公开(公告)号：US07532414B2

公开(公告)日：2009-05-12

申请号：US11832837

申请日：2007-08-02

Applicant: David Scheiner ,  Michael Winik ,  Yakov Lyubchik

Inventor： David Scheiner ,  Michael Winik ,  Yakov Lyubchik

IPC: G02B17/08 ,  G02B27/14

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：US20080074665A1

公开(公告)日：2008-03-27

申请号：US11945058

申请日：2007-11-26

Applicant: Boaz BRILL ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz BRILL ,  Moshe Finarov ,  David Scheiner

IPC: G01B11/00 ,  G01N21/84

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造过程中层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US20060001883A1

公开(公告)日：2006-01-05

申请号：US10525568

申请日：2003-05-08

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01N21/55

CPC classification number: G01N21/55

Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.

Abstract translation: 一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于 收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的特定位置 ，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述 限定所选入射角中的一个的至少一个可移动偏转元件。

公开(公告)号：US06476920B1

公开(公告)日：2002-11-05

申请号：US09605664

申请日：2000-06-26

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01B1106

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two locally adjacent elements having different optical properties in respect of incident radiation. An optical model is provided, which is based on at least some of the features of the structure defined by a certain process of its manufacturing, and on the relation between a range of the wavelengths of incident radiation to be used for measurements and a pitch of the structure under measurements. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area, which is a grid cycles containing area and is substantially larger than a surface area of the structure defined by one grid cycle, is located and spectrophotometric measurements are applied to the measurement area, by illuminating it with incident radiation of a preset substantially wide wavelength range. A light component substantially specularly reflected from the measurement area is detected, and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.

Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有至少一个周期的网格，该至少一个周期由相对于入射辐射具有不同光学特性的至少两个局部相邻元件形成。 提供了一种光学模型，其基于由其制造的特定过程限定的结构的至少一些特征，以及用于测量的入射辐射的波长范围和用于测量的间距之间的关系 测量结构。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 定位测量区域，其是网格周期容纳区域并且基本上大于由一个网格周期限定的结构的表面积，并且通过用基本上预设的入射辐射对测量区域进行分光光度测量 宽波长范围。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 分析测量和理论数据，并优化光学模型，直到理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。

公开(公告)号：US20070268591A1

公开(公告)日：2007-11-22

申请号：US11832837

申请日：2007-08-02

Applicant: David Scheiner ,  Michael Winik ,  Yakov Lyubchik

Inventor： David Scheiner ,  Michael Winik ,  Yakov Lyubchik

IPC: G02B27/14 ,  G02B5/10

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：US07253970B2

公开(公告)日：2007-08-07

申请号：US11003012

申请日：2004-12-03

Applicant: David Scheiner ,  Michael Winik ,  Yakov Lyubchik

Inventor： David Scheiner ,  Michael Winik ,  Yakov Lyubchik

IPC: G02B17/08 ,  G02B27/14

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：US20070034816A1

公开(公告)日：2007-02-15

申请号：US11580997

申请日：2006-10-16

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01N21/86 ,  G01B11/00

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有入射光的不同偏振态的至少两个测量，每个测量包括照射eh测量位置，以便通过另一个照射衍射结构之一。 测量位置的衍射特性表示了eth衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US06815947B2

公开(公告)日：2004-11-09

申请号：US10459711

申请日：2003-06-12

Applicant: David Scheiner ,  Yoav Many ,  Rahamin Guliamov ,  Shahar Gov

Inventor： David Scheiner ,  Yoav Many ,  Rahamin Guliamov ,  Shahar Gov

IPC: G01B710

CPC classification number: G01B7/105

Abstract: A method and system are presented for measuring in an electrically conductive film of a specific sample including data indicative of a free space response of an RF sensing coil unit to AC voltage applied to the RF sensing coil. The sensing coil is located proximate to the sample at a distance h substantially not exceeding 0.2 r wherein r is the coil radius; an AC voltage in a range from 100 MHz to a few GHz is applied to the sensing coil to cause generation of an eddy current passage through the conductive film; a response of the sensing coil to an effect of the electric current through the conductive film onto a magnetic field of the coil is detected and the measured data indicative of the response is generated. The thickness of the film is determined by utilizing the data indicative of the free space measurements to analyze the measured date. The method thus provides for measuring in conductive films with a sheet resistance Rs in a range from about 0.009 to about 2 Ohm/m2.

Abstract translation: 提供了一种用于在特定样品的导电膜中测量的方法和系统，包括指示RF感测线圈单元的自由空间响应与施加到RF感测线圈的AC电压的数据。 感测线圈以基本上不超过0.2r的距离h定位在样本附近，其中r是线圈半径; 在感测线圈上施加从100MHz到几GHz范围内的AC电压，以产生通过导电膜的涡流通路; 检测到感测线圈对通过导电膜的电流对线圈的磁场的影响的响应，并且生成表示响应的测量数据。 通过利用表示自由空间测量的数据来分析测量日期来确定膜的厚度。 因此，该方法提供了在约0.009至约2Ohm / m 2的范围内的薄层电阻Rs的导电膜中的测量。

公开(公告)号：US6100985A

公开(公告)日：2000-08-08

申请号：US267989

申请日：1999-03-12

Applicant: David Scheiner ,  Moshe Finarov

Inventor： David Scheiner ,  Moshe Finarov

IPC: G01B11/02 ,  G01B11/06 ,  G01J3/42 ,  G02B20060101 ,  H01L21/66 ,  G01B11/00 ,  G01J1/42 ,  G01N21/00

CPC classification number: G01B11/0625 ,  G01B11/02 ,  G01J3/42 ,  H01L22/12

Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two locally adjacent elements having different optical properties in respect of an incident radiation. An optical model, based on at least some of the features of the structure is provided. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area, which is substantially larger than a surface area of the structure defined by the grid cycle, is illuminated by an incident radiation of a preset substantially wide wavelength range. Light component substantially specularly reflected from the measurement area is detected and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.

Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有至少一个周期的网格，该至少一个周期由相对于入射辐射具有不同光学特性的至少两个局部相邻元件形成。 提供了基于结构的至少一些特征的光学模型。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 基本上大于由栅格周期限定的结构的表面积的测量区域被预设的基本上宽的波长范围的入射辐射照射。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 分析测量和理论数据，并优化光学模型，直到理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。

公开(公告)号：US20110089348A1

公开(公告)日：2011-04-21

申请号：US12966595

申请日：2010-12-13

Applicant: Moshe Finarov ,  David Scheiner ,  Yoav Lishzinker ,  On Haran

Inventor： Moshe Finarov ,  David Scheiner ,  Yoav Lishzinker ,  On Haran

IPC: G01N21/86

CPC classification number: G01N21/31 ,  G01N21/6489 ,  G01N21/65 ,  G01N21/8422 ,  G01N21/8901 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/8908 ,  G01N2201/0826 ,  G01N2201/0833 ,  G01N2201/1085

Abstract: Photovoltaic thin film quality control is obtained where the thin film is supported by a support and a section of the film is illuminated by a polychromatic or monochromatic illumination source. The illumination is positioned in certain locations including locations where the layer stack includes a reduced number of thin film layers. Such locations may be discrete sampled points located within scribe lines, contact frames or dedicated measurement targets. The light collected from such discrete sampled points is transferred to a photo-sensitive sensor through an optical switch. The spectral signal of the light reflected, transmitted or scattered by the sampled points is collected by the sensor and processed by a controller in such a way that parameters of simplified stacks are used for accurate determination of desired parameters of the full cell stack. In this way the photovoltaic thin film parameters applicable to the quality control are derived e.g. thin film thickness, index of refraction, extinction coefficient, absorption coefficient, energy gap, conductivity, crystallinity, surface roughness, crystal phase, material composition and photoluminescence spectrum and intensity. Manufacturing equipment parameters influencing the material properties may be changed to provide a uniform thin film layer with pre-defined properties.

Abstract translation: 获得光电薄膜质量控制，其中薄膜由支撑体支撑并且膜的一部分被多色或单色照明源照射。 照明被定位在某些位置，包括层堆叠减少数量的薄膜层的位置。 这些位置可以是位于划线，接触框架或专用测量目标内的离散采样点。 从这些离散采样点收集的光通过光学开关传送到光敏传感器。 由采样点反射，传播或散射的光的光谱信号由传感器收集并由控制器进行处理，使得简化堆栈的参数用于精确确定全单元堆栈的期望参数。 以这种方式，可以使用适用于质量控制的光伏薄膜参数。 薄膜厚度，折射率，消光系数，吸收系数，能隙，导电率，结晶度，表面粗糙度，结晶相，材料组成和光致发光光谱和强度。 可以改变影响材料性能的制造设备参数，以提供具有预定特性的均匀薄膜层。