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    Methods and systems for determining a characteristic of a wafer
    11.
    发明授权
    Methods and systems for determining a characteristic of a wafer 有权
    用于确定晶片特性的方法和系统

    公开(公告)号：US08422010B2

    公开(公告)日：2013-04-16

    申请号：US13610860

    申请日：2012-09-12

    Applicant: Michael D. Kirk ,  Christopher F. Bevis ,  David Adler ,  Kris Bhaskar

    Inventor： Michael D. Kirk ,  Christopher F. Bevis ,  David Adler ,  Kris Bhaskar

    IPC: G01N21/00

    CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N21/55

    Abstract: Methods and systems for determining a characteristic of a wafer are provided. One method includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The method also includes determining the characteristic of the wafer using the second output. One system includes an inspection subsystem configured to illuminate the wafer and to generate output responsive to light from the wafer. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The system also includes a processor configured to determine the characteristic of the wafer using the second output.

    Abstract translation: 提供了用于确定晶片特性的方法和系统。 一种方法包括使用检查系统响应来自晶片的光产生输出。 输出包括对应于晶片上的缺陷的第一输出和不对应于缺陷的第二输出。 该方法还包括使用第二输出确定晶片的特性。 一个系统包括检查子系统，该检查子系统配置成照亮晶片并产生响应于来自晶片的光的输出。 输出包括对应于晶片上的缺陷的第一输出和不对应于缺陷的第二输出。 该系统还包括配置成使用第二输出来确定晶片的特性的处理器。

    Methods and Systems for Determining a Characteristic of a Wafer
    12.
    发明申请
    Methods and Systems for Determining a Characteristic of a Wafer 有权
    确定晶圆特性的方法和系统

    公开(公告)号：US20130035877A1

    公开(公告)日：2013-02-07

    申请号：US13610860

    申请日：2012-09-12

    Applicant: Michael D. Kirk ,  Christopher F. Bevis ,  David Adler ,  Kris Bhaskar

    Inventor： Michael D. Kirk ,  Christopher F. Bevis ,  David Adler ,  Kris Bhaskar

    IPC: G01N21/88 ,  G06F19/00

    CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N21/55

    Abstract: Methods and systems for determining a characteristic of a wafer are provided. One method includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The method also includes determining the characteristic of the wafer using the second output. One system includes an inspection subsystem configured to illuminate the wafer and to generate output responsive to light from the wafer. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. The system also includes a processor configured to determine the characteristic of the wafer using the second output.

    Abstract translation: 提供了用于确定晶片特性的方法和系统。 一种方法包括使用检查系统响应来自晶片的光产生输出。 输出包括对应于晶片上的缺陷的第一输出和不对应于缺陷的第二输出。 该方法还包括使用第二输出确定晶片的特性。 一个系统包括检查子系统，该检查子系统配置成照亮晶片并产生响应于来自晶片的光的输出。 输出包括对应于晶片上的缺陷的第一输出和不对应于缺陷的第二输出。 该系统还包括配置成使用第二输出来确定晶片的特性的处理器。

    Electron microscope apparatus using CRT-type optics
    13.
    发明申请
    Electron microscope apparatus using CRT-type optics 审中-公开
    使用CRT型光学器件的电子显微镜装置

    公开(公告)号：US20070145266A1

    公开(公告)日：2007-06-28

    申请号：US11450757

    申请日：2006-06-09

    Applicant: Avi Cohen ,  David Adler ,  Neil Richardson

    Inventor： Avi Cohen ,  David Adler ,  Neil Richardson

    IPC: G21K7/00

    CPC classification number: H01J37/28 ,  H01J37/04 ,  H01J37/06 ,  H01J2237/04924 ,  H01J2237/06316 ,  H01J2237/162 ,  H01J2237/2817

    Abstract: One embodiment relates to an apparatus which utilizes an electron beam for inspection or metrology of a substrate. The apparatus includes a CRT-type gun and deflectors to generate and scan the electron beam. The CRT-type gun may optionally be in a sealed vacuum. Another embodiment relates to a method of inspecting a substrate or measuring an aspect of the substrate. The method includes focusing an electron beam using electrostatic lenses formed by metal plates supported by and separated by fused glass beads or other insulating material. Other embodiments and features are also disclosed.

    Abstract translation: 一个实施例涉及利用电子束来检查或测量基底的装置。 该装置包括CRT型枪和用于产生和扫描电子束的偏转器。 CRT型枪可以可选地处于密封真空中。 另一实施例涉及一种检查衬底或测量衬底的方面的方法。 该方法包括使用由熔融玻璃珠或其它绝缘材料支撑和分离的金属板形成的静电透镜来聚焦电子束。 还公开了其它实施例和特征。

    System and method for determining an optimal grid index specification for multidimensional data
    14.
    发明申请
    System and method for determining an optimal grid index specification for multidimensional data 失效
    用于确定多维数据的最佳网格索引规范的系统和方法

    公开(公告)号：US20060129529A1

    公开(公告)日：2006-06-15

    申请号：US11007132

    申请日：2004-12-07

    Applicant: David Adler

    Inventor： David Adler

    IPC: G06F17/30

    CPC classification number: G06F17/30592 ,  Y10S707/99932 ,  Y10S707/99933 ,  Y10S707/99934

    Abstract: A system, method, and associated computer product improve the search of multidimensional databases. The present system determines a near-optimal grid index that is used to locate a geometric shape in a spatial database. More particularly, the present system improves the technique of sampling data for defining the grid cell size in a grid for a given data set, minimizing the number times the data set needs to be sampled, thereby reducing the time to compute the cost of alternative grid index parameters.

    Abstract translation: 系统，方法和相关的计算机产品改进了对多维数据库的搜索。 本系统确定用于在空间数据库中定位几何形状的近似最佳网格索引。 更具体地，本系统改进了用于为给定数据集定义网格中的网格单元大小的数据采样技术，最小化数据集需要采样的次数，从而减少计算替代网格成本的时间 索引参数。

    Reducing index size for multi-level grid indexes
    15.
    发明申请
    Reducing index size for multi-level grid indexes 失效
    降低多级网格索引的索引大小

    公开(公告)号：US20060041551A1

    公开(公告)日：2006-02-23

    申请号：US11255296

    申请日：2005-10-20

    Applicant: David Adler ,  Knut Stolze

    Inventor： David Adler ,  Knut Stolze

    IPC: G06F17/30

    CPC classification number: G06F17/30327 ,  G06F17/30259 ,  G06F17/30592 ,  Y10S707/955 ,  Y10S707/99942 ,  Y10S707/99943 ,  Y10S707/99944 ,  Y10S707/99945

    Abstract: Techniques of querying an index of first objects comprised of a plurality of index entries and a pool of second objects are provided. The techniques include evaluating the index of the first objects to produce a group of one or more possible candidates based on whether one or more index entries of the first objects satisfy a query, adding second objects from the pool to said group of possible candidates to produce an interim group of possible candidates, filtering the interim group of possible candidates by comparing approximations of the candidates of the interim group with the query to produce filtered candidate objects, and determining if the filtered candidate objects satisfy the query by comparing the first and second objects corresponding to the filtered candidate objects with the query.

    Abstract translation: 提供了查询由多个索引条目和第二对象池组成的第一对象的索引的技术。 这些技术包括基于第一对象的一个​​或多个索引条目是否满足查询来评估第一对象的索引以产生一个或多个可能候选者的组，将来自池的第二对象添加到所述可能候选组中以产生 通过比较临时组的候选者的近似值与产生过滤的候选对象的查询来过滤可能的候选者的中间组，以及通过比较第一和第二对象来确定过滤后的候选对象是否满足查询 对应于具有查询的过滤的候选对象。

    Confocal secondary electron imaging
    17.
    发明申请
    Confocal secondary electron imaging 有权
    共焦二次电子成像

    公开(公告)号：US20080073529A1

    公开(公告)日：2008-03-27

    申请号：US11895817

    申请日：2007-08-28

    Applicant: David Adler

    Inventor： David Adler

    IPC: G01N23/225

    CPC classification number: G01N23/225 ,  H01J37/256 ,  H01J37/28 ,  H01J2237/2803

    Abstract: One embodiment relates to an apparatus using electrons for inspection or metrology of a semiconductor substrate. The apparatus includes an electron source, electron lenses, scan deflectors, an objective electron lens, a collection electron lens, a pin-hole filter, de-scan deflectors, and a detector. The collection electron lens is configured to focus the secondary electrons so as to form a secondary electron beam which is focused at a conjugate focal plane, and the pin-hole filter is positioned at the conjugate focal plane. The de-scan deflectors are configured to controllably deflect the secondary electrons so as to counteract an influence of the scan deflectors such that a center portion of the secondary electron beam passes through the filter and a remainder portion of the secondary electron beam is filtered out by the filter. Other embodiments and features are also disclosed.

    Abstract translation: 一个实施例涉及一种使用电子进行半导体衬底检查或计量的设备。 该装置包括电子源，电子透镜，扫描偏转器，物镜电子透镜，收集电子透镜，针孔滤光器，去扫描偏转器和检测器。 收集电子透镜被配置为聚焦二次电子，以形成聚焦在共轭焦平面上的二次电子束，并且针孔滤光器位于共轭焦平面。 去扫描偏转器被配置为可控地偏转二次电子，以抵消扫描偏转器的影响，使得二次电子束的中心部分通过滤光器，并且二次电子束的剩余部分被 过滤器。 还公开了其它实施例和特征。

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