DEVICE COMPRISING STACKED THROUGH ENCAPSULATION VIA INTERCONNECTS

    公开(公告)号:US20250022858A1

    公开(公告)日:2025-01-16

    申请号:US18352976

    申请日:2023-07-14

    Abstract: A device comprising (i) a first device portion comprising: a die substrate; at least one first dielectric layer; a first plurality of interconnects; a first encapsulation layer; and a first plurality of via interconnects located at least in the first encapsulation layer; (ii) a second device portion comprising: at least one second dielectric layer; a second plurality of interconnects; a second encapsulation layer; and a second plurality of via interconnects located at least in the second encapsulation layer; and (iii) a first plurality of solder interconnects coupled to the first device portion and the second device portion, wherein the first plurality of interconnects, the first plurality of via interconnects, the first plurality of solder interconnects, the second plurality of interconnects and the second plurality of via interconnects are configured to operate as an inductor.

    COMPACT HYBRID ACOUSTIC WAVE FILTER STRUCTURE

    公开(公告)号:US20240258995A1

    公开(公告)日:2024-08-01

    申请号:US18160917

    申请日:2023-01-27

    Abstract: A compact, hybrid, acoustic wave filter structure is disclosed. In an aspect an apparatus comprises a substrate; a first, multi-layer metallization structure disposed above the substrate; a plurality of pillar structures disposed above, and electrically coupled to, the first metallization structure; a second metallization structure disposed above, an electrically coupled to, the plurality of pillar structures. An acoustic unit (AU) is disposed between the first and second metallization structures and adjacent to at least one of the pillar structures. The AU comprises a surface acoustic wave or bulk acoustic wave acoustic resonator that is electrically coupled to a capacitor and an inductor. The capacitor comprises a metal-insulation-metal capacitor that is formed from a portion of the first metallization structure and optionally also from at least one pillar structure and a portion of the second metallization structure. The inductor is comprised of a second portion of the first metallization structure.

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