公开(公告)号：US06801315B2

公开(公告)日：2004-10-05

申请号：US10303052

申请日：2002-11-25

Applicant: Moshe Finarov ,  David Scheiner

Inventor： Moshe Finarov ,  David Scheiner

IPC: G01B1127

CPC classification number: G03F7/70633

Abstract: An optical measurement method and system are presented for imaging two target structures in two parallel layers, respectively, of a sample, to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer. The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement, and the collected radiation response is split into two spatially separated radiation components. The split radiation components are directed towards at least one imaging plane along different optical channels characterized by optical paths of different lengths, respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures. This enables determination of the relative distance between the two target structures.

Abstract translation: 提出了一种光学测量方法和系统，用于分别对样本的两个平行层中的两个目标结构进行成像，以便能够沿着该层的两个相互垂直的轴确定两个目标结构之间的配准。 用入射辐射照射样品以产生样品的辐射响应。 辐射响应由物镜布置收集，并且收集的辐射响应被分成两个空间上分离的辐射分量。 分裂的辐射分量被引导到沿着不同长度的光路的不同光通道的至少一个成像平面。 在所述至少一个成像平面中检测到两个分离的辐射分量，从而获得两个图像部分，每个图像部分包含两个目标结构的图像。 这使得能够确定两个目标结构之间的相对距离。

公开(公告)号：US06292265B1

公开(公告)日：2001-09-18

申请号：US09326665

申请日：1999-06-07

Applicant: Moshe Finarov ,  David Scheiner ,  Avi Ravid

Inventor： Moshe Finarov ,  David Scheiner ,  Avi Ravid

IPC: G01B1106

CPC classification number: H01L22/34 ,  B24B37/013 ,  B24B49/02 ,  B24B49/12 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/26

Abstract: A method is presented for optical control of the quality of a process of chemical mechanical planarization (CMP) performed by a polishing tool applied to an article having a patterned area. The article contains a plurality of stacks each formed by a plurality of different layers, thereby defining a pattern in the form of spaced-apart metal regions. The method is capable of locating at least one of residues, erosion and dishing conditions on the article. At least one predetermined site on the article is selected for control. This at least one predetermined site is illuminated, and spectral characteristics of light components reflected from this location are detected. Data representative of the detected light components is analyzed for determining at least one parameter of the article within the at least one illuminated site.

Abstract translation: 提出了一种用于光学控制由应用于具有图案化区域的制品的抛光工具执行的化学机械平面化（CMP）工艺的质量的方法。 该物品包含多个由多个不同层形成的堆叠，从而限定了间隔金属区域形式的图案。 该方法能够定位物品上的残留物，侵蚀和凹陷条件中的至少一种。 选择物品上至少一个预定的位置进行控制。 该至少一个预定位置被照亮，并且检测从该位置反射的光分量的光谱特性。 分析表示检测到的光成分的数据，以确定至少一个照明部位内的物品的至少一个参数。

公开(公告)号：US06281974B1

公开(公告)日：2001-08-28

申请号：US09590635

申请日：2000-06-08

Applicant: David Scheiner ,  Moshe Finarov

Inventor： David Scheiner ,  Moshe Finarov

IPC: G01B1106

CPC classification number: G01B11/0625 ,  G01B11/02 ,  G01J3/42 ,  H01L22/12

Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two locally adjacent elements having different optical properties in respect of an incident radiation. An optical model, based on at lease some of the features of the structure is provided. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area, which is substantially larger than a surface area of the structure defined by the grid cycle, is illuminated by an incident radiation of a preset substantially wide wavelength range. Light component substantially specularly reflected from the measurement area is detected and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.

Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有至少一个周期的网格，该至少一个周期由相对于入射辐射具有不同光学特性的至少两个局部相邻元件形成。 提供了基于结构的一些特征的光学模型。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 基本上大于由栅格周期限定的结构的表面积的测量区域被预设的基本上宽的波长范围的入射辐射照射。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 测量和理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。

公开(公告)号：US20070268591A1

公开(公告)日：2007-11-22

申请号：US11832837

申请日：2007-08-02

Applicant: David Scheiner ,  Michael Winik ,  Yakov Lyubchik

Inventor： David Scheiner ,  Michael Winik ,  Yakov Lyubchik

IPC: G02B27/14 ,  G02B5/10

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：US07253970B2

公开(公告)日：2007-08-07

申请号：US11003012

申请日：2004-12-03

Applicant: David Scheiner ,  Michael Winik ,  Yakov Lyubchik

Inventor： David Scheiner ,  Michael Winik ,  Yakov Lyubchik

IPC: G02B17/08 ,  G02B27/14

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：US06815947B2

公开(公告)日：2004-11-09

申请号：US10459711

申请日：2003-06-12

Applicant: David Scheiner ,  Yoav Many ,  Rahamin Guliamov ,  Shahar Gov

Inventor： David Scheiner ,  Yoav Many ,  Rahamin Guliamov ,  Shahar Gov

IPC: G01B710

CPC classification number: G01B7/105

Abstract: A method and system are presented for measuring in an electrically conductive film of a specific sample including data indicative of a free space response of an RF sensing coil unit to AC voltage applied to the RF sensing coil. The sensing coil is located proximate to the sample at a distance h substantially not exceeding 0.2 r wherein r is the coil radius; an AC voltage in a range from 100 MHz to a few GHz is applied to the sensing coil to cause generation of an eddy current passage through the conductive film; a response of the sensing coil to an effect of the electric current through the conductive film onto a magnetic field of the coil is detected and the measured data indicative of the response is generated. The thickness of the film is determined by utilizing the data indicative of the free space measurements to analyze the measured date. The method thus provides for measuring in conductive films with a sheet resistance Rs in a range from about 0.009 to about 2 Ohm/m2.

Abstract translation: 提供了一种用于在特定样品的导电膜中测量的方法和系统，包括指示RF感测线圈单元的自由空间响应与施加到RF感测线圈的AC电压的数据。 感测线圈以基本上不超过0.2r的距离h定位在样本附近，其中r是线圈半径; 在感测线圈上施加从100MHz到几GHz范围内的AC电压，以产生通过导电膜的涡流通路; 检测到感测线圈对通过导电膜的电流对线圈的磁场的影响的响应，并且生成表示响应的测量数据。 通过利用表示自由空间测量的数据来分析测量日期来确定膜的厚度。 因此，该方法提供了在约0.009至约2Ohm / m 2的范围内的薄层电阻Rs的导电膜中的测量。

公开(公告)号：US07532414B2

公开(公告)日：2009-05-12

申请号：US11832837

申请日：2007-08-02

Applicant: David Scheiner ,  Michael Winik ,  Yakov Lyubchik

Inventor： David Scheiner ,  Michael Winik ,  Yakov Lyubchik

IPC: G02B17/08 ,  G02B27/14

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：US06476920B1

公开(公告)日：2002-11-05

申请号：US09605664

申请日：2000-06-26

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01B1106

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two locally adjacent elements having different optical properties in respect of incident radiation. An optical model is provided, which is based on at least some of the features of the structure defined by a certain process of its manufacturing, and on the relation between a range of the wavelengths of incident radiation to be used for measurements and a pitch of the structure under measurements. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area, which is a grid cycles containing area and is substantially larger than a surface area of the structure defined by one grid cycle, is located and spectrophotometric measurements are applied to the measurement area, by illuminating it with incident radiation of a preset substantially wide wavelength range. A light component substantially specularly reflected from the measurement area is detected, and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.

Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有至少一个周期的网格，该至少一个周期由相对于入射辐射具有不同光学特性的至少两个局部相邻元件形成。 提供了一种光学模型，其基于由其制造的特定过程限定的结构的至少一些特征，以及用于测量的入射辐射的波长范围和用于测量的间距之间的关系 测量结构。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 定位测量区域，其是网格周期容纳区域并且基本上大于由一个网格周期限定的结构的表面积，并且通过用基本上预设的入射辐射对测量区域进行分光光度测量 宽波长范围。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 分析测量和理论数据，并优化光学模型，直到理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。

公开(公告)号：US07187456B2

公开(公告)日：2007-03-06

申请号：US11053254

申请日：2005-02-08

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01B11/06

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. An optical model is provided, which is based on at least some of the features of the structure defined by a certain process of its manufacturing, and on the relation between a range of the wavelengths of incident radiation to be used for measurements and a space size between the two metal-containing regions in the grid cycle, and a skin depth of said metal. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area is located and spectrophotometric measurements are applied to the measurement area, by illuminating it with incident light of a preset substantially wide wavelength range. A light component substantially specularly reflected from the measurement area is detected, and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.

Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有由至少两个含金属区域形成的至少一个周期的格栅，该至少两个金属区域相对于限定波导的入射光被基本上透明的区域隔开。 提供了一种光学模型，其基于由其制造的特定过程定义的结构的至少一些特征以及用于测量的入射辐射的波长范围与空间大小之间的关系 在网格周期中的两个含金属区域之间，以及所述金属的趋肤深度。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 定位测量区域，并且通过用预设的基本上宽的波长范围的入射光照射分光光度测量值到测量区域。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 分析测量和理论数据，并优化光学模型，直到理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。

公开(公告)号：US06885446B2

公开(公告)日：2005-04-26

申请号：US10309348

申请日：2002-12-04

Applicant: Vladimir Machavariani ,  David Scheiner ,  Amit Weingarten ,  Avi Ravid

Inventor： Vladimir Machavariani ,  David Scheiner ,  Amit Weingarten ,  Avi Ravid

IPC: G01N21/21 ,  G01N21/84 ,  G01N21/95 ,  G01J3/42

CPC classification number: G01N21/95623 ,  G01N21/21 ,  G01N21/8422 ,  G01N21/9501 ,  G01N21/95607

Abstract: A method and system are presented for use in controlling a process of material removal from the surface of a patterned structure, by measuring at least one of residue, erosion, dishing and corrosion effects in the structure induced by this process. The structure is imaged utilizing phase modulation of light reflected from the structure, and a phase map of the structure is thereby obtained. This phase map is analyzed and data indicative of light reflective properties of layer stacks of the structure is utilized to determine a phase difference between light reflected from a selected measured site and at least one reference site spaced-apart from the selected site. The phase difference is thus indicative of the measured effect.

Abstract translation: 提供了一种方法和系统，用于通过测量由该方法诱导的结构中的残留物，侵蚀，凹陷和腐蚀效应中的至少一种来控制从图案化结构的表面去除材料的过程。 利用从结构反射的光的相位调制对该结构进行成像，从而获得该结构的相位图。 分析该相位图，并且利用表示该结构的层叠层的光反射特性的数据来​​确定从所选择的测量部位反射的光与至少一个与选定部位间隔开的参考部位的相位差。 因此，相位差表示测量的效果。