公开(公告)号：US20160302843A1

公开(公告)日：2016-10-20

申请号：US15187477

申请日：2016-06-20

Applicant: OLYMPUS CORPORATION

Inventor： Manabu ISHIKAWA ,  Shuichi KIMURA ,  Koichiro WATANABE

IPC: A61B18/04 ,  A61B18/14 ,  A61B18/12

CPC classification number: A61B18/042 ,  A61B18/1206 ,  A61B18/14 ,  A61B90/98 ,  A61B2018/00035 ,  A61B2018/00577 ,  A61B2018/00583 ,  A61B2018/00714 ,  A61B2018/00744 ,  A61B2018/00767 ,  A61B2018/00791 ,  A61B2018/00827 ,  A61B2018/00875 ,  A61B2018/1472 ,  A61B2218/007

Abstract: A plasma treatment system includes a spout, a suction hole, a first electrode and a second electrode, an impedance acquisition unit, a liquid volume adjustment unit, and a first control unit. The first electrode and a second electrode are configured to generate plasma to treat a living tissue by the application of a voltage. The impedance acquisition unit acquires impedance between the first electrode and the second electrode. The liquid volume adjustment unit adjusts the supply volume or suction volume of the electrically conductive solution. The first control unit controls the liquid volume adjustment unit to increase or decrease the supply volume or suction volume of the electrically conductive solution based on the impedance.

Abstract translation: 等离子体处理系统包括喷口，吸孔，第一电极和第二电极，阻抗采集单元，液体体积调节单元和第一控制单元。 第一电极和第二电极被配置为产生等离子体以通过施加电压来治疗生物体组织。 阻抗采集单元获取第一电极和第二电极之间的阻抗。 液体调节单元调节导电溶液的供给体积或吸入体积。 第一控制单元控制液体体积调节单元，以基于阻抗增加或减少导电溶液的供应体积或吸入体积。

公开(公告)号：US20170020594A1

公开(公告)日：2017-01-26

申请号：US15282679

申请日：2016-09-30

Applicant: OLYMPUS CORPORATION

Inventor： Manabu ISHIKAWA ,  Shuichi KIMURA ,  Koichiro WATANABE

IPC: A61B18/04 ,  A61M1/00

CPC classification number: A61B18/042 ,  A61B18/1206 ,  A61B18/14 ,  A61B90/98 ,  A61B2018/00744 ,  A61B2018/00863 ,  A61B2018/1472 ,  A61B2218/002 ,  A61B2218/007 ,  A61M1/0062 ,  A61M2230/208

Abstract: In a plasma treatment system, a coefficient K which is a ratio of a supply amount and a suction amount of saline and also a minimal water amount required for generation of plasma is provided, and the required supply amount and suction amount of the saline are set from the coefficient K acquired on the basis of an output level of high-frequency energy, thereby performing a plasma treatment.

Abstract translation: 在等离子体处理系统中，提供作为供给量与盐水的吸入量的比率的系数K以及产生等离子体所需的最小水量，并且设定所需要的供给量和吸入量 从基于高频能量的输出电平获取的系数K，进行等离子体处理。

公开(公告)号：US20160367307A1

公开(公告)日：2016-12-22

申请号：US15255901

申请日：2016-09-02

Applicant: OLYMPUS CORPORATION

Inventor： Manabu ISHIKAWA ,  Shuichi KIMURA ,  Koichiro WATANABE

IPC: A61B18/04 ,  A61B18/14

CPC classification number: A61B18/042 ,  A61B18/14 ,  A61B18/1402 ,  A61B90/90 ,  A61B2017/00482 ,  A61B2018/00011 ,  A61B2018/00029 ,  A61B2018/00327 ,  A61B2018/00583 ,  A61B2018/00708 ,  A61B2018/00714 ,  A61B2018/00744 ,  A61B2018/00779 ,  A61B2018/00791 ,  A61B2018/00863 ,  A61B2218/002 ,  A61B2218/007

Abstract: In a plasma treatment system, a temperature detection section detecting a temperature of a perfusion layer of an electrically conductive solution is fixed to a treatment portion, and is located at a position to be immersed in the perfusion layer when a first electrode portion and a second electrode portion are immersed in the perfusion layer. In the plasma treatment system, a control section controls an adjustment of a temperature in a temperature adjustment unit and controls a supply volume and a suction volume of the electrically conductive solution on the basis of a detection result in the temperature detection section so that the temperature of the perfusion layer is within a target temperature range.

Abstract translation: 在等离子体处理系统中，检测导电性溶液的灌注层的温度的温度检测部固定在处理部，并且位于浸渍在灌注层中的位置，当第一电极部分和第二 电极部浸渍在灌注层中。 在等离子体处理系统中，控制部分控制温度调节单元中的温度的调节，并且基于温度检测部分的检测结果来控制导电溶液的供应量和吸入体积，使得温度 的灌注层在目标温度范围内。