公开(公告)号：USD797691S1

公开(公告)日：2017-09-19

申请号：US29561163

申请日：2016-04-14

Applicant: Applied Materials, Inc.

Designer： Olivier Joubert ,  Jason A. Kenney ,  Sunil Srinivasan ,  James Rogers ,  Rajinder Dhindsa ,  Vedapuram S. Achutharaman ,  Olivier Luere

公开(公告)号：US11566319B2

公开(公告)日：2023-01-31

申请号：US15844251

申请日：2017-12-15

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC: C04B41/89 ,  C04B41/00 ,  C04B41/52 ,  C04B35/505 ,  C04B35/622 ,  C04B41/45 ,  C04B35/00 ,  C23C14/08 ,  C04B41/50 ,  C23C14/46 ,  C23C14/58 ,  H01J37/32 ,  C04B41/87

Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of Y2O3, over 0 mol % to 60 mol % of ZrO2, and 0 mol % to 9 mol % of Al2O3.

公开(公告)号：US11049760B2

公开(公告)日：2021-06-29

申请号：US15436936

申请日：2017-02-20

Applicant: Applied Materials, Inc.

Inventor： Olivier Joubert ,  Jason A. Kenney ,  Sunil Srinivasan ,  James Rogers ,  Rajinder Dhindsa ,  Vedapuram S. Achutharaman ,  Olivier Luere

IPC: H01L21/687 ,  H01J37/32 ,  H01L21/683

Abstract: The implementations described herein generally relate to a process kit suitable for use in a semiconductor process chamber, which reduces edge effects and widens the processing window with a single edge ring as compared to conventional process kits. The process kit generally includes an edge ring disposed adjacent to and surrounding a perimeter of a semiconductor substrate in a plasma chamber. A dimension of a gap between the substrate and the edge ring is less than about 1000 μm, and a height difference between the substrate and the edge ring is less than about (+/−) 300 μm. The resistivity of the ring is less than about 50 Ohm-cm.

公开(公告)号：US20180010235A1

公开(公告)日：2018-01-11

申请号：US15712094

申请日：2017-09-21

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC: C23C14/08 ,  C04B35/00 ,  C04B35/505 ,  C04B35/622 ,  C04B41/50 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  H01J37/32 ,  C23C14/46 ,  C23C14/58 ,  C04B41/00

CPC classification number: C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film is selected from a group consisting of an Er—Y composition, an Er—Al—Y composition, an Er—Y—Zr composition, and an Er—Al composition.

公开(公告)号：US20160326625A1

公开(公告)日：2016-11-10

申请号：US15211993

申请日：2016-07-15

Applicant: Applied Materials, Inc.

Inventor： Jennifer Y. Sun ,  Vahid Firouzdor ,  Biraja Prasad Kanungo ,  Tom K. Cho ,  Vedapuram S. Achutharaman ,  Ying Zhang

IPC: C23C14/08 ,  C23C14/58 ,  C04B41/89 ,  C04B35/622 ,  C04B41/50 ,  C04B41/52 ,  C23C14/46 ,  C04B35/505

CPC classification number: C23C14/088 ,  C04B35/00 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/4529 ,  C04B41/5045 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3225 ,  C04B2235/3246 ,  C04B2235/3418 ,  C04B2235/3826 ,  C04B2235/3873 ,  C04B2235/428 ,  C04B2235/445 ,  C23C14/08 ,  C23C14/083 ,  C23C14/46 ,  C23C14/5806 ,  H01J37/32477 ,  Y10T428/26 ,  Y10T428/265 ,  C04B35/10 ,  C04B35/50 ,  C04B35/14 ,  C04B35/584 ,  C04B35/565 ,  C04B41/5032 ,  C04B41/5042 ,  C04B41/5035 ,  C04B2103/54

Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide is selected from a group consisting of YF3, Er4Al2O9, ErAlO3, and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

Abstract translation: 一种制品在身体的至少一个表面上包括主体和保形层。 共形保护层是厚度小于1000μm的耐等离子体稀土氧化物膜，其中耐等离子体稀土氧化物选自YF 3，Er 4 Al 2 O 9，ErAlO 3和包含Y 4 Al 2 O 9的陶瓷化合物和固体 Y2O3-ZrO2溶液。