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    Fractal-edge thin film and method of manufacture
    13.
    发明授权
    Fractal-edge thin film and method of manufacture 有权

    公开(公告)号：US09679940B2

    公开(公告)日：2017-06-13

    申请号：US14323533

    申请日：2014-07-03

    Applicant: OmniVision Technologies, Inc.

    Inventor： Oray Orkun Cellek

    IPC: B32B3/10 ,  H01L27/146

    CPC classification number: H01L27/14685 ,  H01L27/1462 ,  H01L27/14687

    Abstract: A fractal-edge thin film includes a material layer having a perimeter with a fractal dimension exceeding one, the material layer having greater peel resistance as compared to a thin-film material layer with fractal dimension equaling one.A method of manufacturing a fractal-edge thin film includes determining an area shape to be covered by the fractal-edge thin film. The method also includes generating a thin-film perimeter based upon the area shape, the thin-film perimeter having a fractal dimension exceeding one. The method also includes determining a photomask perimeter such that a photomask with the photomask perimeter, when used in a photolithography process, yields a fractal-edge thin film with the thin-film perimeter. The method may also include photolithographically etching a thin-film, the thin film having a photoresist layer disposed thereon, the photoresist layer having been exposed through the photomask, wherein the etching results in the fractal-edge thin film.

    VIRTUAL HIGH DYNAMIC RANGE LARGE-SMALL PIXEL IMAGE SENSOR
    14.
    发明申请
    VIRTUAL HIGH DYNAMIC RANGE LARGE-SMALL PIXEL IMAGE SENSOR 有权
    虚拟高度动态范围的大型小型像素图像传感器

    公开(公告)号：US20160372507A1

    公开(公告)日：2016-12-22

    申请号：US14743385

    申请日：2015-06-18

    Applicant: OMNIVISION TECHNOLOGIES, INC.

    Inventor： Dajiang Yang ,  Gang Chen ,  Oray Orkun Cellek ,  Zhenhong Fu ,  Chen-Wei Lu ,  Duli Mao ,  Dyson H. Tai

    IPC: H01L27/146 ,  H04N5/374 ,  H04N5/355

    CPC classification number: H01L27/14621 ,  H01L27/14603 ,  H01L27/14623 ,  H01L27/14627 ,  H01L27/1463 ,  H01L27/1464 ,  H01L27/14645 ,  H04N5/35563 ,  H04N5/374

    Abstract: An image sensor includes photodiodes arranged in semiconductor material. Each of the photodiodes is identically sized and is fabricated in the semiconductor material with identical semiconductor processing conditions. The photodiodes are organized into virtual large-small groupings including a first photodiode and a second photodiode. Microlenses are disposed over the semiconductor material with each of microlenses disposed over a respective photodiode. A first microlens is disposed over the first photodiode, and a second microlens is disposed over the second photodiode. A mask is disposed between the first microlens and the first photodiode. The mask includes an opening through which a first portion of incident light directed through the first microlens is directed to the first photodiode. A second portion of the incident light directed through the first microlens is blocked by the mask from reaching the first photodiode. There is no mask between the second microlens and the second photodiode.

    Abstract translation: 图像传感器包括布置在半导体材料中的光电二极管。 每个光电二极管的尺寸相同，并且在具有相同半导体加工条件的半导体材料中制造。 光电二极管被组织成包括第一光电二极管和第二光电二极管的虚拟大小组。 微透镜设置在半导体材料上，每个微透镜设置在相应的光电二极管上。 第一微透镜设置在第一光电二极管的上方，第二微透镜设置在第二光电二极管的上方。 掩模设置在第一微透镜和第一光电二极管之间。 掩模包括开口，通过第一微透镜的入射光的第一部分通过该开口被引导到第一光电二极管。 通过第一微透镜的入射光的第二部分被掩模阻挡到达第一光电二极管。 在第二微透镜和第二光电二极管之间没有掩模。

    Linear-logarithmic image sensor
    15.
    发明授权
    Linear-logarithmic image sensor 有权

    公开(公告)号：US10687003B2

    公开(公告)日：2020-06-16

    申请号：US15228874

    申请日：2016-08-04

    Applicant: OMNIVISION TECHNOLOGIES, INC.

    Inventor： Keiji Mabuchi ,  Dyson H. Tai ,  Oray Orkun Cellek ,  Duli Mao ,  Sohei Manabe

    IPC: H04N5/355 ,  H04N5/369 ,  H01L27/146 ,  H04N5/3745 ,  H04N9/04 ,  H04N5/378

    Abstract: A pixel array for use in a high dynamic range image sensor includes a plurality of pixels arranged in a plurality of rows and columns in the pixel array. Each one of the pixels includes a linear subpixel and a log subpixel disposed in a semiconductor material. The linear subpixel is coupled to generate a linear output signal having a linear response, and the log subpixel is coupled to generate a log output signal having a logarithmic response in response to the incident light. A bitline is coupled to the linear subpixel and to the log subpixel to receive the linear output signal and the log output signal. The bitline is one of a plurality of bitlines coupled to the plurality of pixels. Each one of the plurality of bitlines is coupled to a corresponding grouping of the plurality of pixels.

    System and method for protecting a liquid crystal display by controlling ion migration
    16.
    发明授权
    System and method for protecting a liquid crystal display by controlling ion migration 有权

    公开(公告)号：US10481439B2

    公开(公告)日：2019-11-19

    申请号：US15357920

    申请日：2016-11-21

    Applicant: OmniVision Technologies, Inc.

    Inventor： Christopher Morgan Walker ,  Libo Weng ,  Oray Orkun Cellek ,  Ming Zhang ,  Yin Qian ,  Dyson Hsin-Chih Tai ,  Regis Fan

    IPC: G09G3/36 ,  G02F1/1337 ,  G02F1/137 ,  G02F1/1333

    Abstract: A liquid crystal display includes a display area and a border area at least partially surrounding the display area, where the display area displays images for viewing and the border area displays display-protection images, which are used to control ion migration in the liquid crystal layer. In a more particular embodiment, the border area displays a series of checkerboard pattern(s), where the checkerboard patterns can alternate between initial and inverted values. The display-protection images protect the liquid crystal display from migrating ions accumulating in particular regions of the pixel array and causing permanent defects in the display area. A liquid crystal display that includes a liquid crystal alignment layer having a plurality of liquid crystal alignment directions is also disclosed. The customized liquid crystal alignment director(s) over the border area promote ion migration away from the display area.

    Single-exposure high dynamic range sensor
    17.
    发明授权
    Single-exposure high dynamic range sensor 有权

    公开(公告)号：US10411063B2

    公开(公告)日：2019-09-10

    申请号：US15628304

    申请日：2017-06-20

    Applicant: OMNIVISION TECHNOLOGIES, INC.

    Inventor： Dajiang Yang ,  Oray Orkun Cellek ,  Duli Mao ,  Xianfu Cheng ,  Xin Wang ,  Bill Phan ,  Dyson Tai

    IPC: H01L27/00 ,  H01L27/148 ,  H01L27/146 ,  H04N5/378 ,  H04N5/355 ,  H04N5/3745

    Abstract: A single-exposure high dynamic range (HDR) image sensor includes a first photodiode and a second photodiode, with a smaller full-well capacity than the first photodiode, disposed in a semiconductor material. The image sensor also includes a first floating diffusion disposed in the semiconductor material and a first transfer gate coupled to the first photodiode to transfer first image charge accumulated in the first photodiode into the first floating diffusion. A second floating diffusion is disposed in the semiconductor material and a second transfer gate is coupled to the second photodiode to transfer second image charge accumulated in the second photodiode into the second floating diffusion. An attenuation layer is disposed between the second photodiode and image light directed towards the single-exposure HDR image sensor to block a portion of the image light from reaching the second photodiode.

    Fractal-edge thin film and method of manufacture
    18.
    发明授权
    Fractal-edge thin film and method of manufacture 有权

    公开(公告)号：US10236320B2

    公开(公告)日：2019-03-19

    申请号：US15268190

    申请日：2016-09-16

    Applicant: OmniVision Technologies, Inc.

    Inventor： Oray Orkun Cellek

    IPC: B32B3/10 ,  H01L27/146

    Abstract: A method of manufacturing a fractal-edge thin film includes determining an area shape to be covered by the fractal-edge thin film. The method also includes generating a thin-film perimeter based upon the area shape, the thin-film perimeter having a fractal dimension exceeding one. The method also includes determining a photomask perimeter such that a photomask with the photomask perimeter, when used in a photolithography process, yields a fractal-edge thin film with the thin-film perimeter. The method may also include photolithographically etching a thin-film, the thin film having a photoresist layer disposed thereon, the photoresist layer having been exposed through the photomask, wherein the etching results in the fractal-edge thin film.

    System and Method for Protecting a Liquid Crystal Display by Controlling Ion Migration
    19.
    发明申请
    System and Method for Protecting a Liquid Crystal Display by Controlling Ion Migration 审中-公开

    公开(公告)号：US20180144710A1

    公开(公告)日：2018-05-24

    申请号：US15357920

    申请日：2016-11-21

    Applicant: OmniVision Technologies, Inc.

    Inventor： Christopher Morgan Walker ,  Libo Weng ,  Oray Orkun Cellek ,  Ming Zhang ,  Yin Qian ,  Dyson Hsin-Chih Tai ,  Regis Fan

    IPC: G09G3/36 ,  G02F1/1337 ,  G02F1/137

    Abstract: A liquid crystal display includes a display area and a border area at least partially surrounding the display area, where the display area displays images for viewing and the border area displays display-protection images, which are used to control ion migration in the liquid crystal layer. In a more particular embodiment, the border area displays a series of checkerboard pattern(s), where the checkerboard patterns can alternate between initial and inverted values. The display-protection images protect the liquid crystal display from migrating ions accumulating in particular regions of the pixel array and causing permanent defects in the display area. A liquid crystal display that includes a liquid crystal alignment layer having a plurality of liquid crystal alignment directions is also disclosed. The customized liquid crystal alignment director(s) over the border area promote ion migration away from the display area.

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