：US20140053777A1

公开(公告)日：2014-02-27

申请号：US13689638

申请日：2012-11-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jai-Hyuk Choi ,  Myung-Soo Huh ,  Choel-Min Jang ,  Dong-Kyun Ko ,  In-Kyu Kim ,  Sung-Hun Key

IPC: C23C16/50

CPC classification number: C23C16/50 ,  C23C16/45519 ,  C23C16/45536 ,  C23C16/45551

Abstract: A vapor deposition apparatus that includes a first region having a first injecting unit for injecting a first raw material and a second region having a second injecting unit for injecting a second raw material, wherein the second injecting unit comprises a plasma generation unit, wherein the plasma generation unit comprises a plasma generator, a corresponding surface surrounding the plasma generator, and a plasma generation space formed between the plasma generator and the corresponding surface, and wherein distances between the plasma generator and the corresponding surface periodically vary along an outer circumference of the plasma generator. In the vapor deposition apparatus, the quality of thin film is increased by forming stable volume plasma through set positions where the plasma is generated in the plasma generation space.

Abstract translation: 一种蒸镀装置，其特征在于，具备：第一区域，具有用于注入第一原料的第一注入单元和具有用于注入第二原料的第二注入单元的第二区域，其中，所述第二注入单元包括等离子体产生单元， 生成单元包括等离子体发生器，围绕等离子体发生器的对应表面以及形成在等离子体发生器和对应表面之间的等离子体产生空间，并且其中等离子体发生器与对应表面之间的距离周期性地沿等离子体的外周变化 发电机。 在气相沉积装置中，通过在等离子体产生空间中产生等离子体的设定位置形成稳定的体积等离子体来提高薄膜的质量。

公开(公告)号：US12065735B2

公开(公告)日：2024-08-20

申请号：US16774409

申请日：2020-01-28

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Choel-Min Jang ,  Jin-Kwang Kim ,  Sung-Chul Kim ,  Jae-Hyun Kim ,  Seung-Yong Song ,  Suk-Won Jung ,  Myung-Soo Huh

IPC: C23C16/44 ,  C23C16/455 ,  H01J37/32

CPC classification number: C23C16/4412 ,  C23C16/4402 ,  C23C16/45536 ,  H01J37/32357 ,  H01J37/32834

Abstract: Provided is a vapor deposition apparatus including a first injection unit injecting a first raw gas in a first direction and a first filter unit mounted on the first injection unit. The first filter unit includes a plurality of plates separated from one another in the first direction and disposed in parallel to one another, each of the plurality of plates having holes therein, being detachably coupled with the first filter unit, and having the holes with sizes of horizontal cross-sections gradually increasing in a direction in which the first raw gas moves. Accordingly, a process efficiency of the vapor deposition apparatus may be enhanced.

公开(公告)号：US20220380899A1

公开(公告)日：2022-12-01

申请号：US17882967

申请日：2022-08-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jin-Kwang Kim ,  Seung-Yong Song ,  Myung-Soo Huh ,  Suk-Won Jung ,  Choel-Min Jang ,  Jae-Hyun Kim ,  Sung-Chul Kim

IPC: C23C16/455

Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.

公开(公告)号：US11408072B2

公开(公告)日：2022-08-09

申请号：US16271189

申请日：2019-02-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jin-Kwang Kim ,  Seung-Yong Song ,  Myung-Soo Huh ,  Suk-Won Jung ,  Choel-Min Jang ,  Jae-Hyun Kim ,  Sung-Chul Kim

IPC: C23C16/455

Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.

公开(公告)号：US11101328B2

公开(公告)日：2021-08-24

申请号：US15076488

申请日：2016-03-21

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Suk-Won Jung ,  Myung-Soo Huh ,  Choel-Min Jang

IPC: H01J37/32 ,  C23C16/50 ,  H05H1/24 ,  C23C16/509 ,  C23C16/54 ,  H01L27/32 ,  C23C16/44 ,  C23C16/452 ,  C23C16/455 ,  H01L51/56

Abstract: Provided is a vapor deposition apparatus including: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a corresponding surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator.