Vapor deposition apparatus
    11.
    发明授权

    公开(公告)号:US10233539B2

    公开(公告)日:2019-03-19

    申请号:US14436053

    申请日:2014-08-28

    Inventor: Lifei Ma Peng Zhang

    Abstract: Disclosed is a vapor deposition apparatus comprising an adsorption apparatus disposed in a vapor deposition cavity, wherein the adsorption apparatus comprising: a plurality of magnetic blocks arranged in a matrix disposed on a side of a substrate to be vapor deposited away from a metal mask plate, and a towing apparatus for adjusting each of the magnetic blocks to move up and down relative to the substrate to be vapor deposited. Such a vapor deposition apparatus may cause the metal mask plate to closely fit the substrate to be vapor deposited, such that a correct pattern will be formed when sub-pixel units are vapor deposited, and cause the magnetic fields of all the magnetic blocks to tend to be consistent, avoiding affecting the above-mentioned pattern by a deformation of the metal mask plate due to the inhomogeneity of the magnetic fields.

    Metal Mask
    13.
    发明申请
    Metal Mask 审中-公开
    金属面膜

    公开(公告)号:US20160281208A1

    公开(公告)日:2016-09-29

    申请号:US14443020

    申请日:2014-09-30

    Inventor: Peng Zhang

    CPC classification number: C23C14/04 C23C14/042 C23C14/24 H01L51/0011 H01L51/56

    Abstract: Disclosed is a metal mask configured to act as a mask of a substrate in a vacuum evaporation process. The metal mask comprises a mask pattern and a plurality of alignment openings, wherein an extending direction of the alignment openings in the metal mask is not coincident with a perpendicular direction (M) of a plane where the metal mask is located, and the alignment openings do not penetrate through the metal mask (100). Since the light is reflected for several times and partly absorbed within the alignment openings, images as generated by the CCD system according to the alignment openings of the metal mask and the alignment mark of the substrate have significant color contrast therebetween, thus, they are easily distinguished, which may reduce the alignment difficulty and alignment error.

    Abstract translation: 公开了一种金属掩模,其构造成在真空蒸发处理中用作基板的掩模。 金属掩模包括掩模图案和多个对准开口,其中金属掩模中的对准开口的延伸方向与金属掩模所在的平面的垂直方向(M)不一致,并且对准开口 不要穿过金属面罩(100)。 由于光被反射多次并部分地被吸收在对准开口内,所以由CCD系统根据金属掩模的对准开口和基板的对准标记产生的图像在它们之间具有显着的颜色对比,因此它们很容易 区分,这可能会降低对准难度和对准误差。

    CRUCIBLE
    15.
    发明申请
    CRUCIBLE 审中-公开

    公开(公告)号:US20150354896A1

    公开(公告)日:2015-12-10

    申请号:US14434980

    申请日:2014-08-26

    Inventor: Peng Zhang

    CPC classification number: F27B14/10 C23C14/243 C23C16/4485 F27B2014/104

    Abstract: Embodiments of the invention disclose a crucible. The crucible comprises: a crucible body; and at least one heat conductive sheet disposed on an inner side wall of the crucible body. The at least one heat conductive sheet has at least one opening. The crucible is specifically used for evaporating process, and can improve the heating uniformity of the evaporation materials and prevent the evaporation material from local spurting.

    Abstract translation: 本发明的实施例公开了一种坩埚。 坩埚包括:坩埚体; 以及设置在所述坩埚主体的内侧壁上的至少一个导热片。 至少一个导热片具有至少一个开口。 坩埚专门用于蒸发工艺,可以提高蒸发材料的加热均匀性,防止蒸发材料局部喷溅。

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