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公开(公告)号：US20130186567A1
公开(公告)日：2013-07-25
申请号：US13651095
申请日：2012-10-12
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
IPC: C23F1/02
Abstract: A target supply device includes a nozzle portion, a cover, a first electrode, and a potential controller. The nozzle portion has a through-hole defined therein to allow a target material to be discharged therethrough. The cover includes an electrically conductive material and is disposed to cover the nozzle portion. The cover has a through-hole defined therein to allow the target material to pass therethrough. The first electrode is disposed on the cover. The first electrode has a through-hole to allow the target material to pass therethrough. The potential controller is configured to control the first electrode to have a first potential that is lower than a second potential of the cover.
Abstract translation: 目标供给装置包括喷嘴部分，盖子，第一电极和电位控制器。 喷嘴部分具有限定在其中的通孔，以允许目标材料从其中排出。 盖子包括导电材料，并且被设置成覆盖喷嘴部分。 盖具有限定在其中的通孔以允许目标材料通过。 第一电极设置在盖上。 第一电极具有允许目标材料通过的通孔。 电位控制器被配置为控制第一电极具有低于盖的第二电位的第一电位。
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公开(公告)号：US20190239329A1
公开(公告)日：2019-08-01
申请号：US16375556
申请日：2019-04-04
Applicant: Gigaphoton Inc.
Inventor： Tatsuya YANAGIDA
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus includes: a target supply unit configured to output a target toward a predetermined region; a laser system configured to output a first laser beam to be applied to the target, a second laser beam to be applied to the target irradiated with the first laser beam, and a third laser beam to be applied to the target irradiated with the second laser beam; and a control unit configured to control the laser system such that the third laser beam is applied to the target after ions of elements constituting the target are eliminated from at least an optical path of the third laser beam.
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公开(公告)号：US20190141826A1
公开(公告)日：2019-05-09
申请号：US16221699
申请日：2018-12-17
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI , Hakaru MIZOGUCHI
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号：US20160234920A1
公开(公告)日：2016-08-11
申请号：US15017000
申请日：2014-09-17
Applicant: Gigaphoton Inc.
Inventor： Toru SUZUKI , Tamotsu ABE , Osamu WAKABAYASHI , Tatsuya YANAGIDA
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/003 , H05G2/005
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
Abstract translation: 极紫外光发生装置可以包括：包括供给目标物的等离子体产生区域的室，该目标变成等离子体，使得在室内产生极紫外光; 目标供给部，被配置为通过将所述目标作为液滴输出到所述室中来将所述目标供给到所述等离子体产生区域; 液滴检测器，其被配置为检测从所述目标供给部件行进到所述等离子体产生区域的液滴; 被配置为捕获在所述室中包含所述等离子体产生区域的成像区域的图像的成像部件; 以及控制器，被配置为基于液滴检测器检测到液滴的检测定时来控制成像部分捕获成像区域的图像的成像定时。
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公开(公告)号：US20150123019A1
公开(公告)日：2015-05-07
申请号：US14595940
申请日：2015-01-13
Applicant: GIGAPHOTON INC.
Inventor： Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI
IPC: H05G2/00
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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Patent Agency Ranking
公开(公告)号：US20150043599A1
公开(公告)日：2015-02-12
申请号：US14523750
申请日：2014-10-24
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
IPC: H01S3/11
CPC classification number: H01S3/1106 , H01S3/005 , H01S3/105 , H01S3/107 , H01S3/1118 , H01S3/139 , H01S3/2316 , H01S3/235 , H05G2/008
Abstract: The laser system may include: a clock generator; a mode-locked laser device having an optical resonator; a controlling device capable of controlling resonator length of the optical resonator; a detector disposed in an optical path of the pulse laser beam, configured to detect the pulse laser beam and output a detection signal; a switching device disposed in the optical path of the pulse laser beam, capable of switching the pulse laser beam; and a controller, capable of controlling the controlling device based on the clock signal outputted by the clock generator and on the detection signal outputted by the detector, and capable of controlling the switching device based on the clock signal outputted by the clock generator and on a timing signal outputted by an external device.
Abstract translation: 激光系统可以包括：时钟发生器; 具有光谐振器的锁模激光器件; 能够控制光谐振器的谐振器长度的控制装置; 设置在所述脉冲激光束的光路中的检测器，被配置为检测所述脉冲激光束并输出检测信号; 设置在脉冲激光束的光路中的切换装置，能够切换脉冲激光束; 以及控制器，其能够基于由时钟发生器输出的时钟信号和由检测器输出的检测信号来控制控制装置，并且能够基于由时钟发生器输出的时钟信号来控制开关装置，并且在 定时信号由外部设备输出。
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17.发明申请FARADAY ROTATOR, OPTICAL ISOLATOR, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开FARADAY旋转机，光学隔离器，激光设备，以及极光紫外线发光装置公开(公告)号：US20140346374A1
公开(公告)日：2014-11-27
申请号：US14454962
申请日：2014-08-08
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
CPC classification number: G02F1/093 , G02F2201/38 , G02F2203/60 , H01S3/0064 , H05G2/008
Abstract: A Faraday rotator may include a magnetic field forming section configured to form a magnetic field at a predetermined magnetic flux density in a predetermined region, a Faraday element disposed in the predetermined region, and a first heat exhaust member, disposed on the side of one primary plane of the Faraday element, configured to form an optical contact surface with the Faraday element and configured to allow light at a predetermined wavelength to pass.
Abstract translation: 法拉第旋转器可以包括：磁场形成部，被配置为在预定区域中以预定的磁通密度形成磁场;布置在预定区域中的法拉第元件;以及第一散热构件，设置在一个主要侧面 法拉第元件的平面，被配置为与法拉第元件形成光学接触表面，并且被配置为允许预定波长的光通过。
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公开(公告)号：US20200068695A1
公开(公告)日：2020-02-27
申请号：US16665335
申请日：2019-10-28
Applicant: Gigaphoton Inc.
Inventor： Hitoshi NAGANO , Yasunori WADA , Tatsuya YANAGIDA , Osamu WAKABAYASHI
IPC: H05G2/00 , H01S3/16 , H01S3/13 , H01L21/027 , G21K1/06 , H01S3/00 , H01S3/23 , H01S3/107 , H01S3/10 , G03F7/20
Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.
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19.发明申请公开(公告)号：US20170280545A1
公开(公告)日：2017-09-28
申请号：US15622139
申请日：2017-06-14
Inventor： Kentaro TOMITA , Kiichiro UCHINO , Tatsuya YANAGIDA , Osamu WAKABAYASHI , Hiroaki TOMURO
CPC classification number: H05G2/008 , G01J1/0448 , G01J1/4257 , G01J1/429 , G01J3/4412 , G03F7/70033 , G03F7/70575
Abstract: An extreme ultraviolet light generating system may include: a chamber; a target feeding unit configured to feed a target into the chamber; a drive laser unit configured to irradiate the target with a drive pulsed laser light beam to generate a plasma to thereby generate extreme ultraviolet light; a probe laser unit configured to irradiate the plasma with a probe pulsed laser light beam to thereby generate Thomson scattered light; a spectrometer configured to measure a spectrum waveform of an ionic term in the Thomson scattered light; and a wavelength filter disposed upstream of the spectrometer, and configured to suppress light with a predetermined wavelength from entering the spectrometer. The light with the predetermined wavelength may be part of light containing the Thomson scattered light, and the predetermined wavelength may be substantially same as a wavelength of the probe pulsed laser light beam.
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公开(公告)号：US20170196072A1
公开(公告)日：2017-07-06
申请号：US15447013
申请日：2017-03-01
Applicant: GIGAPHOTON INC.
Inventor： Hitoshi NAGANO , Yasunori WADA , Tatsuya YANAGIDA , Osamu WAKABAYASHI
Abstract: A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.
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