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公开(公告)号：US20190086814A1
公开(公告)日：2019-03-21
申请号：US16194567
申请日：2018-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentinus Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
CPC classification number: G03F7/70341 , G03B27/52
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
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12.发明授权公开(公告)号：US10222701B2
公开(公告)日：2019-03-05
申请号：US15024815
申请日：2014-09-18
Applicant: ASML Netherlands B.V.
Inventor： Chuangxin Zhao , Sander Baltussen , Pär Mårten Lukas Broman , Richard Joseph Bruls , Cristian Bogdan Craus , Jan Groenewold , Dzmitry Labetski , Kerim Nadir , Hendrikus Gijsbertus Schimmel , Christian Felix Wählisch
Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
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Patent Agency Ranking
公开(公告)号：US09134622B2
公开(公告)日：2015-09-15
申请号：US14107734
申请日：2013-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US10429741B2
公开(公告)日：2019-10-01
申请号：US16194567
申请日：2018-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
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公开(公告)号：US10151984B2
公开(公告)日：2018-12-11
申请号：US14928891
申请日：2015-10-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
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公开(公告)号：US09952515B2
公开(公告)日：2018-04-24
申请号：US14839633
申请日：2015-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US09134623B2
公开(公告)日：2015-09-15
申请号：US14266591
申请日：2014-04-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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