PASSIVE DEVICE CELL AND FABRICATION PROCESS THEREOF
    11.
    发明申请
    PASSIVE DEVICE CELL AND FABRICATION PROCESS THEREOF 有权
    被动设备单元及其制造工艺

    公开(公告)号:US20160028359A1

    公开(公告)日:2016-01-28

    申请号:US14874888

    申请日:2015-10-05

    Applicant: MediaTek Inc.

    CPC classification number: H03H7/0115 H01P1/20381 H01P7/082 H03H3/00

    Abstract: An implementation of the invention is directed to a passive device cell having a substrate layer, and intermediary layer formed above the substrate layer, and a passive device formed above the intermediary layer. The intermediary layer includes a plurality of LC resonators and a plurality of segmented conductive lines, wherein the plurality of segmented conductive lines are disposed between the plurality of LC resonators.

    Abstract translation: 本发明的实施例涉及一种无源器件单元,其具有衬底层,以及形成在衬底层上方的中间层,以及形成在中间层上方的无源器件。 中间层包括多个LC谐振器和多个分段导电线,其中多个分段导线设置在多个LC谐振器之间。

    SEAL RING STRUCTURE WITH CAPACITOR
    13.
    发明申请
    SEAL RING STRUCTURE WITH CAPACITOR 有权
    密封圈结构与电容器

    公开(公告)号:US20140312470A1

    公开(公告)日:2014-10-23

    申请号:US14320725

    申请日:2014-07-01

    Applicant: MediaTek Inc.

    Abstract: A semiconductor device includes a semiconductor substrate of a first conductivity type having a chip region enclosed by a seal ring region. An insulating layer is on the semiconductor substrate. A seal ring structure is embedded in the insulating layer corresponding to the seal ring region. And, a plurality of doping regions are located beneath the first seal ring structure.

    Abstract translation: 半导体器件包括具有由密封环区域包围的芯片区域的第一导电类型的半导体衬底。 绝缘层位于半导体衬底上。 密封环结构埋设在对应于密封圈区域的绝缘层中。 并且,多个掺杂区域位于第一密封环结构下方。

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