KNEE JOINT SURGICAL TREATMENT
    13.
    发明申请

    公开(公告)号:US20170100156A1

    公开(公告)日:2017-04-13

    申请号:US14878684

    申请日:2015-10-08

    CPC classification number: A61B17/320068 A61B17/3205 A61B2017/320072

    Abstract: A surgical treatment of an ACL or a PCL of a knee joint under an arthroscope, includes: contacting a treating portion of an ultrasonic device with a start region to which the ACL or the PCL of a femur adheres, and excising the femur and a remaining ligament of the ACL, or the femur and a remaining ligament of the PCL by ultrasonically vibrating the treating portion, thereby exposing a footprint of the femur; and contacting the treating portion with an end region to which the ACL or the PCL of a tibia adheres, and excising the tibia and a remaining ligament of the ACL, or the tibia and a remaining ligament of the PCL by ultrasonically vibrating the treating portion, thereby exposing a footprint of the tibia.

    KNEE JOINT SURGICAL TREATMENT
    14.
    发明申请

    公开(公告)号:US20170100139A1

    公开(公告)日:2017-04-13

    申请号:US14878571

    申请日:2015-10-08

    Abstract: A surgical treatment of a ligament of a knee joint under an arthroscope, includes: forming concave holes from the region of the tibia to which the ligament adheres toward an inner side of a rough surface of the tibia and from the region of the femur to which the ligament adheres toward an outer surface of a lateral condyle of the femur by ultrasonically vibrating the treating portion; forming tunnels between the concave hole of the tibia and the medial side of the rough surface of the tibia using the concave hole of the tibia and between the concave hole of the femur and the lateral surface of the lateral condyle of the femur using the concave hole of the femur.

    PLASMA TREATMENT SYSTEM
    18.
    发明申请
    PLASMA TREATMENT SYSTEM 有权
    等离子体处理系统

    公开(公告)号:US20160302843A1

    公开(公告)日:2016-10-20

    申请号:US15187477

    申请日:2016-06-20

    Abstract: A plasma treatment system includes a spout, a suction hole, a first electrode and a second electrode, an impedance acquisition unit, a liquid volume adjustment unit, and a first control unit. The first electrode and a second electrode are configured to generate plasma to treat a living tissue by the application of a voltage. The impedance acquisition unit acquires impedance between the first electrode and the second electrode. The liquid volume adjustment unit adjusts the supply volume or suction volume of the electrically conductive solution. The first control unit controls the liquid volume adjustment unit to increase or decrease the supply volume or suction volume of the electrically conductive solution based on the impedance.

    Abstract translation: 等离子体处理系统包括喷口,吸孔,第一电极和第二电极,阻抗采集单元,液体体积调节单元和第一控制单元。 第一电极和第二电极被配置为产生等离子体以通过施加电压来治疗生物体组织。 阻抗采集单元获取第一电极和第二电极之间的阻抗。 液体调节单元调节导电溶液的供给体积或吸入体积。 第一控制单元控制液体体积调节单元,以基于阻抗增加或减少导电溶液的供应体积或吸入体积。

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