-
公开(公告)号：US11637512B2
公开(公告)日：2023-04-25
申请号：US17351181
申请日：2021-06-17
Applicant: ASML Netherlands B.V.
Inventor： Jan-Gerard Cornelis Van Der Toorn , Jeroen Gertruda Antonius Huinck , Han Willem Hendrik Severt , Allard Eelco Kooiker , Michaël Johannes Christiaan Ronde , Arno Maria Wellink , Shibing Liu , Ying Luo , Yixiang Wang , Chia-Yao Chen , Bohang Zhu , Jurgen Van Soest
Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
-
公开(公告)号：US10331047B2
公开(公告)日：2019-06-25
申请号：US15687938
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC: G03F7/20
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
-
公开(公告)号：US20180188661A1
公开(公告)日：2018-07-05
申请号：US15904946
申请日：2018-02-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
IPC: G03F7/20
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
-
公开(公告)号：US09477160B2
公开(公告)日：2016-10-25
申请号：US14624167
申请日：2015-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
-
公开(公告)号：US20140300883A1
公开(公告)日：2014-10-09
申请号：US14273335
申请日：2014-05-08
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
-
Patent Agency Ranking
公开(公告)号：US12051607B2
公开(公告)日：2024-07-30
申请号：US17257900
申请日：2019-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Patriek Adrianus Alphonsus Maria Bruurs , Dennis Herman Caspar Van Banning , Jan-Gerard Cornelis Van Der Toorn , Edwin Cornelis Kadijk
IPC: H01L21/67 , G01K1/14 , G01K11/125 , H01J37/20 , H01J37/244 , H01L21/68
CPC classification number: H01L21/67248 , G01K1/14 , G01K11/125 , H01J37/20 , H01J37/244 , H01L21/68 , H01J2237/20228 , H01J2237/20235
Abstract: A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.
-
公开(公告)号：US12051562B2
公开(公告)日：2024-07-30
申请号：US17753298
申请日：2020-08-25
Applicant: ASML Netherlands B.V.
Inventor： Yixiang Wang , Shibing Liu , Shanhui Cao , Kangsheng Qiu , Juying Dou , Ying Luo , Yinglong Li , Qiang Li , Ronald Van Der Wilk , Jan-Gerard Cornelis Van Der Toorn
IPC: H01J37/20 , H01L21/683
CPC classification number: H01J37/20 , H01L21/6833 , H01J2237/0044
Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.
-
公开(公告)号：US11908656B2
公开(公告)日：2024-02-20
申请号：US17497761
申请日：2021-10-08
Applicant: ASML Netherlands B.V.
Inventor： Han Willem Hendrik Severt , Jan-Gerard Cornelis Van Der Toorn , Ronald Van Der Wilk , Allard Eelco Kooiker
CPC classification number: H01J37/20 , H01J37/261 , H01J37/28 , H01J2237/0206 , H01J2237/04756 , H01J2237/24592
Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.
-
公开(公告)号：US11694870B2
公开(公告)日：2023-07-04
申请号：US17351043
申请日：2021-06-17
Applicant: ASML Netherlands B.V.
CPC classification number: H01J37/20 , H02G11/00 , H01J2237/0262 , H01J2237/2007
Abstract: The present disclosure relates to a stage apparatus comprising: an object table configured to hold a substrate, the object table comprising an electrode configured to be charged by a power source and an electrical connection configured to electrically connect the electrode to the power source, and an electric field shield configured to shield at least a part of the electrical connection.
-
公开(公告)号：US10705439B2
公开(公告)日：2020-07-07
申请号：US15904946
申请日：2018-02-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
IPC: G03F7/20
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
-
-
-
-
-
-
-
-
-
Search Results
24
records
(took 0.02 seconds)
