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公开(公告)号：US20180284617A1
公开(公告)日：2018-10-04
申请号：US16001239
申请日：2018-06-06
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
CPC classification number: G03F7/70033 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.
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公开(公告)号：US20170215267A1
公开(公告)日：2017-07-27
申请号：US15480400
申请日：2017-04-06
Applicant: GIGAPHOTON INC.
Inventor： Tamotsu ABE , Yoshifumi UENO , Hirokazu HOSODA , Takashi SAITO
Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.
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13.发明申请公开(公告)号：US20170171955A1
公开(公告)日：2017-06-15
申请号：US15430737
申请日：2017-02-13
Applicant: GIGAPHOTON INC.
Inventor： Yoshifumi UENO , Hirokazu HOSODA , Takayuki YABU
IPC: H05G2/00 , H01S3/10 , H05H1/24 , H01L21/027
CPC classification number: H05G2/008 , G03F7/70033 , H01L21/027 , H01S3/10061 , H05G2/003 , H05G2/006 , H05H1/24 , H05H15/00
Abstract: An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.
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14.发明公开公开(公告)号：US20240184220A1
公开(公告)日：2024-06-06
申请号：US18510706
申请日：2023-11-16
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO , Kotaro MIYASHITA
CPC classification number: G03F7/706845 , G03F7/70033 , G03F7/70041 , G03F7/70233 , G03F7/70258 , G03F7/7065 , G03F7/706847 , G03F7/706849 , H05G2/008
Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.
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公开(公告)号：US20220110205A1
公开(公告)日：2022-04-07
申请号：US17468395
申请日：2021-09-07
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.
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Patent Agency Ranking
公开(公告)号：US20210410262A1
公开(公告)日：2021-12-30
申请号：US17314775
申请日：2021-05-07
Applicant: Gigaphoton Inc.
Inventor： Yuta TAKASHIMA , Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism. The processor stores measurement results of the extreme ultraviolet light energy and the return light energy in association with each of the irradiation positions, limits a shift region of the irradiation position based on comparison between the return light energy and a threshold, and determines a target irradiation position based on the association between the irradiation position and the extreme ultraviolet light energy in a region where the return light energy does not exceed the threshold, and controlling the irradiation position adjustment mechanism in accordance with the target irradiation position.
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17.发明申请公开(公告)号：US20200236769A1
公开(公告)日：2020-07-23
申请号：US16842421
申请日：2020-04-07
Applicant: Gigaphoton Inc.
Inventor： Yuta TAKASHIMA , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a droplet detection unit configured to detect a droplet passing through a predetermined position between a target supply unit and a plasma generation region; and a control unit configured to control a laser apparatus configured to output the pulse laser beam. The control unit performs control to determine whether there is a defective droplet based on a droplet detection signal obtained from the droplet detection unit and to stop, when it is determined that there is a defective droplet, irradiation of the defective droplet determined to be defective, a preceding droplet output one droplet before the defective droplet, and a following droplet output one droplet after the defective droplet with the pulse laser beam.
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公开(公告)号：US20190289707A1
公开(公告)日：2019-09-19
申请号：US16434197
申请日：2019-06-07
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
Abstract: An EUV light generation system includes: a target supply unit; a prepulse laser that outputs a prepulse laser beam; a main pulse laser that outputs a main pulse laser; a light focusing optical system that focuses the prepulse and main pulse laser beams on a predetermined region; an actuator that changes a focusing position of the prepulse laser beam by the light focusing optical system; a first sensor that captures an image of a target; and a control unit that stores a reference position of the actuator, calculates a predetermined parameter on the target after irradiation with the prepulse laser beam and before irradiation with the main pulse laser beam based on image data obtained from the first sensor, and controls the actuator to approach the reference position if the predetermined parameter does not satisfy a first condition.
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公开(公告)号：US20170280544A1
公开(公告)日：2017-09-28
申请号：US15613789
申请日：2017-06-05
Applicant: GIGAPHOTON INC.
Inventor： Yoshifumi UENO , Takashi SUGANUMA , Yoshiaki KUROSAWA
CPC classification number: H05G2/008 , G01J1/0238 , G01J1/0403 , G01J1/0411 , G01J1/0448 , G01J1/4257 , G02B17/0892 , G02B17/0896 , G02B19/0095 , G02B26/0816 , H01S3/005
Abstract: A beam delivery system may include: beam adjusters configured to adjust a divergence angle of a pulse laser beam; a beam sampler configured to separate a part of the pulse laser beam outputted from a first beam adjuster provided at the most downstream among the beam adjusters to acquire a sample beam; a beam monitor configured to receive the sample beam and output a monitored diameter; and a beam delivery controller configured to control the beam adjusters based on the monitored diameter. The beam delivery controller may adjust each of beam adjusters other than the first beam adjuster selected one after another from the most upstream so that the monitored diameter at the beam monitor becomes a predetermined value specific to the beam adjuster, and adjust the first beam adjuster so that the pulse laser beam becomes focused at a position downstream of a target position.
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20.发明申请EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING ULTRAVIOLET LIGHT 有权极光紫外光源装置及其产生紫外线灯的方法公开(公告)号：US20130256568A1
公开(公告)日：2013-10-03
申请号：US13904731
申请日：2013-05-29
Applicant: GIGAPHOTON INC.
Inventor： Akira ENDO , Yoshifumi UENO , Youichi SASAKI , Osamu WAKABAYASHI
IPC: G21K5/00
CPC classification number: G21K5/00 , G03F7/70033 , H05G2/00 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.
Abstract translation: 一种极紫外光源装置，其特征在于，所述极紫外光源装置包括：前脉冲激光光源，其产生前脉冲激光光源，所述极紫外光源装置包括：前脉冲激光光源，其通过用前脉冲激光照射所述靶之后用主脉冲激光照射靶， 在一部分目标物保留的同时用前脉冲激光照射靶的预等离子体，在与目标区域不同的区域产生预等离子体，不同的区域位于预激光激光的入射侧; 以及通过用主脉冲激光照射预等离子体而产生极紫外光的主脉冲激光光源。
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