公开(公告)号：US09153414B2

公开(公告)日：2015-10-06

申请号：US11700993

申请日：2007-01-31

Applicant: Hendrik Nicolaas Slingerland ,  William Ralph Knowles

Inventor： Hendrik Nicolaas Slingerland ,  William Ralph Knowles

IPC: G01F23/00 ,  H01J37/18 ,  H01J37/301 ,  H01J37/305

CPC classification number: H01J37/18 ,  H01J37/301 ,  H01J37/3056 ,  H01J2237/182 ,  H01J2237/2608 ,  H01J2237/28

Abstract: The invention relates to a particle-optical apparatus with a predetermined final vacuum pressure. To that end a vacuum chamber of said apparatus is via a first restriction connected to a volume where vapor or gas is present at a known pressure and via a second restriction to a vacuum pump. By making the ratio of the two conductances, associated with said restrictions, a calibrated ratio, the final pressure of the vacuum chamber is a predetermined final pressure. This eliminates the need for e.g. vacuum gauges and control systems, resulting in a more compact design of such apparatus.

Abstract translation: 本发明涉及具有预定最终真空压力的粒子光学装置。 为此，所述装置的真空室经由与已知压力下存在蒸气或气体并通​​过第二限制到真空泵的体积连接的第一限制。 通过使与所述限制相关联的两个电导率的比率为校准比率，真空室的最终压力是预定的最终压力。 这消除了对例如 真空计和控制系统，从而使这种设备更加紧凑的设计。

公开(公告)号：US20080185509A1

公开(公告)日：2008-08-07

申请号：US12027245

申请日：2008-02-06

Applicant: William Ralph Knowles

Inventor： William Ralph Knowles

IPC: H05H3/02

CPC classification number: H01J37/228 ,  H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J2237/188 ,  H01J2237/2608 ,  H01J2237/2808

Abstract: A particle-optical apparatus, such as an ESEM®, for simultaneous observing a sample with particles and photons. A pressure limiting aperture (PLA) is placed in a diaphragm between the objective lens of the ESEM® and the sample position. The distance between the sample position and the aperture is sufficiently small to allow a large collection angle of the photons through this aperture. A mirror is placed between the diaphragm and the objective lens. Due to the large collection angle for photons a large NA is achieved. The small distance between sample position and aperture also result in less scattering of electrons than occurs in ESEM's where a mirror is placed between aperture and sample position, as the electrons have to travel through only a limited length in a high pressure area. Embodiments describe combinations where e.g. an immersion lens is used.

Abstract translation: 用于同时观察具有颗粒和光子的样品的颗粒光学装置，例如ESEM。 压力限制孔（PLA）放置在ESEM（R）的物镜与样品位置之间的隔膜中。 样品位置和孔径之间的距离足够小，以允许光子通过该孔的大的收集角。 镜片放置在隔膜和物镜之间。 由于光子的收集角度大，所以实现了大的NA。 样品位置和孔径之间的小距离也导致电子散射比在孔径和样品位置之间放置镜子的ESEM中发生的少，因为电子必须在高压区域中仅通过有限的长度行进。 实施例描述了例如 使用浸没透镜。