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公开(公告)号:US11485663B2
公开(公告)日:2022-11-01
申请号:US16542585
申请日:2019-08-16
Applicant: Corning Incorporated
Inventor: Indrajit Dutta , Jean Marc Galea , Melinda Ann Hourihan , Lisa Ann Lamberson , Robert Michael Morena , Jian-Zhi Jay Zhang
Abstract: Methods of producing a glass article include melting a first glass composition and feeding a second glass composition into the melter. Both glass compositions include the same combination of components but at least one component has a concentration that is different in each. At least three glass articles may be drawn from the melter, including: a first glass article formed from the first glass composition; at least one intermediate glass article composed of neither the first nor the second glass composition; and a final glass article not composed of the first glass composition. The concentration of the at least one component in the intermediate glass article may be between the concentration in the first and second glass compositions. The first glass article and final glass article may have differing values for certain properties, and the intermediate glass article may have an intermediate set of values for the same properties.
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公开(公告)号:US11328950B2
公开(公告)日:2022-05-10
申请号:US17153041
申请日:2021-01-20
Applicant: CORNING INCORPORATED
Inventor: Ya-Huei Chang , Jen-Chieh Lin , Jian-Zhi Jay Zhang
IPC: H01L21/762 , H01L29/24 , H01L21/304 , H01L21/02 , H01L21/48
Abstract: Embodiments of the disclosure relate to a method for fabricating semiconductor-on-insulator (SemOI) electronic components. In the method, a device wafer is bonded to a handling wafer. The device wafer includes a semiconductor device layer and a buried oxide layer. A substrate is adhered to the handling wafer. The substrate is a glass or a ceramic, and bonding occurs at an interface between the semiconductor device layer and the substrate. Material is removed from the device wafer to expose the buried oxide layer. The substrate is debonded from the handling wafer so as to provide an SemOI electronic component including the substrate, the semiconductor device layer, and the buried oxide layer.
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公开(公告)号:US20210225693A1
公开(公告)日:2021-07-22
申请号:US17153041
申请日:2021-01-20
Applicant: CORNING INCORPORATED
Inventor: Ya-Huei Chang , Jen-Chieh Lin , Jian-Zhi Jay Zhang
IPC: H01L21/762 , H01L29/24 , H01L21/48 , H01L21/02 , H01L21/304
Abstract: Embodiments of the disclosure relate to a method for fabricating semiconductor-on-insulator (SemOI) electronic components. In the method, a device wafer is bonded to a handling wafer. The device wafer includes a semiconductor device layer and a buried oxide layer. A substrate is adhered to the handling wafer. The substrate is a glass or a ceramic, and bonding occurs at an interface between the semiconductor device layer and the substrate. Material is removed from the device wafer to expose the buried oxide layer. The substrate is debonded from the handling wafer so as to provide an SemOI electronic component including the substrate, the semiconductor device layer, and the buried oxide layer.
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公开(公告)号:US09724727B2
公开(公告)日:2017-08-08
申请号:US14618398
申请日:2015-02-10
Applicant: CORNING INCORPORATED
Inventor: Jeffrey John Domey , Matthew Wade Fenton , Govindarajan Natarajan , Paul John Shustack , Jian-Zhi Jay Zhang
CPC classification number: B05D1/36 , B32B17/10018 , B32B17/10137 , B32B17/10256 , B32B17/10266 , B32B2323/043 , B32B2323/10 , B32B2327/06 , B32B2367/00 , B41J3/407 , C03C17/34 , C03C17/3405 , C03C2217/72 , C03C2218/119 , C03C2218/31 , Y10T428/24851
Abstract: A method for printing ink on a substrate comprising the steps of coating a glass substrate with an adhesion promoter, depositing one or more layers of ink on the coated substrate, and laminating the imaged substrate. The substrate can be a glass substrate, and the adhesion promoter can include a silane material, powder coating, organophosphate primer suspended in isopropanol.
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公开(公告)号:US20150225285A1
公开(公告)日:2015-08-13
申请号:US14618398
申请日:2015-02-10
Applicant: CORNING INCORPORATED
Inventor: Jeffrey John Domey , Matthew Wade Fenton , Govindarajan Natarajan , Paul John Shustack , Jian-Zhi Jay Zhang
CPC classification number: B05D1/36 , B32B17/10018 , B32B17/10137 , B32B17/10256 , B32B17/10266 , B32B2323/043 , B32B2323/10 , B32B2327/06 , B32B2367/00 , B41J3/407 , C03C17/34 , C03C17/3405 , C03C2217/72 , C03C2218/119 , C03C2218/31 , Y10T428/24851
Abstract: A method for printing ink on a substrate comprising the steps of coating a glass substrate with an adhesion promoter, depositing one or more layers of ink on the coated substrate, and laminating the imaged substrate. The substrate can be a glass substrate, and the adhesion promoter can include a silane material, powder coating, organophosphate primer suspended in isopropanol.
Abstract translation: 一种在基材上印刷油墨的方法,包括以下步骤:用粘合促进剂涂覆玻璃基材,在涂覆的基材上沉积一层或多层油墨,并层压成像的基材。 基材可以是玻璃基材,并且粘合促进剂可以包括硅烷材料,粉末涂料,悬浮在异丙醇中的有机磷酸酯引物。
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公开(公告)号:US11370693B2
公开(公告)日:2022-06-28
申请号:US16750570
申请日:2020-01-23
Applicant: CORNING INCORPORATED
Inventor: Marie Jacqueline Monique Comte , Indrajit Dutta , Jian-Zhi Jay Zhang
IPC: C03C3/085
Abstract: A glass-ceramic article that includes an article having a glass-ceramic composition, the composition including: SiO2 from about 45% to about 65%, Al2O3 from about 14% to about 28%, TiO2 from about 2% to about 4%, ZrO2 from about 3% to about 4.5%, MgO from about 4.5% to about 12%, and ZnO from about 0.1 to about 4% (by weight of oxide). The article can include a coefficient of thermal expansion (CTE) of about 20×10−7 K−1 to about 160×10−7 K−1, as measured over a temperature range from 25° C. to 300° C.
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公开(公告)号:US20220140227A1
公开(公告)日:2022-05-05
申请号:US17515630
申请日:2021-11-01
Applicant: CORNING INCORPORATED
Inventor: Indrani Bhattacharyya , Julia Anne Dorothee Brueckner , Ya-Huei Chang , Bokyung Kong , Prantik Mazumder , Jun Ro Yoon , Jian-Zhi Jay Zhang
IPC: H01L41/312 , H01L41/337 , H01L41/187 , H01L41/08
Abstract: An article including a support unit, the support unit including a support substrate and a bonding layer such that the bonding layer is bonded to a surface of the support substrate. Furthermore, a total thickness variation TTV across a width of the support unit is about 2.0 microns or less.
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公开(公告)号:US20210159076A1
公开(公告)日:2021-05-27
申请号:US17104723
申请日:2020-11-25
Applicant: CORNING INCORPORATED
Inventor: Ya-Huei Chang , Karl William Koch, III , Jen-Chieh Lin , Jian-Zhi Jay Zhang
Abstract: Embodiments of a glass wafer for semiconductor fabrication processes are described herein. In some embodiments, a glass wafer includes: a glass substrate comprising: a top surface, a bottom surface opposing the top surface, and an edge surface between the top surface and the bottom surface; a first coating disposed atop the glass substrate, wherein the first coating is a doped crystalline silicon coating having a sheet-resistance of 100 to 1,000,000 ohm per square; and a second coating having one or more layers disposed atop the glass substrate, wherein the second coating comprises a silicon containing coating, wherein the glass wafer has an average transmittance (T) of less than 50% over an entire wavelength range of 400 nm to 1000 nm.
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公开(公告)号:US20200239352A1
公开(公告)日:2020-07-30
申请号:US16750570
申请日:2020-01-23
Applicant: CORNING INCORPORATED
Inventor: Marie Jacqueline Monique Comte , Indrajit Dutta , Jian-Zhi Jay Zhang
IPC: C03C3/085
Abstract: A glass-ceramic article that includes an article having a glass-ceramic composition, the composition including: SiO0 from about 45% to about 65%, Al2O3 from about 14% to about 28%, TiO2 from about 2% to about 4%, ZrO2 from about 3% to about 4.5%, MgO from about 4.5% to about 12%, and ZnO from about 0.1 to about 4% (by weight of oxide). The article can include a coefficient of thermal expansion (CTE) of about 20×10−7K−1 to about 160×10−7K−1, as measured over a temperature range from 25° C. to 300° C.
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