Method and apparatus for position-dependent optical metrology calibration

    公开(公告)号:US20060146321A1

    公开(公告)日:2006-07-06

    申请号:US11364709

    申请日:2006-02-28

    CPC classification number: G01N21/9501 G01N21/274 G01N21/278 G01N21/93

    Abstract: A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

    ERGONOMIC VERTICAL VISION REDIRECTION

    公开(公告)号:US20130222757A1

    公开(公告)日:2013-08-29

    申请号:US13479129

    申请日:2012-05-23

    Abstract: An ergonomic vertical redirection vision system comprises glasses or goggles with lenses modified to include a fresnel prism that vertically redirects light. The curved fresnel prism is a novel curved refractive element with unique advantages compared to a flat fresnel prism. The curved fresnel prism may be achromatized by the addition of an appropriate diffractive surface thereby creating a hybrid achromat or diffractive/refractive optical element (DROE). Looking through the modified eyewear will redirect the user's visual field up or down, depending on the configuration. Upward vision redirection improves ergonomics and aerodynamics for several sports including bicycle riding, swimming, downhill ski racing, and motorcycle racing. Downward vision redirection improves the ergonomics of reading a book, working on a laptop or pad computer, or taking notes in a class.

    Abstract translation: 符合人体工程学的垂直重定向视觉系统包括眼镜或护目镜,镜片被修改为包括使光线垂直重定向的菲涅耳棱镜。 弯曲的菲涅耳棱镜是一种新颖的弯曲折射元件,与平坦的菲涅尔棱镜相比具有独特的优势。 弯曲的菲涅尔棱镜可以通过添加适当的衍射面而被消色差,从而产生混合的消色差或衍射/折射光学元件(DROE)。 查看修改后的眼镜会根据配置重定向用户的视野。 向上的视觉重定向改善了人体工程学和空气动力学,包括骑自行车,游泳,下坡滑雪赛车和摩托车赛车等多项运动。 向下视力重定向提高了阅读书籍,在笔记本电脑或平板电脑上工作或在课堂上进行笔记的人体工程学。

    Diffraction order sorting filter for optical metrology
    13.
    发明授权
    Diffraction order sorting filter for optical metrology 有权
    用于光学测量的衍射顺序分选滤波器

    公开(公告)号:US08107073B2

    公开(公告)日:2012-01-31

    申请号:US12369905

    申请日:2009-02-12

    Abstract: A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.

    Abstract translation: 公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器,其中在区域关节处的光散射减小。 订单分选过滤器包括沉积在下面的光学透明层,或者在分级过滤器区域的薄膜过滤器堆叠的顶部,其中调整光学透明层的厚度,使得在光 区域接头在邻近区域接头的区域中基本相等。 还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法,其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

    Method and apparatus for position-dependent optical metrology calibration

    公开(公告)号:US20060164632A1

    公开(公告)日:2006-07-27

    申请号:US11364312

    申请日:2006-02-28

    CPC classification number: G01N21/9501 G01N21/274 G01N21/278 G01N21/93

    Abstract: A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

    Accurate small-spot spectrometry instrument
    16.
    发明授权
    Accurate small-spot spectrometry instrument 失效
    精确的小光谱光谱仪

    公开(公告)号:US06738136B2

    公开(公告)日:2004-05-18

    申请号:US10290730

    申请日:2002-11-07

    CPC classification number: G01J3/02 G01J3/0218 G01J3/08 G01J3/42 G01N21/55

    Abstract: The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.

    Abstract translation: 本发明是用于确定样品特性的方法和装置。 该系统和方法提供用于检测从反射镜反射的监视光束,其中监视光束对应于入射在样本上的光的强度。 该系统和方法还提供了用于检测测量光束,其中测量光束已经从被表征的样品反射出来。 监测光束和测量光束都通过相同的传输路径传输,并由相同的检测器检测。 因此,监测光束和测量光束之间不是由于样品特性引起的变化的潜在来源被最小化。 可以通过将与测量光束相对应的数据相对于监视光束对应的数据进行比较来确定样本的反射率信息。

    System for measuring polarimetric spectrum and other properties of a sample

    公开(公告)号:US06611330B2

    公开(公告)日:2003-08-26

    申请号:US09778245

    申请日:2001-02-06

    CPC classification number: G01J4/02 G01J3/447 G01N21/21

    Abstract: A polarized sample beam of broadband radiation is focused onto the surface of a sample and the radiation modified by the sample is collected by means of a mirror system in different planes of incidence. The sample beam focused to the sample has a multitude of polarization states. The modified radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Thickness and refractive information may then be derived from the spectrum. Preferably the polarization of the sample beam is altered only by the focusing and the sample, and the analyzing is done with respect to a fixed polarization plane. In the preferred embodiment, the focusing of the sample beam and the collection of the modified radiation are repeated employing two different apertures to detect the presence or absence of a birefringence axis in the sample. In another preferred embodiment, the above-described technique may be combined with ellipsometry for determining the thicknesses and refractive indices of thin films.

    Apparatus for controlling angle of incidence of multiple illumination beams
    18.
    发明授权
    Apparatus for controlling angle of incidence of multiple illumination beams 有权
    用于控制多个照明光束的入射角的装置

    公开(公告)号:US08030631B2

    公开(公告)日:2011-10-04

    申请号:US12413945

    申请日:2009-03-30

    Abstract: Provided is an apparatus for projecting multiple beams to a structure on a workpiece comprising a first light source generating a first illumination beam and a second light source generating a second illumination beam, an illumination primary mirror configured to reflect the first illumination beam onto the structure of the workpiece at a first angle of incidence, generating a first detection beam, and configured to reflect the second illumination beam onto the workpiece at a second angle of incidence, generating a second detection beam, a separate illumination secondary mirror positioned relative to the illumination primary mirror so as make the first angle of incidence substantially the same or close to a calculated optimum first angle of incidence and make the second angle of incidence substantially the same or close to a calculated optimum second angle of incidence. The first and second detection beams are diffracted off the structure at the corresponding angle of incidence to a detection primary mirror, reflected onto a separate secondary detection mirror and other optical components on the detection path, and onto spectroscopic detectors.

    Abstract translation: 提供了一种用于将多个光束投影到工件上的结构的装置,包括产生第一照明光束的第一光源和产生第二照明光束的第二光源,照明主反射镜被配置为将第一照明光束反射到 所述工件以第一入射角产生第一检测光束,并且被配置为以第二入射角将所述第二照明光束反射到所述工件上,产生第二检测光束,相对于所述照明原色物体定位的分离的照明次级反射镜 使得第一入射角基本上相同或接近于计算的最佳第一入射角,并使第二入射角基本上相同或接近于计算出的最佳第二入射角。 第一和第二检测光束以与检测主反射镜相对应的入射角度从结构衍射,反射到分离的二次检测镜和检测路径上的其它光学部件上,并分布在光谱检测器上。

    Calibration method for optical metrology
    19.
    发明授权
    Calibration method for optical metrology 有权
    光学测量的校准方法

    公开(公告)号:US07924422B2

    公开(公告)日:2011-04-12

    申请号:US12369947

    申请日:2009-02-12

    Abstract: A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.

    Abstract translation: 公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器,其中在区域关节处的光散射减小。 订单分选过滤器包括沉积在下面的光学透明层,或者在分级过滤器区域的薄膜过滤器堆叠的顶部,其中调整光学透明层的厚度,使得在光 区域接头在邻近区域接头的区域中基本相等。 还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法,其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

    Apparatus for auto focusing a workpiece using two or more focus parameters
    20.
    发明授权
    Apparatus for auto focusing a workpiece using two or more focus parameters 有权
    用于使用两个或多个聚焦参数自动对焦工件的设备

    公开(公告)号:US07660696B1

    公开(公告)日:2010-02-09

    申请号:US12248015

    申请日:2008-10-08

    CPC classification number: G01N21/956 G01N21/9501 G02B5/18 G02B27/40

    Abstract: Provided is an apparatus for auto focusing a workpiece for optical metrology measurements using an optical metrology system. The auto focusing subsystem includes a focus detector having a tilt angle, a capture range, and a plurality of sensors. A processor coupled to the focus detector is configured to utilize the plurality of focus signals measured using the focus detector to determine two or more focus parameters. The two or more focus parameters and calibration data are used to determine an initial position of the workpiece and to generate instructions to move the workpiece to a best focus position. A diffraction signal is measured off a structure on the workpiece using the optical metrology system to determine at least one profile parameter of the structure. The at least one profile parameter is used to modify at least one process variable or equipment setting of a semiconductor fabrication cluster.

    Abstract translation: 提供了一种用于使用光学测量系统自动聚焦工件用于光学测量测量的装置。 自动聚焦子系统包括具有倾斜角度,捕获范围和多个传感器的聚焦检测器。 耦合到焦点检测器的处理器被配置为利用使用焦点检测器测量的多个聚焦信号来确定两个或更多个聚焦参数。 使用两个或更多个焦点参数和校准数据来确定工件的初始位置并产生用于将工件移动到最佳对焦位置的指令。 使用光学测量系统从工件上的结构测量衍射信号,以确定结构的至少一个轮廓参数。 所述至少一个轮廓参数用于修改半导体制造集群的至少一个过程变量或设备设置。

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