公开(公告)号：US09134622B2

公开(公告)日：2015-09-15

申请号：US14107734

申请日：2013-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US11333984B2

公开(公告)日：2022-05-17

申请号：US16967794

申请日：2019-02-04

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Richard Joseph Bruls ,  Ronald Peter Albright ,  Peter Conrad Kochersperger ,  Victor Antonio Perez-Falcon

IPC: G03F7/20 ,  B08B6/00

Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.

公开(公告)号：US11137694B2

公开(公告)日：2021-10-05

申请号：US16629337

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yang-Shan Huang ,  Marcel Joseph Louis Boonen ,  Han-Kwang Nienhuys ,  Jacob Brinkert ,  Richard Joseph Bruls ,  Peter Conrad Kochersperger

IPC: G03F7/20

Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

公开(公告)号：US10429741B2

公开(公告)日：2019-10-01

申请号：US16194567

申请日：2018-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentius Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC: G03F7/20 ,  G03B27/52

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

公开(公告)号：US10151984B2

公开(公告)日：2018-12-11

申请号：US14928891

申请日：2015-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentius Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC: G03F7/20 ,  G03B27/52

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

公开(公告)号：US09952515B2

公开(公告)日：2018-04-24

申请号：US14839633

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US09134623B2

公开(公告)日：2015-09-15

申请号：US14266591

申请日：2014-04-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.