公开(公告)号：US09897553B2

公开(公告)日：2018-02-20

申请号：US14769170

申请日：2014-02-20

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

IPC: G01B11/02 ,  G01N21/956 ,  G01N21/95 ,  G03F7/20

CPC classification number: G01N21/956 ,  G01B2210/56 ,  G01N21/9501 ,  G03F7/70625

Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

公开(公告)号：US20150212012A1

公开(公告)日：2015-07-30

申请号：US14416723

申请日：2013-07-24

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Yanir Hainick ,  Dror Shafir

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8848 ,  G01N2201/061 ,  G01N2201/0683 ,  G01N2201/12 ,  G02B21/0016 ,  G02B21/002 ,  G02B21/0092 ,  G02B27/46

Abstract: An optical method and system are presented for use in measurement of isolated features of a structure. According to this technique, Back Focal Plane Microscopy (BFM) measurements are applied to a structure and measured data indicative thereof is obtained, wherein the BFM measurements utilize dark-field detection mode while applying pinhole masking to incident light propagating through an illumination channel towards the structure, the measured data being thereby indicative of a scattering matrix characterizing scattering properties of the structure, enabling identification of one or more isolated features of the structure.

Abstract translation: 提出了一种光学方法和系统，用于测量结构的隔离特征。 根据该技术，将后焦距平面显微镜（BFM）测量应用于结构，并且获得表示其的测量数据，其中BFM测量利用暗场检测模式，同时对通过照明通道传播的入射光施加针孔掩蔽 结构，因此所测量的数据表示表征结构的散射特性的散射矩阵，使得能够识别结构的一个或多个隔离特征。